JPS6451957A - Manufacture of thermal head - Google Patents
Manufacture of thermal headInfo
- Publication number
- JPS6451957A JPS6451957A JP20961887A JP20961887A JPS6451957A JP S6451957 A JPS6451957 A JP S6451957A JP 20961887 A JP20961887 A JP 20961887A JP 20961887 A JP20961887 A JP 20961887A JP S6451957 A JPS6451957 A JP S6451957A
- Authority
- JP
- Japan
- Prior art keywords
- heat generating
- generating element
- element layer
- layer
- thermal resistor
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Classifications
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
- B41J—TYPEWRITERS; SELECTIVE PRINTING MECHANISMS, i.e. MECHANISMS PRINTING OTHERWISE THAN FROM A FORME; CORRECTION OF TYPOGRAPHICAL ERRORS
- B41J2/00—Typewriters or selective printing mechanisms characterised by the printing or marking process for which they are designed
- B41J2/315—Typewriters or selective printing mechanisms characterised by the printing or marking process for which they are designed characterised by selective application of heat to a heat sensitive printing or impression-transfer material
- B41J2/32—Typewriters or selective printing mechanisms characterised by the printing or marking process for which they are designed characterised by selective application of heat to a heat sensitive printing or impression-transfer material using thermal heads
- B41J2/335—Structure of thermal heads
Abstract
PURPOSE:To obtain a thermal head which is structurally simple and qualitatively reliable and can accommodate the projecting condition of the heat generating part of a thermal head by first forming a thermal resistor of a more than two-tier structure and limiting the thickness of a conductive membrane layer so that at least, it may be smaller than the thickness of the removed layer of the thermal resistor, with the bottom layer of the thermal resistor kept intact. CONSTITUTION:A bottom heat generating element layer 9 of TiC and SiO and a top heat generating element layer 9 of SiO2 and an intermediate heat generating element layer 8 are formed in a laminated style to provide a membrane thermal resistor 10. Next, a photoresist pattern 11 is formed only in an area which becomes a heat generating part, and the top heat generating element layer 9 of SiO2 is removed except the area which becomes a heat generating part, using etching technique. At that time, the intermediate heat generating element layer 8 of Si acts as an etching buffer layer, so that the bottom heat generating element layer below is not eroded. Subsequently, the intermediate heat generating element layer 8 and the bottom heat generating element layer 7 remain solid. After removal of the photoresist pattern 11, an electrode 12 is formed over the entire area of the pattern in such a manner that its membrane thickness becomes smaller than that of the top heat generating element layer 9.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP20961887A JPS6451957A (en) | 1987-08-24 | 1987-08-24 | Manufacture of thermal head |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP20961887A JPS6451957A (en) | 1987-08-24 | 1987-08-24 | Manufacture of thermal head |
Publications (1)
Publication Number | Publication Date |
---|---|
JPS6451957A true JPS6451957A (en) | 1989-02-28 |
Family
ID=16575779
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP20961887A Pending JPS6451957A (en) | 1987-08-24 | 1987-08-24 | Manufacture of thermal head |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS6451957A (en) |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US20100079551A1 (en) * | 2007-05-29 | 2010-04-01 | Canon Kabushiki Kaisha | Substrate for liquid discharge head, method of manufacturing the same, and liquid discharge head using such substrate |
-
1987
- 1987-08-24 JP JP20961887A patent/JPS6451957A/en active Pending
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US20100079551A1 (en) * | 2007-05-29 | 2010-04-01 | Canon Kabushiki Kaisha | Substrate for liquid discharge head, method of manufacturing the same, and liquid discharge head using such substrate |
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