JPS6454454A - Mask and its manufacture - Google Patents

Mask and its manufacture

Info

Publication number
JPS6454454A
JPS6454454A JP20920187A JP20920187A JPS6454454A JP S6454454 A JPS6454454 A JP S6454454A JP 20920187 A JP20920187 A JP 20920187A JP 20920187 A JP20920187 A JP 20920187A JP S6454454 A JPS6454454 A JP S6454454A
Authority
JP
Japan
Prior art keywords
negative plate
mask
pattern
image
exposed
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP20920187A
Other languages
Japanese (ja)
Inventor
Hiroshi Ito
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Toshiba Corp
Original Assignee
Toshiba Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Toshiba Corp filed Critical Toshiba Corp
Priority to JP20920187A priority Critical patent/JPS6454454A/en
Publication of JPS6454454A publication Critical patent/JPS6454454A/en
Pending legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70216—Mask projection systems
    • G03F7/70308—Optical correction elements, filters or phase plates for manipulating imaging light, e.g. intensity, wavelength, polarisation, phase or image shift
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70216—Mask projection systems
    • G03F7/70241—Optical aspects of refractive lens systems, i.e. comprising only refractive elements

Abstract

PURPOSE:To prevent a formed image from being distorted by providing a mask where a desired pattern is formed at the position of a member to be projected, etching the part which is exposed to light passed through the pattern of the mask and forming a negative plate, and using the negative plate as a mask for working. CONSTITUTION:A reference mask 11 is congruent with or similar to a marking image and the pattern 12 which passes light is accurately formed. A 2nd coupling lens 13 with focal length f2 is provided opposite a 1st image forming lens 10 almost coaxially at a distance f2 from a focus f1 so as to constitute an afocal system with the 1st coupling lens 10. The negative plate 14 provided at an optional position on an optical path of parallel luminous flux passed through the 2nd coupling lens 13 is a laminate formed by forming an opaque film 16 and a layer of positive resist 17 on the surface of a glass substrate 15, and the surface of the resist 17 is irradiated. Namely, the resist 17 is exposed in the same shape with the pattern 12, the exposed part is washed away, and then etching is carried out to form a transparent part 18 on the negative plate 14. Consequently, an image whose distortion is compensated is formed on the negative plate 14.
JP20920187A 1987-08-25 1987-08-25 Mask and its manufacture Pending JPS6454454A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP20920187A JPS6454454A (en) 1987-08-25 1987-08-25 Mask and its manufacture

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP20920187A JPS6454454A (en) 1987-08-25 1987-08-25 Mask and its manufacture

Publications (1)

Publication Number Publication Date
JPS6454454A true JPS6454454A (en) 1989-03-01

Family

ID=16569026

Family Applications (1)

Application Number Title Priority Date Filing Date
JP20920187A Pending JPS6454454A (en) 1987-08-25 1987-08-25 Mask and its manufacture

Country Status (1)

Country Link
JP (1) JPS6454454A (en)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP0601621A1 (en) * 1992-11-12 1994-06-15 International Business Machines Corporation Three dimensional imaging system

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP0601621A1 (en) * 1992-11-12 1994-06-15 International Business Machines Corporation Three dimensional imaging system
US5822042A (en) * 1992-11-12 1998-10-13 International Business Machines Corporation Three dimensional imaging system

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