JPH11305420A - Photomask raw glass with surface film protective layer and its production and protective layer forming liquid - Google Patents
Photomask raw glass with surface film protective layer and its production and protective layer forming liquidInfo
- Publication number
- JPH11305420A JPH11305420A JP11743898A JP11743898A JPH11305420A JP H11305420 A JPH11305420 A JP H11305420A JP 11743898 A JP11743898 A JP 11743898A JP 11743898 A JP11743898 A JP 11743898A JP H11305420 A JPH11305420 A JP H11305420A
- Authority
- JP
- Japan
- Prior art keywords
- mixing
- protective layer
- acetate
- photomask
- prepared
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Abstract
Description
【０００１】[0001]
【産業上の利用分野】ＩＣ用リードフレームやカラーテ
レビ用シャドウマスク、高密度プリント配線板、小型歯
車、薄型ディスプレイ（ＬＣＤ・ＰＤＰ）の電極や隔壁
の形成などマイクロ精密加工方法には、フォトファブリ
ケーション加工（Photo-Fabrication)と呼ばれる方法が
ある。BACKGROUND OF THE INVENTION Microfabrication methods such as forming lead frames for ICs, shadow masks for color televisions, high-density printed wiring boards, small gears, electrodes and partitions for thin displays (LCD / PDP), and photofabrication. There is a method called application processing (Photo-Fabrication).
【０００２】当該フォトファブリケーション加工には、
加工面を耐食性被膜で覆い、一部を除去し、除去した面
を化学的に溶解除去するフォトエッチング加工(Photo-E
tcing)と、電鋳的に金属を成長させるフォトエレクトロ
フォーミング加工(Photo-Electroforming)方法がある。[0002] In the photo fabrication process,
Photo-etching process (Photo-E) in which the processed surface is covered with a corrosion resistant film, a part is removed, and the removed surface is chemically dissolved and removed.
tcing) and photo-electroforming (Photo-Electroforming) method of growing metal by electroforming.
【０００３】いずれの場合も、加工しない部分を耐食性
のある皮膜で覆う。いわゆるマスキング(Masking) 工程
を経て行われる。このマスキング加工は、紫外線に感光
性を有する感光性塗料（樹脂）に、精密に作られた写真
原稿を重ね、露光、現像、乾燥を経て行う、いわゆる写
真法で行われるのが一般的である。[0003] In each case, the unprocessed portion is covered with a corrosion-resistant film. This is performed through a so-called masking process. This masking process is generally performed by a so-called photographic method in which a precisely prepared photographic original is superimposed on a photosensitive paint (resin) having sensitivity to ultraviolet rays, and is exposed, developed, and dried. .
【０００４】本発明は、この写真原版であるフォトマス
ク（エマルジョン）の乳剤層を保護するための膜面保護
層を積層形成することに関する技術である。The present invention relates to a technique relating to laminating a film surface protective layer for protecting an emulsion layer of a photomask (emulsion) as a photographic master.
【０００５】[0005]
【従来の技術】従来よりフォトマスクは、目的となる図
面またはデータを基にＣＡＤシステムにより露光装置
（フォトプロッター等）用データを作成し、このデータ
によりエマルジョン乾板に図形を描画記録し、その描画
された乾板を、現像、定着、水洗、乾燥、修正、検査の
工程を経て完成する。しかし、このようにして出来たエ
マルジョンマスクの膜面（乳剤層）は、ゼラチンが主成
分であるため、柔らかく、傷つきやすい。また、膜面に
指紋等汚れが付着すると除去するのが困難であるなどの
欠点がある。膜面に８μ〜１２μ程度のフイルムを保護
膜としてラミネートする方法があるが、紫外線透過率が
５０％程度に低下してしまう。更に、エマルジョンマス
クに変わるものとしてクロムマスク（膜面がＣｒ）にす
る方法もあるが、非常に高価（エマルジョンマスクの４
倍〜５倍）であり、実用性に欠ける欠点がある。2. Description of the Related Art Conventionally, in a photomask, data for an exposure apparatus (such as a photoplotter) is created by a CAD system based on a target drawing or data, and a figure is drawn and recorded on an emulsion dry plate using the data, and the drawing is performed. The dried plate is completed through the steps of developing, fixing, washing, drying, correcting and inspecting. However, the film surface (emulsion layer) of the emulsion mask formed in this way is soft and easily damaged because gelatin is a main component. In addition, there is a drawback such that it is difficult to remove the stains such as fingerprints if they adhere to the film surface. Although there is a method of laminating a film of about 8 μm to 12 μm on the film surface as a protective film, the ultraviolet transmittance is reduced to about 50%. Further, there is a method of using a chromium mask (the film surface is Cr) as an alternative to the emulsion mask.
Times to 5 times), which has a disadvantage of lacking practicality.
