JPS6453311A - Manufacture of thin film magnetic head - Google Patents

Abstract

PURPOSE:To prevent the warpage of a substrate or the cracking of a magnetic film from being generated by filming a first layer by moving a film plane relatively for the target of sputtering, fixing the film plane, and filming a second layer on the first layer by impressing a bias voltage on the first layer to relax the stress of the magnetic film. CONSTITUTION:Every member of 1-4 is filmed on the substrate 6 by the sputtering or vapor-deposition, etc., in order, and is formed in respective pattern by applying photolithographic etching. Next, an upper magnetic film 5 is filmed by dividing into two layers 5a and 5b. The filming of the first layer 5a is performed by rotating the substrate 6 in a sputtering device for the target, and is performed so that the metallic particle of a target material to be sputtered can fly and leap in from various directions. Next, the filming of the second layer 5b is performed by fixing the substrate 6 on the target and impressing the bias voltage. In such a way, it is possible to improve the step coverage of the magnetic film and to prevent the generation of the cracking and the warpage of the substrate from being generated.