DE3860057D1 - Verdampfer-system fuer ionenquelle. - Google Patents
Verdampfer-system fuer ionenquelle.Info
- Publication number
- DE3860057D1 DE3860057D1 DE8888304375T DE3860057T DE3860057D1 DE 3860057 D1 DE3860057 D1 DE 3860057D1 DE 8888304375 T DE8888304375 T DE 8888304375T DE 3860057 T DE3860057 T DE 3860057T DE 3860057 D1 DE3860057 D1 DE 3860057D1
- Authority
- DE
- Germany
- Prior art keywords
- ion source
- evaporator system
- evaporator
- ion
- source
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Fee Related
Links
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J27/00—Ion beam tubes
- H01J27/02—Ion sources; Ion guns
- H01J27/20—Ion sources; Ion guns using particle beam bombardment, e.g. ionisers
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/02—Details
- H01J37/04—Arrangements of electrodes and associated parts for generating or controlling the discharge, e.g. electron-optical arrangement, ion-optical arrangement
- H01J37/08—Ion sources; Ion guns
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J27/00—Ion beam tubes
- H01J27/02—Ion sources; Ion guns
- H01J27/022—Details
Landscapes
- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Combustion & Propulsion (AREA)
- Analytical Chemistry (AREA)
- Electron Sources, Ion Sources (AREA)
- Physical Vapour Deposition (AREA)
- Crystals, And After-Treatments Of Crystals (AREA)
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US07/051,076 US4791273A (en) | 1987-05-15 | 1987-05-15 | Vaporizer system for ion source |
Publications (1)
Publication Number | Publication Date |
---|---|
DE3860057D1 true DE3860057D1 (de) | 1990-04-19 |
Family
ID=21969179
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
DE8888304375T Expired - Fee Related DE3860057D1 (de) | 1987-05-15 | 1988-05-13 | Verdampfer-system fuer ionenquelle. |
Country Status (6)
Country | Link |
---|---|
US (1) | US4791273A (de) |
EP (1) | EP0291341B1 (de) |
JP (1) | JPS6463246A (de) |
KR (1) | KR960011851B1 (de) |
CA (1) | CA1276319C (de) |
DE (1) | DE3860057D1 (de) |
Families Citing this family (13)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US5674574A (en) * | 1996-05-20 | 1997-10-07 | Micron Technology, Inc. | Vapor delivery system for solid precursors and method regarding same |
US6244575B1 (en) | 1996-10-02 | 2001-06-12 | Micron Technology, Inc. | Method and apparatus for vaporizing liquid precursors and system for using same |
US6280793B1 (en) | 1996-11-20 | 2001-08-28 | Micron Technology, Inc. | Electrostatic method and apparatus for vaporizing precursors and system for using same |
JP4820038B2 (ja) * | 1999-12-13 | 2011-11-24 | セメクイップ, インコーポレイテッド | イオン注入イオン源、システム、および方法 |
JP3485104B2 (ja) | 2001-04-24 | 2004-01-13 | 日新電機株式会社 | イオン源用オーブン |
US7326937B2 (en) * | 2005-03-09 | 2008-02-05 | Verian Semiconductor Equipment Associates, Inc. | Plasma ion implantation systems and methods using solid source of dopant material |
US7622722B2 (en) * | 2006-11-08 | 2009-11-24 | Varian Semiconductor Equipment Associates, Inc. | Ion implantation device with a dual pumping mode and method thereof |
CN103328681B (zh) * | 2011-01-20 | 2015-09-23 | 夏普株式会社 | 坩埚和蒸镀装置 |