【０００６】[0006]
【発明が解決しようとする課題】本発明の目的は、従来
工法で作られたエマルジョンマスクの乳剤層のうえに第
二層の保護層を形成することにより、傷つき易すさや、
膜面の汚れ易さといった欠点を克服するとともに、ラミ
ネート保護膜のような紫外線透過率低下を防ぎ、安価で
耐久性のあるフォトマスクを提供せんとするものであ
る。SUMMARY OF THE INVENTION An object of the present invention is to form a second protective layer on an emulsion layer of an emulsion mask formed by a conventional method, thereby making it easier to be damaged,
An object of the present invention is to provide a photomask which is inexpensive and durable, while overcoming the drawbacks such as easy contamination of the film surface and preventing a decrease in the transmittance of ultraviolet rays as in a laminate protective film.
【０００７】[0007]
【課題を解決するための手段】特許を受けようとする第
１発明は、ガラス基板に乳剤層の膜面（エマルジョンマ
スク）を形成してなるフォトマスク原版上に、２液架橋
型防汚性表面コート剤ディフェンサＴＲ−３１０（大日
本インキ化学工業株式会社製）に、酢酸ブチルとメチル
エチルケトン（ＭＥＫ）と酢酸セロソルブとからなる溶
剤を調合してなる主剤と、硬化剤バーノックＤＮ−９５
０に溶剤酢酸エチルを調合してなる硬化剤と、酢酸ブチ
ルとメチルエチルケトン（ＭＥＫ）と酢酸セロソルブと
を調合してなる希釈剤とを混合してなる保護層形成液に
より膜面保護層を積層形成したことを特徴とする膜面保
護層付きフォトマスク原版である。According to a first aspect of the present invention, a two-part cross-linking type antifouling agent is provided on a photomask master having a film surface of an emulsion layer (emulsion mask) formed on a glass substrate. A base agent obtained by mixing a solvent consisting of butyl acetate, methyl ethyl ketone (MEK) and cellosolve acetate with a surface coating agent Defensa TR-310 (manufactured by Dainippon Ink and Chemicals, Inc.), and a hardener Vernock DN-95
A protective layer forming solution is formed by mixing a curing agent prepared by mixing the solvent ethyl acetate with 0 and a diluent prepared by mixing butyl acetate, methyl ethyl ketone (MEK) and cellosolve acetate to form a protective layer on the film surface. An original photomask with a film surface protective layer, characterized in that:
【０００８】第１発明は、膜面保護層付きフォトマスク
原版である。従来のフォトマスク原版の乳剤層の上に第
二層として膜面保護層を形成した点に特徴がある。当該
膜面保護膜の主要部材である２液架橋型防汚性表面コー
ト剤ディフェンサＴＲ−３１０は、大日本インキ化学工
業株式会社製であるが、これは密着性に優れた２液架橋
型表面コーティング剤で、軟質から硬質まで幅広い基材
に対して耐久性に優れた皮膜を形成するし、無色透明液
体で、折曲げ、延伸による白化が起こりにくく殆ど紫外
線透過率を低下しない特性がある。保護層形成液は、当
該ディフェンサＴＲ−３１０を溶剤で溶かしたものを主
剤とし、これに硬化剤と希釈剤とを混合したものであ
る。従って、形成された膜面保護層も、その主剤の特性
がそのまま特徴となるので、本願発明の膜面保護層付き
フォトマスク原版は、傷つきにくく、汚れにくく、紫外
線透過率が低下せず、安価で耐久性のあるフォトマスク
となる。The first invention is an original photomask having a film surface protective layer. It is characterized in that a film surface protective layer is formed as a second layer on the emulsion layer of a conventional photomask master. The two-component cross-linkable antifouling surface coating agent Defensor TR-310, which is a main component of the film surface protective film, is manufactured by Dainippon Ink and Chemicals, Inc. The coating agent forms a film with excellent durability on a wide range of substrates from soft to hard. It is a colorless and transparent liquid, and hardly causes whitening due to bending or stretching, and has a property of hardly lowering the ultraviolet transmittance. The protective layer forming liquid is obtained by dissolving the defensor TR-310 in a solvent as a main component, and mixing a hardener and a diluent with the main component. Therefore, since the formed film surface protective layer also has the characteristics of the main agent as it is, the photomask master with the film surface protective layer of the present invention is hardly damaged, hardly stained, does not reduce ultraviolet transmittance, and is inexpensive. And a durable photomask.
