JPS6463246A - Evaporator for ion source - Google Patents

Evaporator for ion source

Info

Publication number
JPS6463246A
JPS6463246A JP63115040A JP11504088A JPS6463246A JP S6463246 A JPS6463246 A JP S6463246A JP 63115040 A JP63115040 A JP 63115040A JP 11504088 A JP11504088 A JP 11504088A JP S6463246 A JPS6463246 A JP S6463246A
Authority
JP
Japan
Prior art keywords
crucibles
radiation
lamp
temperature
axis
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP63115040A
Other languages
English (en)
Other versions
JPH0415575B2 (ja
Inventor
Satoo Shiyuu
Ii Ebansu Jiyunia Ruisu
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Varian Medical Systems Inc
Original Assignee
Varian Associates Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Varian Associates Inc filed Critical Varian Associates Inc
Publication of JPS6463246A publication Critical patent/JPS6463246A/ja
Publication of JPH0415575B2 publication Critical patent/JPH0415575B2/ja
Granted legal-status Critical Current

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J27/00—Ion beam tubes
    • H01J27/02—Ion sources; Ion guns
    • H01J27/20—Ion sources; Ion guns using particle beam bombardment, e.g. ionisers
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/02—Details
    • H01J37/04—Arrangements of electrodes and associated parts for generating or controlling the discharge, e.g. electron-optical arrangement, ion-optical arrangement
    • H01J37/08—Ion sources; Ion guns
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J27/00—Ion beam tubes
    • H01J27/02—Ion sources; Ion guns
    • H01J27/022—Details

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Combustion & Propulsion (AREA)
  • Analytical Chemistry (AREA)
  • Electron Sources, Ion Sources (AREA)
  • Physical Vapour Deposition (AREA)
  • Crystals, And After-Treatments Of Crystals (AREA)
JP63115040A 1987-05-15 1988-05-13 Evaporator for ion source Granted JPS6463246A (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US07/051,076 US4791273A (en) 1987-05-15 1987-05-15 Vaporizer system for ion source

Publications (2)

Publication Number Publication Date
JPS6463246A true JPS6463246A (en) 1989-03-09
JPH0415575B2 JPH0415575B2 (ja) 1992-03-18

Family

ID=21969179

Family Applications (1)

Application Number Title Priority Date Filing Date
JP63115040A Granted JPS6463246A (en) 1987-05-15 1988-05-13 Evaporator for ion source

Country Status (6)

Country Link
US (1) US4791273A (ja)
EP (1) EP0291341B1 (ja)
JP (1) JPS6463246A (ja)
KR (1) KR960011851B1 (ja)
CA (1) CA1276319C (ja)
DE (1) DE3860057D1 (ja)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2017523566A (ja) * 2014-07-02 2017-08-17 ヴァリアン セミコンダクター イクイップメント アソシエイツ インコーポレイテッド イオン源の動的温度制御装置

Families Citing this family (12)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5674574A (en) * 1996-05-20 1997-10-07 Micron Technology, Inc. Vapor delivery system for solid precursors and method regarding same
US6244575B1 (en) 1996-10-02 2001-06-12 Micron Technology, Inc. Method and apparatus for vaporizing liquid precursors and system for using same
US6280793B1 (en) 1996-11-20 2001-08-28 Micron Technology, Inc. Electrostatic method and apparatus for vaporizing precursors and system for using same
TW521295B (en) * 1999-12-13 2003-02-21 Semequip Inc Ion implantation ion source, system and method
JP3485104B2 (ja) 2001-04-24 2004-01-13 日新電機株式会社 イオン源用オーブン
US7326937B2 (en) * 2005-03-09 2008-02-05 Verian Semiconductor Equipment Associates, Inc. Plasma ion implantation systems and methods using solid source of dopant material
US7622722B2 (en) * 2006-11-08 2009-11-24 Varian Semiconductor Equipment Associates, Inc. Ion implantation device with a dual pumping mode and method thereof
US8673082B2 (en) * 2011-01-20 2014-03-18 Sharp Kabushiki Kaisha Crucible and deposition apparatus
US10672602B2 (en) 2014-10-13 2020-06-02 Arizona Board Of Regents On Behalf Of Arizona State University Cesium primary ion source for secondary ion mass spectrometer
CN104534437A (zh) * 2014-12-30 2015-04-22 陆宇光 用大功率双螺旋红外线加热灯管加热的光波蒸汽锅炉
US10954594B2 (en) 2015-09-30 2021-03-23 Applied Materials, Inc. High temperature vapor delivery system and method
US9928983B2 (en) * 2016-06-30 2018-03-27 Varian Semiconductor Equipment Associates, Inc. Vaporizer for ion source

Family Cites Families (13)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US2862441A (en) * 1954-12-09 1958-12-02 Gen Electric Toaster-oven cooking appliance
US3155813A (en) * 1962-02-23 1964-11-03 Little Inc A Mirror assembly for an arc imaging furnace
US3619562A (en) * 1970-01-22 1971-11-09 Gen Motors Corp Movable reflector infrared heater
FR2145012A5 (ja) * 1971-07-06 1973-02-16 Thomson Csf
GB1361771A (en) * 1972-02-15 1974-07-30 Leybold Heraeus Verwaltung Apparatus for heating material by means of a electron beam in a vacuum
US4015029A (en) * 1975-06-27 1977-03-29 Xerox Corporation Selenium and selenium alloy evaporation technique
DE2917841A1 (de) * 1979-05-03 1980-11-13 Leybold Heraeus Gmbh & Co Kg Verdampfer fuer vakuumaufdampfanlagen
EP0066474B1 (en) * 1981-06-02 1986-03-26 Ibt-Dubilier Limited Dispenser for ion source
IT1190892B (it) * 1982-06-24 1988-02-24 Guido Birocchi Struttura di generatore di vapore per stiratura ed usi accessori
JPS59165356A (ja) * 1983-03-09 1984-09-18 Hitachi Ltd イオン源
JPS59169125A (ja) * 1983-03-16 1984-09-25 Ushio Inc 半導体ウエハ−の加熱方法
US4503087A (en) * 1983-08-29 1985-03-05 Varian Associates, Inc. Process for high temperature drive-in diffusion of dopants into semiconductor wafers
DD251436A1 (de) * 1986-07-28 1987-11-11 Akad Wissenschaften Ddr Ionenquelle

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2017523566A (ja) * 2014-07-02 2017-08-17 ヴァリアン セミコンダクター イクイップメント アソシエイツ インコーポレイテッド イオン源の動的温度制御装置
JP2019145517A (ja) * 2014-07-02 2019-08-29 ヴァリアン セミコンダクター イクイップメント アソシエイツ インコーポレイテッド イオン源の温度制御装置

Also Published As

Publication number Publication date
KR960011851B1 (ko) 1996-09-03
US4791273A (en) 1988-12-13
KR880014646A (ko) 1988-12-24
DE3860057D1 (de) 1990-04-19
EP0291341B1 (en) 1990-03-14
CA1276319C (en) 1990-11-13
JPH0415575B2 (ja) 1992-03-18
EP0291341A1 (en) 1988-11-17

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