JPS6452155A - Member for forming durable pattern - Google Patents
Member for forming durable patternInfo
- Publication number
- JPS6452155A JPS6452155A JP19963687A JP19963687A JPS6452155A JP S6452155 A JPS6452155 A JP S6452155A JP 19963687 A JP19963687 A JP 19963687A JP 19963687 A JP19963687 A JP 19963687A JP S6452155 A JPS6452155 A JP S6452155A
- Authority
- JP
- Japan
- Prior art keywords
- compd
- curable
- protective film
- photomask
- photomask substrate
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
Landscapes
- Preparing Plates And Mask In Photomechanical Process (AREA)
Abstract
PURPOSE:To impart durability to a pattern forming member by forming a protective film consisting of a curable compd. on a photomask substrate provided with patterns. CONSTITUTION:The patterns of desired shapes are provided on a glass or plastic film to form the photomask substrate and lithographic film. A protective film consisting of the curable compd. is formed on this substrate. The curable compd. which is cured by active energy rays such as UV rays or by heating and ordinary temp. is used. For example, a curable phosphazene compd., photopolymerizable monomer, photopolymerizable prepolymer, urethane compd., etc., are used. More specifically, 1,1,3,3,5,5-hexa(methacryloyl ethylenedioxy) cyclotriphosphazene, etc., are used. The protective film which does not lower resolving power is, therefore, formed on the photomask by which the photomask substrate is mechanically and chemically improved and the durability is improved.
Priority Applications (5)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP19963687A JPH077207B2 (en) | 1987-05-16 | 1987-08-10 | Durable pattern forming member |
EP19880904670 EP0328648A4 (en) | 1987-08-10 | 1988-06-06 | Durable patterning member |
PCT/JP1988/000546 WO1989001650A1 (en) | 1987-08-10 | 1988-06-06 | Durable patterning member |
KR1019880701566A KR930001852B1 (en) | 1987-08-10 | 1988-06-06 | Durable patterning member |
US07/360,935 US5051295A (en) | 1987-08-10 | 1988-06-06 | Protective film for photo masks and lith films |
Applications Claiming Priority (3)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP62-119926 | 1987-05-16 | ||
JP11992687 | 1987-05-16 | ||
JP19963687A JPH077207B2 (en) | 1987-05-16 | 1987-08-10 | Durable pattern forming member |
Publications (2)
Publication Number | Publication Date |
---|---|
JPS6452155A true JPS6452155A (en) | 1989-02-28 |
JPH077207B2 JPH077207B2 (en) | 1995-01-30 |
Family
ID=26457582
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP19963687A Expired - Lifetime JPH077207B2 (en) | 1987-05-16 | 1987-08-10 | Durable pattern forming member |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPH077207B2 (en) |
Cited By (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH11305420A (en) * | 1998-04-27 | 1999-11-05 | Shineisha:Kk | Photomask raw glass with surface film protective layer and its production and protective layer forming liquid |
JP2002090982A (en) * | 2000-09-13 | 2002-03-27 | Kimoto & Co Ltd | Method for manufacturing photomask, and photomask |
JP2002278047A (en) * | 2001-03-19 | 2002-09-27 | Kimoto & Co Ltd | Protective solution for photomask and method for producing photomask with protective film |
JP2006337726A (en) * | 2005-06-02 | 2006-12-14 | Topic:Kk | Photomask |
JP2020529728A (en) * | 2017-07-31 | 2020-10-08 | サントル ナシオナル ドゥ ラ ルシェルシェ サイアンティフィク | Improved mask to protect semiconductor materials for localized etching applications |
Citations (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS5616137A (en) * | 1979-07-17 | 1981-02-16 | Mitsubishi Electric Corp | Transfer mask for x-ray exposure |
JPS61261745A (en) * | 1985-05-16 | 1986-11-19 | Toyobo Co Ltd | Surface treated glass photomask |
-
1987
- 1987-08-10 JP JP19963687A patent/JPH077207B2/en not_active Expired - Lifetime
Patent Citations (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS5616137A (en) * | 1979-07-17 | 1981-02-16 | Mitsubishi Electric Corp | Transfer mask for x-ray exposure |
JPS61261745A (en) * | 1985-05-16 | 1986-11-19 | Toyobo Co Ltd | Surface treated glass photomask |
Cited By (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH11305420A (en) * | 1998-04-27 | 1999-11-05 | Shineisha:Kk | Photomask raw glass with surface film protective layer and its production and protective layer forming liquid |
JP2002090982A (en) * | 2000-09-13 | 2002-03-27 | Kimoto & Co Ltd | Method for manufacturing photomask, and photomask |
JP2002278047A (en) * | 2001-03-19 | 2002-09-27 | Kimoto & Co Ltd | Protective solution for photomask and method for producing photomask with protective film |
JP2006337726A (en) * | 2005-06-02 | 2006-12-14 | Topic:Kk | Photomask |
JP2020529728A (en) * | 2017-07-31 | 2020-10-08 | サントル ナシオナル ドゥ ラ ルシェルシェ サイアンティフィク | Improved mask to protect semiconductor materials for localized etching applications |
Also Published As
Publication number | Publication date |
---|---|
JPH077207B2 (en) | 1995-01-30 |
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