【０００９】特許を受けようとする第２発明は、ガラス
基板に乳剤層の膜面（エマルジョンマスク）を形成して
なるフォトマスク原版上に、２液架橋型防汚性表面コー
ト剤ディフェンサＴＲ−３１０（大日本インキ化学工業
株式会社製）に、酢酸ブチルとメチルエチルケトン（Ｍ
ＥＫ）と酢酸セロソルブとからなる溶剤を調合してなる
主剤２５％〜５０％と、硬化剤バーノックＤＮ−９５０
に溶剤酢酸エチルを調合してなる硬化剤１％〜４％と、
酢酸ブチルとメチルエチルケトン（ＭＥＫ）と酢酸セロ
ソルブとを調合してなる希釈剤４６〜７５％とを混合し
てなる保護層形成液にて膜面保護層を積層形成したこと
を特徴とする膜面保護層付きフォトマスク原版である。The second invention to be patented is a two-part cross-linkable antifouling surface coating agent Defensor TR- on a photomask master having an emulsion layer film surface (emulsion mask) formed on a glass substrate. 310 (manufactured by Dainippon Ink and Chemicals, Inc.) with butyl acetate and methyl ethyl ketone (M
EK) and a solvent consisting of cellosolve acetate, 25% to 50% of a main agent, and a hardener Vernock DN-950.
1% to 4% of a curing agent prepared by mixing the solvent ethyl acetate with
Film surface protection characterized in that a film surface protection layer is formed by laminating with a protection layer forming solution obtained by mixing 46 to 75% of a diluent obtained by mixing butyl acetate, methyl ethyl ketone (MEK) and cellosolve acetate. It is an original photomask with layers.
【００１０】当該第２発明は、第１発明の膜面保護層付
きフォトマスク原版において、最も好適な調合の保護層
形成液にて膜面保護層を積層形成した場合のものであ
る。特許を受けようとする第３発明は、ガラス基板に感
光乳剤層の膜面（エマルジョンマスク）を形成してなる
エマルジョン乾板に描画したうえ、現像、定着、水洗、
乾燥するなどの現像処理し、修正、検査の工程を経て作
成したフォトマスク原版上に、２液架橋型防汚性表面コ
ート剤ディフェンサＴＲ−３１０（大日本インキ化学工
業株式会社製）に、酢酸ブチルとメチルエチルケトン
（ＭＥＫ）と酢酸セロソルブとからなる溶剤を調合して
なる主剤と、硬化剤バーノックＤＮ−９５０に溶剤酢酸
エチルを調合した硬化剤と、酢酸ブチルとメチルエチル
ケトン（ＭＥＫ）と酢酸セロソルブとを調合した希釈剤
とを混合してなる保護層形成液を塗布して膜面保護層を
積層するように形成したことを特徴とする膜面保護層付
きフォトマスク原版の製造方法である。[0010] The second invention is an original photomask having a film surface protective layer according to the first invention, in which a film surface protective layer is formed by lamination using a protective layer forming solution of the most suitable formulation. The third invention to be patented is to draw on an emulsion dry plate in which a film surface of a photosensitive emulsion layer (emulsion mask) is formed on a glass substrate, and then develop, fix, wash,
A two-part cross-linkable antifouling surface coating agent Defenser TR-310 (manufactured by Dainippon Ink and Chemicals, Inc.) was added onto the original photomask prepared through development, such as drying, and correction and inspection steps. A main agent prepared by mixing a solvent consisting of butyl, methyl ethyl ketone (MEK) and cellosolve acetate, a curing agent prepared by mixing a solvent ethyl acetate with a curing agent Vernock DN-950, butyl acetate, methyl ethyl ketone (MEK) and cellosolve acetate A method for producing an original photomask with a film surface protective layer, characterized in that the film surface protective layer is formed by applying a protective layer forming liquid obtained by mixing a prepared diluent.
【００１１】第３発明は、膜面保護層付きフォトマスク
原版の製造方法の発明である。作成したフォトマスク原
版上に、保護層形成液を塗布して膜面保護層を積層する
ように形成したものである。塗布方法には、スプレーコ
ート、スピンコート、ディプコート、ロールコート等い
ろいろな方法があるが、いずれの方法であっても良い。
しかし、実用的に望ましいのはスプレーコート法であ
る。A third invention is an invention of a method for manufacturing a photomask master having a film surface protective layer. A protective layer forming solution is applied on the prepared photomask master to form a film surface protective layer. There are various coating methods such as spray coating, spin coating, dip coating, and roll coating, and any of these methods may be used.
However, the spray coating method is practically desirable.
【００１２】特許を受けようとする第４発明は、２液架
橋型防汚性表面コート剤ディフェンサＴＲ−３１０（大
日本インキ化学工業株式会社製）に、酢酸ブチルとメチ
ルエチルケトン（ＭＥＫ）と酢酸セロソルブとからなる
溶剤を調合してなる主剤と、硬化剤バーノックＤＮ−９
５０に溶剤酢酸エチルを調合してなる硬化剤と、酢酸ブ
チルとメチルエチルケトン（ＭＥＫ）と酢酸セロソルブ
とを調合してなる希釈剤とを混合してなるフォトマスク
原版用保護層形成液である。[0012] A fourth invention to be patented is a two-part crosslinkable antifouling surface coating agent Defensa TR-310 (manufactured by Dainippon Ink and Chemicals, Inc.) containing butyl acetate, methyl ethyl ketone (MEK) and cellosolve acetate. And a main agent prepared by mixing a solvent consisting of
50 is a protective layer forming solution for a photomask master plate obtained by mixing a curing agent prepared by mixing a solvent ethyl acetate with 50 and a diluent prepared by mixing butyl acetate, methyl ethyl ketone (MEK) and cellosolve acetate.