US9287079B2 (en) * | 2014-07-02 | 2016-03-15 | Varian Semiconductor Equipment Associates, Inc. | Apparatus for dynamic temperature control of an ion source |
US10672602B2 (en) | 2014-10-13 | 2020-06-02 | Arizona Board Of Regents On Behalf Of Arizona State University | Cesium primary ion source for secondary ion mass spectrometer |
CN104534437A (zh) * | 2014-12-30 | 2015-04-22 | 陆宇光 | 用大功率双螺旋红外线加热灯管加热的光波蒸汽锅炉 |
US10954594B2 (en) | 2015-09-30 | 2021-03-23 | Applied Materials, Inc. | High temperature vapor delivery system and method |
US9928983B2 (en) * | 2016-06-30 | 2018-03-27 | Varian Semiconductor Equipment Associates, Inc. | Vaporizer for ion source |
Family Cites Families (13)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US2862441A (en) * | 1954-12-09 | 1958-12-02 | Gen Electric | Toaster-oven cooking appliance |
US3155813A (en) * | 1962-02-23 | 1964-11-03 | Little Inc A | Mirror assembly for an arc imaging furnace |
US3619562A (en) * | 1970-01-22 | 1971-11-09 | Gen Motors Corp | Movable reflector infrared heater |
FR2145012A5 (de) * | 1971-07-06 | 1973-02-16 | Thomson Csf | |
GB1361771A (en) * | 1972-02-15 | 1974-07-30 | Leybold Heraeus Verwaltung | Apparatus for heating material by means of a electron beam in a vacuum |
US4015029A (en) * | 1975-06-27 | 1977-03-29 | Xerox Corporation | Selenium and selenium alloy evaporation technique |
DE2917841A1 (de) * | 1979-05-03 | 1980-11-13 | Leybold Heraeus Gmbh & Co Kg | Verdampfer fuer vakuumaufdampfanlagen |
DE3270076D1 (en) * | 1981-06-02 | 1986-04-30 | Ibt Dubilier Ltd | Dispenser for ion source |
IT1190892B (it) * | 1982-06-24 | 1988-02-24 | Guido Birocchi | Struttura di generatore di vapore per stiratura ed usi accessori |
JPS59165356A (ja) * | 1983-03-09 | 1984-09-18 | Hitachi Ltd | イオン源 |
JPS59169125A (ja) * | 1983-03-16 | 1984-09-25 | Ushio Inc | 半導体ウエハ−の加熱方法 |
US4503087A (en) * | 1983-08-29 | 1985-03-05 | Varian Associates, Inc. | Process for high temperature drive-in diffusion of dopants into semiconductor wafers |
DD251436A1 (de) * | 1986-07-28 | 1987-11-11 | Akad Wissenschaften Ddr | Ionenquelle |
-
1987
- 1987-05-15 US US07/051,076 patent/US4791273A/en not_active Expired - Lifetime
-
1988
- 1988-05-13 CA CA000566828A patent/CA1276319C/en not_active Expired - Fee Related
- 1988-05-13 DE DE8888304375T patent/DE3860057D1/de not_active Expired - Fee Related
- 1988-05-13 EP EP88304375A patent/EP0291341B1/de not_active Expired - Lifetime
- 1988-05-13 KR KR1019880005546A patent/KR960011851B1/ko not_active IP Right Cessation
- 1988-05-13 JP JP63115040A patent/JPS6463246A/ja active Granted
Also Published As
Publication number | Publication date |
---|---|
KR960011851B1 (ko) | 1996-09-03 |
CA1276319C (en) | 1990-11-13 |
US4791273A (en) | 1988-12-13 |
KR880014646A (ko) | 1988-12-24 |
JPH0415575B2 (de) | 1992-03-18 |
EP0291341A1 (de) | 1988-11-17 |
JPS6463246A (en) | 1989-03-09 |
EP0291341B1 (de) | 1990-03-14 |
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Legal Events
Date | Code | Title | Description |
---|---|---|---|
8364 | No opposition during term of opposition | ||
8327 | Change in the person/name/address of the patent owner |
Owner name: VARIAN SEMICONDUCTOR EQUIPMENT ASSOCIATES, INC.(N. |
|
8339 | Ceased/non-payment of the annual fee |