JPS6452155A - Member for forming durable pattern - Google Patents

Member for forming durable pattern

Info

Publication number
JPS6452155A
JPS6452155A JP19963687A JP19963687A JPS6452155A JP S6452155 A JPS6452155 A JP S6452155A JP 19963687 A JP19963687 A JP 19963687A JP 19963687 A JP19963687 A JP 19963687A JP S6452155 A JPS6452155 A JP S6452155A
Authority
JP
Japan
Prior art keywords
compd
curable
protective film
photomask
photomask substrate
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP19963687A
Other languages
Japanese (ja)
Other versions
JPH077207B2 (en
Inventor
Shigeo Mori
Atsunori Yaguchi
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Idemitsu Petrochemical Co Ltd
Original Assignee
Idemitsu Petrochemical Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Idemitsu Petrochemical Co Ltd filed Critical Idemitsu Petrochemical Co Ltd
Priority to JP19963687A priority Critical patent/JPH077207B2/en
Priority to EP19880904670 priority patent/EP0328648A4/en
Priority to PCT/JP1988/000546 priority patent/WO1989001650A1/en
Priority to KR1019880701566A priority patent/KR930001852B1/en
Priority to US07/360,935 priority patent/US5051295A/en
Publication of JPS6452155A publication Critical patent/JPS6452155A/en
Publication of JPH077207B2 publication Critical patent/JPH077207B2/en
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

Links

Landscapes

  • Preparing Plates And Mask In Photomechanical Process (AREA)

Abstract

PURPOSE:To impart durability to a pattern forming member by forming a protective film consisting of a curable compd. on a photomask substrate provided with patterns. CONSTITUTION:The patterns of desired shapes are provided on a glass or plastic film to form the photomask substrate and lithographic film. A protective film consisting of the curable compd. is formed on this substrate. The curable compd. which is cured by active energy rays such as UV rays or by heating and ordinary temp. is used. For example, a curable phosphazene compd., photopolymerizable monomer, photopolymerizable prepolymer, urethane compd., etc., are used. More specifically, 1,1,3,3,5,5-hexa(methacryloyl ethylenedioxy) cyclotriphosphazene, etc., are used. The protective film which does not lower resolving power is, therefore, formed on the photomask by which the photomask substrate is mechanically and chemically improved and the durability is improved.
JP19963687A 1987-05-16 1987-08-10 Durable pattern forming member Expired - Lifetime JPH077207B2 (en)

Priority Applications (5)

Application Number Priority Date Filing Date Title
JP19963687A JPH077207B2 (en) 1987-05-16 1987-08-10 Durable pattern forming member
EP19880904670 EP0328648A4 (en) 1987-08-10 1988-06-06 Durable patterning member
PCT/JP1988/000546 WO1989001650A1 (en) 1987-08-10 1988-06-06 Durable patterning member
KR1019880701566A KR930001852B1 (en) 1987-08-10 1988-06-06 Durable patterning member
US07/360,935 US5051295A (en) 1987-08-10 1988-06-06 Protective film for photo masks and lith films

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
JP62-119926 1987-05-16
JP11992687 1987-05-16
JP19963687A JPH077207B2 (en) 1987-05-16 1987-08-10 Durable pattern forming member

Publications (2)

Publication Number Publication Date
JPS6452155A true JPS6452155A (en) 1989-02-28
JPH077207B2 JPH077207B2 (en) 1995-01-30

Family

ID=26457582

Family Applications (1)

Application Number Title Priority Date Filing Date
JP19963687A Expired - Lifetime JPH077207B2 (en) 1987-05-16 1987-08-10 Durable pattern forming member

Country Status (1)

Country Link
JP (1) JPH077207B2 (en)

Cited By (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH11305420A (en) * 1998-04-27 1999-11-05 Shineisha:Kk Photomask raw glass with surface film protective layer and its production and protective layer forming liquid
JP2002090982A (en) * 2000-09-13 2002-03-27 Kimoto & Co Ltd Method for manufacturing photomask, and photomask
JP2002278047A (en) * 2001-03-19 2002-09-27 Kimoto & Co Ltd Protective solution for photomask and method for producing photomask with protective film
JP2006337726A (en) * 2005-06-02 2006-12-14 Topic:Kk Photomask
JP2020529728A (en) * 2017-07-31 2020-10-08 サントル ナシオナル ドゥ ラ ルシェルシェ サイアンティフィク Improved mask to protect semiconductor materials for localized etching applications

Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5616137A (en) * 1979-07-17 1981-02-16 Mitsubishi Electric Corp Transfer mask for x-ray exposure
JPS61261745A (en) * 1985-05-16 1986-11-19 Toyobo Co Ltd Surface treated glass photomask

Patent Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5616137A (en) * 1979-07-17 1981-02-16 Mitsubishi Electric Corp Transfer mask for x-ray exposure
JPS61261745A (en) * 1985-05-16 1986-11-19 Toyobo Co Ltd Surface treated glass photomask

Cited By (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH11305420A (en) * 1998-04-27 1999-11-05 Shineisha:Kk Photomask raw glass with surface film protective layer and its production and protective layer forming liquid
JP2002090982A (en) * 2000-09-13 2002-03-27 Kimoto & Co Ltd Method for manufacturing photomask, and photomask
JP2002278047A (en) * 2001-03-19 2002-09-27 Kimoto & Co Ltd Protective solution for photomask and method for producing photomask with protective film
JP2006337726A (en) * 2005-06-02 2006-12-14 Topic:Kk Photomask
JP2020529728A (en) * 2017-07-31 2020-10-08 サントル ナシオナル ドゥ ラ ルシェルシェ サイアンティフィク Improved mask to protect semiconductor materials for localized etching applications

Also Published As

Publication number Publication date
JPH077207B2 (en) 1995-01-30

Similar Documents

Publication Publication Date Title
ES2059762T3 (en) PROCEDURE FOR PRODUCING AN ARTICLE CONTAINING A POLYMER RETICULATED BY RADIATION AND THE ARTICLE SO PRODUCED.
JPS6435432A (en) Lithographic plate and manufacture thereof
GB2291219B (en) Photo-mask fabrication and use
DE58906471D1 (en) Positive and negative working radiation sensitive mixtures as well as processes for the production of relief patterns.
EP0232973A3 (en) Microplastic structures, process for forming such structures, and photomask suitable for use in such process
PT97474A (en) PROCESS FOR THE PREPARATION OF UREIA-POLYSILOXANOS, NOT SATURATED, UTEIS FOR CONTACT LENSES
JPS52117985A (en) Photosensitive polymer composition
JPS6452155A (en) Member for forming durable pattern
DE3175216D1 (en) Method of producing resist patterns
JPS6458373A (en) Manufacture of frosted synthetic resin molding
FR2472768B1 (en)
JPS6446702A (en) Production of antidazzle filter
JPS56104437A (en) Formation of pattern
JPS53112932A (en) Coating of electron radiation curing thick coating paint
JPS5735856A (en) Formation of micropattern
JPS5655943A (en) Pattern forming method
JPS53132039A (en) Adhesive composition
JPS5236993A (en) Method of manufacturing recycle reflection sheet
JPS56167412A (en) Manufacture of decorative sheet with harmonized embossment
FI890500A (en) STRAOLNINGSKAENSLIGA FOERENINGAR.
JPS56142638A (en) Forming method for minute pattern
JPS5622433A (en) Fabrication of polymer mask substrate for x-ray exposure
JPS5670547A (en) Minute pattern forming method
JPS5553328A (en) Production of integrated circuit element
JPS649447A (en) Pattern forming process