【００１３】第４発明は、フォトマスク原版用保護層形
成液である。A fourth invention is a liquid for forming a protective layer for a photomask original plate.
【００１４】特許を受けようとする第５発明は、２液架
橋型防汚性表面コート剤ディフェンサＴＲ−３１０（大
日本インキ化学工業株式会社製）に、酢酸ブチルとメチ
ルエチルケトン（ＭＥＫ）と酢酸セロソルブとからなる
溶剤を調合してなる主剤２５％〜５０％と、硬化剤バー
ノックＤＮ−９５０に溶剤酢酸エチルを調合してなる硬
化剤１％〜４％と、酢酸ブチルとメチルエチルケトン
（ＭＥＫ）と酢酸セロソルブとを調合してなる希釈剤４
６〜７５％とを混合してなるフォトマスク原版用保護層
形成液である。A fifth invention to be patented is a two-part crosslinkable antifouling surface coating agent Defensor TR-310 (manufactured by Dainippon Ink and Chemicals, Inc.) containing butyl acetate, methyl ethyl ketone (MEK) and cellosolve acetate. 25% to 50% of a main agent prepared by mixing a solvent consisting of the following, a hardening agent of 1% to 4% obtained by mixing a solvent ethyl acetate with a hardener Vernock DN-950, butyl acetate, methyl ethyl ketone (MEK) and acetic acid Diluent 4 prepared by mixing with cellosolve
6 to 75% of a photomask original layer protective layer forming solution.
【００１５】当該第５発明は、最も好適なフォトマスク
原版用保護層形成液である。[0015] The fifth invention is the most preferred protective layer forming solution for a photomask original plate.
【００１６】[0016]
【実施例】以下本発明を実施例に基づいて詳細に説明す
る。図１は、膜面保護層付きフォトマスク原版の製造工
程を示すフローチャートであり、図２は、膜面保護層付
きフォトマスク原版の製造工程における構造説明図であ
る。DESCRIPTION OF THE PREFERRED EMBODIMENTS Hereinafter, the present invention will be described in detail based on embodiments. FIG. 1 is a flowchart showing a manufacturing process of a photomask master with a film surface protective layer, and FIG. 2 is a structural explanatory view in a manufacturing process of the photomask master with a film surface protective layer.
【００１７】第一工程は、お客様から支給された図面又
はデータを基に、ＣＡＤシステムにより露光装置（フォ
トプロッター等）用データを作成する。In the first step, data for an exposure apparatus (such as a photoplotter) is created by a CAD system based on drawings or data supplied by a customer.
【００１８】第二工程は、ガラス基板に感光乳剤層の膜
面（エマルジョンマスク）を形成してなるエマルジョン
乾板に、前記データに基づきプロッターで図形を描画す
るようにする。In the second step, a figure is drawn by a plotter based on the data on an emulsion dry plate in which a film surface of a photosensitive emulsion layer (emulsion mask) is formed on a glass substrate.
【００１９】第三工程は、描画したエマルジョン乾板
を、現像、定着、水洗、乾燥するなどして現像処理をす
る。In the third step, the developed emulsion plate is subjected to development processing by developing, fixing, washing and drying.
【００２０】第四工程は、測長機による各部の測定と、
外観検査機による欠陥検査を行う。In the fourth step, each part is measured by a length measuring machine,
Perform a defect inspection with a visual inspection machine.
【００２１】第五工程は、白欠陥、黒欠陥の修正をす
る。従来品は、これでフォトマスク原版を完成する。In the fifth step, white defects and black defects are corrected. The conventional product completes the photomask master.
【００２２】第六工程は、本発明は写真原版であるフォ
トマスク原版に保護層形成液を塗布して膜面保護層を積
層するように形成する。In the sixth step, a protective layer forming solution is applied to a photomask master, which is a photographic master, to form a film surface protective layer.
