JPS6450415A - Manufacture of semiconductor device - Google Patents

Manufacture of semiconductor device

Info

Publication number
JPS6450415A
JPS6450415A JP20677387A JP20677387A JPS6450415A JP S6450415 A JPS6450415 A JP S6450415A JP 20677387 A JP20677387 A JP 20677387A JP 20677387 A JP20677387 A JP 20677387A JP S6450415 A JPS6450415 A JP S6450415A
Authority
JP
Japan
Prior art keywords
layer
buffer layer
growing
component
buffer
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP20677387A
Other languages
Japanese (ja)
Other versions
JP2708750B2 (en
Inventor
Hiroyoshi Hamada
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Sanyo Electric Co Ltd
Original Assignee
Sanyo Electric Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Sanyo Electric Co Ltd filed Critical Sanyo Electric Co Ltd
Priority to JP62206773A priority Critical patent/JP2708750B2/en
Publication of JPS6450415A publication Critical patent/JPS6450415A/en
Application granted granted Critical
Publication of JP2708750B2 publication Critical patent/JP2708750B2/en
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

Links

Landscapes

  • Semiconductor Lasers (AREA)
  • Chemical Vapour Deposition (AREA)

Abstract

PURPOSE:To prevent decrease in crystallizability, by performing vapor growth of a GaInAsP layer, whose constituting ratio of As is low, on a GaAs single crystal, and performing the vapor growth of a semiconductor layer, which does not include As component, on the GaInAsP layer. CONSTITUTION:A second buffer layer 7, which comprises an N-type (Ga0.52In0.48)(As0.01P0.99), is provided between a buffer layer 2 and an N-type clad layer 3. In this way, the growing step of the second buffer layer 7, whose As constituting ratio is low, is provided between the growing of the first buffer layer 2 and the growing of the N-type clad layer 3. Since AsH3 gas including an As component is present in the growing atmosphere when the second buffer layer 7 is grown, elimination of the As component from the first buffer layer 2 can be prevented. Therefore the crystallizability of the first and second buffer layers 2 and 3 are not deteriorated.
JP62206773A 1987-08-20 1987-08-20 Method for manufacturing semiconductor device Expired - Lifetime JP2708750B2 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP62206773A JP2708750B2 (en) 1987-08-20 1987-08-20 Method for manufacturing semiconductor device

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP62206773A JP2708750B2 (en) 1987-08-20 1987-08-20 Method for manufacturing semiconductor device

Related Child Applications (1)

Application Number Title Priority Date Filing Date
JP8055092A Division JP2630929B2 (en) 1996-03-12 1996-03-12 Semiconductor laser

Publications (2)

Publication Number Publication Date
JPS6450415A true JPS6450415A (en) 1989-02-27
JP2708750B2 JP2708750B2 (en) 1998-02-04

Family

ID=16528849

Family Applications (1)

Application Number Title Priority Date Filing Date
JP62206773A Expired - Lifetime JP2708750B2 (en) 1987-08-20 1987-08-20 Method for manufacturing semiconductor device

Country Status (1)

Country Link
JP (1) JP2708750B2 (en)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2010045169A (en) * 2008-08-12 2010-02-25 Stanley Electric Co Ltd Compound semiconductor device and method of manufacturing the same

Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS61166124A (en) * 1985-01-18 1986-07-26 Oki Electric Ind Co Ltd Vapor-phase epitaxial growth method

Patent Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS61166124A (en) * 1985-01-18 1986-07-26 Oki Electric Ind Co Ltd Vapor-phase epitaxial growth method

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2010045169A (en) * 2008-08-12 2010-02-25 Stanley Electric Co Ltd Compound semiconductor device and method of manufacturing the same

Also Published As

Publication number Publication date
JP2708750B2 (en) 1998-02-04

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Legal Events

Date Code Title Description
EXPY Cancellation because of completion of term