JPS6447958A - Contact probe - Google Patents

Contact probe

Info

Publication number
JPS6447958A
JPS6447958A JP20559787A JP20559787A JPS6447958A JP S6447958 A JPS6447958 A JP S6447958A JP 20559787 A JP20559787 A JP 20559787A JP 20559787 A JP20559787 A JP 20559787A JP S6447958 A JPS6447958 A JP S6447958A
Authority
JP
Japan
Prior art keywords
patterns
electrode
slit
contact probe
pattern
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP20559787A
Other languages
Japanese (ja)
Inventor
Toru Tomine
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Seiko Epson Corp
Original Assignee
Seiko Epson Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Seiko Epson Corp filed Critical Seiko Epson Corp
Priority to JP20559787A priority Critical patent/JPS6447958A/en
Publication of JPS6447958A publication Critical patent/JPS6447958A/en
Pending legal-status Critical Current

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  • Measuring Leads Or Probes (AREA)

Abstract

PURPOSE:To facilitate electric conduction having an electrode pattern over a high density, covering fine and large area, by arranging electrode patterns and a slit on a contact probe substrate. CONSTITUTION:Electrode patterns 2 are formed on a contact probe substrate 1a and moreover, a slit 3 is provided between electrodes. A substrate 1a with a low thermal expansion coefficient is used to form a highly accurate pattern 2 with limited deformation in a process where the electrode patterns 2 are formed at a fine pitch. The patterns 2 are made flexible by the slit 3 formed between the patterns 2 to improve adhesion of an object part with the pattern 2. Moreover, the patterns 2 are made in surface contact to prevent deterioration in the quality of the part otherwise caused by any flaw on an electrode as object part while permitting manufacture of highly accurate, high density fine patterns 2 at a low cost.
JP20559787A 1987-08-19 1987-08-19 Contact probe Pending JPS6447958A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP20559787A JPS6447958A (en) 1987-08-19 1987-08-19 Contact probe

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP20559787A JPS6447958A (en) 1987-08-19 1987-08-19 Contact probe

Publications (1)

Publication Number Publication Date
JPS6447958A true JPS6447958A (en) 1989-02-22

Family

ID=16509510

Family Applications (1)

Application Number Title Priority Date Filing Date
JP20559787A Pending JPS6447958A (en) 1987-08-19 1987-08-19 Contact probe

Country Status (1)

Country Link
JP (1) JPS6447958A (en)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0462479A (en) * 1990-06-29 1992-02-27 Sharp Corp Electric inspecting method for semiconductor device

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0462479A (en) * 1990-06-29 1992-02-27 Sharp Corp Electric inspecting method for semiconductor device

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