【００２３】当該保護層形成液は、２液架橋型防汚性表
面コート剤ディフェンサＴＲ−３１０（大日本インキ化
学工業株式会社製）に、酢酸ブチルとメチルエチルケト
ン（ＭＥＫ）と酢酸セロソルブとからなる溶剤を調合し
てなる主剤２５％〜５０％と、硬化剤バーノックＤＮ−
９５０に溶剤酢酸エチルを調合してなる硬化剤１％〜４
％と、酢酸ブチルとメチルエチルケトン（ＭＥＫ）と酢
酸セロソルブとを調合してなる希釈剤４６〜７５％とを
混合してなるものである。尚、保護層形成液の調合比率
を詳しく述べると、表１に示したようなものが望まし
い。The protective layer forming solution is applied to a two-part cross-linkable antifouling surface coating agent Defensa TR-310 (manufactured by Dainippon Ink and Chemicals, Inc.) in a solvent comprising butyl acetate, methyl ethyl ketone (MEK) and cellosolve acetate. And 25% to 50% of a base agent prepared by mixing
Hardening agent 1% to 4 prepared by mixing 950 with the solvent ethyl acetate
% And butyl acetate, methyl ethyl ketone (MEK), and a diluent 46-75% prepared by mixing cellosolve acetate. In detail, the mixing ratio of the protective layer forming liquid is preferably as shown in Table 1.
【００２４】[0024]
【表１】 [Table 1]
【００２５】本実施例における保護層形成液の調合例
は、次のようにした。 ＴＲ−３１０ １００ｍｇ ＤＮ−９５０ ６ｍｇ メチルエチルケトン ３６０ｍｌ 酢酸プチル ４８ｍｌ 酢酸セロソプル １５５ｍｌAn example of the preparation of the protective layer forming liquid in the present embodiment was as follows. TR-310 100mg DN-950 6mg Methyl ethyl ketone 360ml Butyl acetate 48ml Cellosople acetate 155ml
【００２６】また、膜面保護層を形成する方法として、
表２に示すようにスプレーコート、スピンコート、ディ
プコート、ロールコート等の塗布する方法が可能であ
る。本実施例では、スプレーコートを採用した。As a method of forming the film surface protective layer,
As shown in Table 2, coating methods such as spray coating, spin coating, dip coating, and roll coating are possible. In this example, a spray coat was employed.
【００２７】[0027]
【表２】 [Table 2]
【００２８】第７工程 エージングしたうえ、５０〜１
２０℃で１８〜７２時間乾燥させて膜面保護層付きフォ
トマスク原版を完成させる。Step 7 After aging, 50-1
After drying at 20 ° C. for 18 to 72 hours, a photomask master with a film surface protective layer is completed.
【００２９】このようにして出来た膜面保護層付きフォ
トマスク原版の特徴を、従来のフォトマスク原版の特徴
と比較する試験を行った。その結果を表３に示す。A test was performed to compare the features of the photomask master with the film surface protective layer formed as described above with the features of the conventional photomask master. Table 3 shows the results.
【００３０】[0030]
【表３】 [Table 3]
【００３１】[0031]
【効果】本願発明は、ガラス基板に乳剤層の膜面（エマ
ルジョンマスク）を形成してなるフォトマスク原版上
に、２液架橋型防汚性表面コート剤ディフェンサＴＲ−
３１０（大日本インキ化学工業株式会社製）に、酢酸ブ
チルとメチルエチルケトン（ＭＥＫ）と酢酸セロソルブ
とからなる溶剤を調合してなる主剤に硬化剤と希釈剤と
を混合してなる保護層形成液により膜面保護層を積層形
成した膜面保護層付きフォトマスク原版とその製造方法
である。According to the present invention, a two-component cross-linking antifouling surface coating agent Defensor TR- is provided on a photomask master obtained by forming a film surface of an emulsion layer (emulsion mask) on a glass substrate.
310 (manufactured by Dainippon Ink and Chemicals, Inc.), and a protective layer forming liquid obtained by mixing a hardening agent and a diluent with a main agent obtained by mixing a solvent composed of butyl acetate, methyl ethyl ketone (MEK) and cellosolve acetate. An original photomask having a film surface protective layer formed by laminating a film surface protective layer and a method of manufacturing the same.
【００３２】当該保護層形成液は、密着性がよく、耐久
性に優れた皮膜を形成するし、無色透明液体で、折曲
げ、延伸による白化が起こりにくく殆ど紫外線透過率を
低下しない特性がある。そのため、この保護層形成液を
塗布し形成した膜面保護層付きフォトマスク原版は、傷
つきにくく、汚れにくく、紫外線透過率が低下せず、安
価で耐久性のあるフォトマスクとなる。The protective layer forming liquid forms a film having good adhesion and excellent durability, is a colorless and transparent liquid, has a property in which whitening due to bending and stretching hardly occurs and hardly lowers the ultraviolet transmittance. . Therefore, the original photomask having a film surface protective layer formed by applying the protective layer forming liquid is an inexpensive and durable photomask that is resistant to scratching and dirt, does not reduce ultraviolet transmittance.
