JPS6459920A - Device for forming thin film - Google Patents
Device for forming thin filmInfo
- Publication number
- JPS6459920A JPS6459920A JP21703187A JP21703187A JPS6459920A JP S6459920 A JPS6459920 A JP S6459920A JP 21703187 A JP21703187 A JP 21703187A JP 21703187 A JP21703187 A JP 21703187A JP S6459920 A JPS6459920 A JP S6459920A
- Authority
- JP
- Japan
- Prior art keywords
- substrate
- thin film
- electrons
- flat part
- energy
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Abstract
PURPOSE:To improve the adhesion properties of a thin film to the irregular part of a substrate by a method wherein a magnet field where the incident direction of electrons supplied from plasma or electron supply to be entered into the substrate is inclined to the normal of substrate is provided. CONSTITUTION:The title thin film forming device is provided with multiple electron sources 12 inclined to a substrate 4 as well as deflecting magnets 13 changing the irradiating positions of electrons (e) radiated from the electron sources 12 to the substrate 4 with the lapse of time. Consequently, sufficient energy by the irradiation of electrons (e) can be given to the step parts 4d of the substrate 4 where the energy by incident ion i is in short supply due to the incident ion i direction of supplied energy almost in parallel with the incident ion i direction of reactive gas 8 comparing with the flat part 4e as well as the deposition speed of thin film 4c is decelerated comparing with that of the flat part 4e so that the deposition speed in the part between the step part 4d and the flat part 4e may be equalized to improve the adhesion properties and the film quality of the thin film 4c to the irregular parts of the substrate 4.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP21703187A JPS6459920A (en) | 1987-08-31 | 1987-08-31 | Device for forming thin film |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP21703187A JPS6459920A (en) | 1987-08-31 | 1987-08-31 | Device for forming thin film |
Publications (1)
Publication Number | Publication Date |
---|---|
JPS6459920A true JPS6459920A (en) | 1989-03-07 |
Family
ID=16697753
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP21703187A Pending JPS6459920A (en) | 1987-08-31 | 1987-08-31 | Device for forming thin film |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS6459920A (en) |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2012518722A (en) * | 2009-02-19 | 2012-08-16 | 富士フイルム株式会社 | Physical vapor deposition with an impedance matching network. |
-
1987
- 1987-08-31 JP JP21703187A patent/JPS6459920A/en active Pending
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2012518722A (en) * | 2009-02-19 | 2012-08-16 | 富士フイルム株式会社 | Physical vapor deposition with an impedance matching network. |
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