JPS6455394A - Production of high-purity electrolytic copper - Google Patents

Production of high-purity electrolytic copper

Info

Publication number
JPS6455394A
JPS6455394A JP62210235A JP21023587A JPS6455394A JP S6455394 A JPS6455394 A JP S6455394A JP 62210235 A JP62210235 A JP 62210235A JP 21023587 A JP21023587 A JP 21023587A JP S6455394 A JPS6455394 A JP S6455394A
Authority
JP
Japan
Prior art keywords
copper
electrolyte
cathode
electrolytic
purity
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP62210235A
Other languages
English (en)
Japanese (ja)
Other versions
JPH055903B2 (esLanguage
Inventor
Yoichi Takazawa
Shiro Kawai
Yoshichika Toyoshima
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Eneos Corp
Original Assignee
Nippon Mining Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Nippon Mining Co Ltd filed Critical Nippon Mining Co Ltd
Priority to JP62210235A priority Critical patent/JPS6455394A/ja
Publication of JPS6455394A publication Critical patent/JPS6455394A/ja
Publication of JPH055903B2 publication Critical patent/JPH055903B2/ja
Granted legal-status Critical Current

Links

Classifications

    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
    • Y02P—CLIMATE CHANGE MITIGATION TECHNOLOGIES IN THE PRODUCTION OR PROCESSING OF GOODS
    • Y02P10/00—Technologies related to metal processing
    • Y02P10/20—Recycling

Landscapes

  • Electrolytic Production Of Metals (AREA)
JP62210235A 1987-08-26 1987-08-26 Production of high-purity electrolytic copper Granted JPS6455394A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP62210235A JPS6455394A (en) 1987-08-26 1987-08-26 Production of high-purity electrolytic copper

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP62210235A JPS6455394A (en) 1987-08-26 1987-08-26 Production of high-purity electrolytic copper

Publications (2)

Publication Number Publication Date
JPS6455394A true JPS6455394A (en) 1989-03-02
JPH055903B2 JPH055903B2 (esLanguage) 1993-01-25

Family

ID=16586024

Family Applications (1)

Application Number Title Priority Date Filing Date
JP62210235A Granted JPS6455394A (en) 1987-08-26 1987-08-26 Production of high-purity electrolytic copper

Country Status (1)

Country Link
JP (1) JPS6455394A (esLanguage)

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6451135B1 (en) * 1997-06-02 2002-09-17 Japan Energy Corporation High-purity copper sputtering targets and thin films
WO2010038641A1 (ja) 2008-09-30 2010-04-08 日鉱金属株式会社 高純度銅及び電解による高純度銅の製造方法
WO2010038642A1 (ja) 2008-09-30 2010-04-08 日鉱金属株式会社 高純度銅又は高純度銅合金スパッタリングターゲット、同スパッタリングターゲットの製造方法及び高純度銅又は高純度銅合金スパッタ膜
JP2012072458A (ja) * 2010-09-29 2012-04-12 Pan Pacific Copper Co Ltd ニカワ供給装置及びニカワ供給方法

Citations (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5310930B2 (esLanguage) * 1973-07-19 1978-04-18
JPS5532795B2 (esLanguage) * 1974-12-24 1980-08-27
JPS5611756B2 (esLanguage) * 1974-03-20 1981-03-17
JPS5716188A (en) * 1980-07-03 1982-01-27 Furukawa Electric Co Ltd:The Electrolytic refinery of copper
JPS5716187A (en) * 1980-06-20 1982-01-27 Furukawa Electric Co Ltd:The Electrolytic refinery of copper
JPS5942754A (ja) * 1982-08-31 1984-03-09 Shimadzu Corp 研削加工装置
JPS5976886A (ja) * 1982-10-22 1984-05-02 Nippon Mining Co Ltd 銅の電解精製法
JPS607711A (ja) * 1983-06-28 1985-01-16 東北金属工業株式会社 積層セラミツクコンデンサ−とその製造方法
JPS6133918A (ja) * 1984-07-26 1986-02-18 東洋製罐株式会社 封止装置

Patent Citations (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5310930B2 (esLanguage) * 1973-07-19 1978-04-18
JPS5611756B2 (esLanguage) * 1974-03-20 1981-03-17
JPS5532795B2 (esLanguage) * 1974-12-24 1980-08-27
JPS5716187A (en) * 1980-06-20 1982-01-27 Furukawa Electric Co Ltd:The Electrolytic refinery of copper
JPS5716188A (en) * 1980-07-03 1982-01-27 Furukawa Electric Co Ltd:The Electrolytic refinery of copper
JPS5942754A (ja) * 1982-08-31 1984-03-09 Shimadzu Corp 研削加工装置
JPS5976886A (ja) * 1982-10-22 1984-05-02 Nippon Mining Co Ltd 銅の電解精製法
JPS607711A (ja) * 1983-06-28 1985-01-16 東北金属工業株式会社 積層セラミツクコンデンサ−とその製造方法
JPS6133918A (ja) * 1984-07-26 1986-02-18 東洋製罐株式会社 封止装置

Cited By (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6451135B1 (en) * 1997-06-02 2002-09-17 Japan Energy Corporation High-purity copper sputtering targets and thin films
WO2010038641A1 (ja) 2008-09-30 2010-04-08 日鉱金属株式会社 高純度銅及び電解による高純度銅の製造方法
WO2010038642A1 (ja) 2008-09-30 2010-04-08 日鉱金属株式会社 高純度銅又は高純度銅合金スパッタリングターゲット、同スパッタリングターゲットの製造方法及び高純度銅又は高純度銅合金スパッタ膜
US9441289B2 (en) 2008-09-30 2016-09-13 Jx Nippon Mining & Metals Corporation High-purity copper or high-purity copper alloy sputtering target, process for manufacturing the sputtering target, and high-purity copper or high-purity copper alloy sputtered film
US9476134B2 (en) 2008-09-30 2016-10-25 Jx Nippon Mining & Metals Corporation High purity copper and method of producing high purity copper based on electrolysis
EP3128039A1 (en) 2008-09-30 2017-02-08 JX Nippon Mining & Metals Corp. High-purity copper sputtering target or high-purity copper alloy sputtering target
JP2012072458A (ja) * 2010-09-29 2012-04-12 Pan Pacific Copper Co Ltd ニカワ供給装置及びニカワ供給方法

Also Published As

Publication number Publication date
JPH055903B2 (esLanguage) 1993-01-25

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