【図１】本発明に係る膜面保護層付きフォトマスク原版
の製造工程を示すフローチャートである。FIG. 1 is a flowchart showing a manufacturing process of a photomask master with a film surface protective layer according to the present invention.
【図２】本発明に係る膜面保護層付きフォトマスク原版
の製造工程における構造説明図である。FIG. 2 is a structural explanatory view in a manufacturing process of a photomask master with a film surface protective layer according to the present invention.
Claims (5)
ンマスク）を形成してなるフォトマスク原版上に、２液
架橋型防汚性表面コート剤ディフェンサＴＲ−３１０
（大日本インキ化学工業株式会社製）に、酢酸ブチルと
メチルエチルケトン（ＭＥＫ）と酢酸セロソルブとから
なる溶剤を調合してなる主剤と、硬化剤バーノックＤＮ
−９５０に溶剤酢酸エチルを調合してなる硬化剤と、酢
酸ブチルとメチルエチルケトン（ＭＥＫ）と酢酸セロソ
ルブとを調合してなる希釈剤とを混合してなる保護層形
成液により膜面保護層を積層形成したことを特徴とする
膜面保護層付きフォトマスク原版。1. A two-liquid crosslinkable antifouling surface coating agent Defensor TR-310 on a photomask master having an emulsion layer film surface (emulsion mask) formed on a glass substrate.
(Made by Dainippon Ink and Chemicals, Inc.) and a main agent prepared by mixing a solvent consisting of butyl acetate, methyl ethyl ketone (MEK) and cellosolve acetate, and a hardener Vernock DN
Laminating a protective layer with a protective layer forming solution obtained by mixing a curing agent prepared by mixing solvent ethyl acetate with -950 and a diluent prepared by mixing butyl acetate, methyl ethyl ketone (MEK) and cellosolve acetate. An original photomask having a film surface protective layer formed.
ンマスク）を形成してなるフォトマスク原版上に、２液
架橋型防汚性表面コート剤ディフェンサＴＲ−３１０
（大日本インキ化学工業株式会社製）に、酢酸ブチルと
メチルエチルケトン（ＭＥＫ）と酢酸セロソルブとから
なる溶剤を調合してなる主剤２５％〜５０％と、硬化剤
バーノックＤＮ−９５０に溶剤酢酸エチルを調合してな
る硬化剤１％〜４％と、酢酸ブチルとメチルエチルケト
ン（ＭＥＫ）と酢酸セロソルブとを調合してなる希釈剤
４６〜７５％とを混合してなる保護層形成液にて膜面保
護層を積層形成したことを特徴とする膜面保護層付きフ
ォトマスク原版。2. A two-component crosslinkable antifouling surface coating agent Defensor TR-310 on a photomask master obtained by forming a film surface of an emulsion layer (emulsion mask) on a glass substrate.
(Dainippon Ink Chemical Industry Co., Ltd.), a base agent 25% to 50% prepared by mixing a solvent consisting of butyl acetate, methyl ethyl ketone (MEK) and cellosolve acetate, and a solvent ethyl acetate to a curing agent Vernock DN-950. Film surface protection with a protective layer forming liquid made by mixing 1% to 4% of a prepared curing agent and 46 to 75% of a diluent prepared by mixing butyl acetate, methyl ethyl ketone (MEK) and cellosolve acetate. An original photomask with a film surface protective layer, characterized in that layers are formed in layers.
ジョンマスク）を形成してなるエマルジョン乾板に描画
したうえ、現像、定着、水洗、乾燥するなどの現像処理
し、修正、検査の工程を経て作成したフォトマスク原版
上に、２液架橋型防汚性表面コート剤ディフェンサＴＲ
−３１０（大日本インキ化学工業株式会社製）に、酢酸
ブチルとメチルエチルケトン（ＭＥＫ）と酢酸セロソル
ブとからなる溶剤を調合してなる主剤と、硬化剤バーノ
ックＤＮ−９５０に溶剤酢酸エチルを調合した硬化剤
と、酢酸ブチルとメチルエチルケトン（ＭＥＫ）と酢酸
セロソルブとを調合した希釈剤とを混合してなる保護層
形成液を塗布して膜面保護層を積層するように形成した
ことを特徴とする膜面保護層付きフォトマスク原版の製
造方法。3. Draw on an emulsion dry plate in which a film surface of a photosensitive emulsion layer (emulsion mask) is formed on a glass substrate, and develop, fix, wash, dry, etc., and perform a correction and inspection process. Two-part cross-linkable antifouling surface coating agent Defensor TR on photomask master
-310 (manufactured by Dainippon Ink and Chemicals, Inc.), a base agent prepared by mixing a solvent composed of butyl acetate, methyl ethyl ketone (MEK) and cellosolve acetate, and a hardening agent prepared by mixing a solvent ethyl acetate with a curing agent Vernock DN-950. A protective layer forming liquid formed by mixing an agent and a diluent prepared by mixing butyl acetate, methyl ethyl ketone (MEK) and cellosolve acetate, and forming a film surface protective layer on the film. Manufacturing method of photomask master with surface protection layer.
ンサＴＲ−３１０（大日本インキ化学工業株式会社製）
に、酢酸ブチルとメチルエチルケトン（ＭＥＫ）と酢酸
セロソルブとからなる溶剤を調合してなる主剤と、硬化
剤バーノックＤＮ−９５０に溶剤酢酸エチルを調合して
なる硬化剤と、酢酸ブチルとメチルエチルケトン（ＭＥ
Ｋ）と酢酸セロソルブとを調合してなる希釈剤とを混合
してなるフォトマスク原版用保護層形成液。4. A two-component crosslinkable antifouling surface coating agent DEFENSA TR-310 (manufactured by Dainippon Ink and Chemicals, Inc.).
And a hardening agent obtained by mixing a solvent consisting of butyl acetate, methyl ethyl ketone (MEK) and cellosolve acetate, a hardening agent obtained by mixing a solvent ethyl acetate with a curing agent Vernock DN-950, and butyl acetate and methyl ethyl ketone (ME
A protective layer forming solution for a photomask master plate, obtained by mixing K) and a diluent prepared by mixing cellosolve acetate.
ンサＴＲ−３１０（大日本インキ化学工業株式会社製）
に、酢酸ブチルとメチルエチルケトン（ＭＥＫ）と酢酸
セロソルブとからなる溶剤を調合してなる主剤２５％〜
５０％と、硬化剤バーノックＤＮ−９５０に溶剤酢酸エ
チルを調合してなる硬化剤１％〜４％と、酢酸ブチルと
メチルエチルケトン（ＭＥＫ）と酢酸セロソルブとを調
合してなる希釈剤４６〜７５％とを混合してなるフォト
マスク原版用保護層形成液。5. A two-component crosslinkable antifouling surface coating agent DEFENSA TR-310 (manufactured by Dainippon Ink and Chemicals, Inc.).
, A main agent prepared by mixing a solvent composed of butyl acetate, methyl ethyl ketone (MEK) and cellosolve acetate in an amount of 25% to
50%, a curing agent 1% to 4% prepared by mixing the solvent ethyl acetate with the curing agent Vernock DN-950, and a diluent 46 to 75% prepared by mixing butyl acetate, methyl ethyl ketone (MEK) and cellosolve acetate. And a protective layer forming solution for a photomask master.
Priority Applications (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP11743898A JPH11305420A (en) | 1998-04-27 | 1998-04-27 | Photomask raw glass with surface film protective layer and its production and protective layer forming liquid |
| TW088118727A TW418344B (en) | 1998-04-27 | 1999-10-27 | Photomask raw glass with surface film protective layer and its production and protective layer forming liquid |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP11743898A JPH11305420A (en) | 1998-04-27 | 1998-04-27 | Photomask raw glass with surface film protective layer and its production and protective layer forming liquid |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| JPH11305420A true JPH11305420A (en) | 1999-11-05 |
Family
ID=14711661
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP11743898A Pending JPH11305420A (en) | 1998-04-27 | 1998-04-27 | Photomask raw glass with surface film protective layer and its production and protective layer forming liquid |
Country Status (2)
| Country | Link |
|---|---|
| JP (1) | JPH11305420A (en) |
| TW (1) | TW418344B (en) |
Cited By (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| WO2001029615A1 (en) * | 1999-10-20 | 2001-04-26 | Sineisha Co., Ltd. | Photomask original form having layer for protecting film surface and method for preparing the same, and protective layer-forming liquid for photomask original form |
| JP2002214761A (en) * | 2001-01-16 | 2002-07-31 | Dainippon Printing Co Ltd | Photomask for photolithography and method for manufacturing the same |
| JP2002278047A (en) * | 2001-03-19 | 2002-09-27 | Kimoto & Co Ltd | Protective solution for photomask and method for producing photomask with protective film |
| KR101118872B1 (en) | 2003-12-18 | 2012-03-19 | 키모토 컴파니 리미티드 | Surface protecting film and surface protecting material using the same |
| US8235212B2 (en) | 2002-12-27 | 2012-08-07 | Asml Netherlands B.V. | Mask transport system configured to transport a mask into and out of a lithographic apparatus |
Citations (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS6452155A (en) * | 1987-05-16 | 1989-02-28 | Idemitsu Petrochemical Co | Member for forming durable pattern |
| JPH03129348A (en) * | 1989-10-13 | 1991-06-03 | Toshiba Corp | Pattern printing plate for shadow mask and production thereof |
| JPH093394A (en) * | 1995-06-16 | 1997-01-07 | Nippon Shokubai Co Ltd | Coating composition |
| JPH09111020A (en) * | 1995-10-13 | 1997-04-28 | Kimoto & Co Ltd | Hard coat film |
-
1998
- 1998-04-27 JP JP11743898A patent/JPH11305420A/en active Pending
-
1999
- 1999-10-27 TW TW088118727A patent/TW418344B/en not_active IP Right Cessation
Patent Citations (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS6452155A (en) * | 1987-05-16 | 1989-02-28 | Idemitsu Petrochemical Co | Member for forming durable pattern |
| JPH03129348A (en) * | 1989-10-13 | 1991-06-03 | Toshiba Corp | Pattern printing plate for shadow mask and production thereof |
| JPH093394A (en) * | 1995-06-16 | 1997-01-07 | Nippon Shokubai Co Ltd | Coating composition |
| JPH09111020A (en) * | 1995-10-13 | 1997-04-28 | Kimoto & Co Ltd | Hard coat film |
Cited By (7)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| WO2001029615A1 (en) * | 1999-10-20 | 2001-04-26 | Sineisha Co., Ltd. | Photomask original form having layer for protecting film surface and method for preparing the same, and protective layer-forming liquid for photomask original form |
| US6811931B1 (en) | 1999-10-20 | 2004-11-02 | Sineisha Co., Ltd. | Photomask original form having layer for protecting film surface and method for preparing the same, and protective layer-forming liquid for photomask original form |
| JP2002214761A (en) * | 2001-01-16 | 2002-07-31 | Dainippon Printing Co Ltd | Photomask for photolithography and method for manufacturing the same |
| JP2002278047A (en) * | 2001-03-19 | 2002-09-27 | Kimoto & Co Ltd | Protective solution for photomask and method for producing photomask with protective film |
| JP4688324B2 (en) * | 2001-03-19 | 2011-05-25 | 株式会社きもと | Method for manufacturing photomask with protective film |
| US8235212B2 (en) | 2002-12-27 | 2012-08-07 | Asml Netherlands B.V. | Mask transport system configured to transport a mask into and out of a lithographic apparatus |
| KR101118872B1 (en) | 2003-12-18 | 2012-03-19 | 키모토 컴파니 리미티드 | Surface protecting film and surface protecting material using the same |
Also Published As
| Publication number | Publication date |
|---|---|
| TW418344B (en) | 2001-01-11 |
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| JPH02279718A (en) | Epoxy resin base composition that forms latent image | |
| TW586149B (en) | Graytone mask producing method | |
| CN104777665A (en) | Method for manufacturing black matrix | |
| CN110347013A (en) | The preparation method of masking-out frame, masking-out and masking-out frame | |
| US6811931B1 (en) | Photomask original form having layer for protecting film surface and method for preparing the same, and protective layer-forming liquid for photomask original form | |
| JPH11305420A (en) | Photomask raw glass with surface film protective layer and its production and protective layer forming liquid | |
| US20030143472A1 (en) | Manufacturing method of photomask | |
| JPS61502986A (en) | Image formation methods and products on substrates | |
| KR101848983B1 (en) | Glass reprocessing method, remade glass substrate, and photo mask blank and photo mask employing same | |
| US5783339A (en) | Method for preparing a color filter | |
| JPH0284654A (en) | Positive type photoresist composition | |
| JP2877838B2 (en) | How to repair defects such as emulsion masks | |
| JP2006337726A (en) | Photomask | |
| JP2607732B2 (en) | Light-shielding thin film composition | |
| JPH10293397A (en) | Radiation sensitive composition for color filter | |
| US3843362A (en) | Latent image mask repair | |
| JPH06308317A (en) | Method for correcting defective point of thin-film pattern and formation of thin-film pattern | |
| JP2002072452A (en) | Photomask with emulsion side protecting layer and method for, producing the same | |
| JPH0821992A (en) | Black matrix substrate for liquid crystal display and it production | |
| JP4582269B2 (en) | Method for producing color filter without black matrix | |
| JP2956732B2 (en) | Method for manufacturing color filter of solid-state imaging device | |
| JPH05281408A (en) | Manufacture of color filter | |
| JPH07146546A (en) | Photomask and its production | |
| JPH09325472A (en) | Water-soluble photo-resist composition | |
| JPS6180103A (en) | Production of color filter |
Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| A621 | Written request for application examination |
Free format text: JAPANESE INTERMEDIATE CODE: A621 Effective date: 20050426 |
|
| A977 | Report on retrieval |
Free format text: JAPANESE INTERMEDIATE CODE: A971007 Effective date: 20071226 |
|
| A131 | Notification of reasons for refusal |
Free format text: JAPANESE INTERMEDIATE CODE: A131 Effective date: 20080520 |
|
| A02 | Decision of refusal |
Free format text: JAPANESE INTERMEDIATE CODE: A02 Effective date: 20081007 |