JPS6447865A - Film forming method by bias sputtering - Google Patents

Film forming method by bias sputtering

Info

Publication number
JPS6447865A
JPS6447865A JP20371487A JP20371487A JPS6447865A JP S6447865 A JPS6447865 A JP S6447865A JP 20371487 A JP20371487 A JP 20371487A JP 20371487 A JP20371487 A JP 20371487A JP S6447865 A JPS6447865 A JP S6447865A
Authority
JP
Japan
Prior art keywords
substrate
bias
conductive film
film
sputtering
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP20371487A
Other languages
Japanese (ja)
Other versions
JPH0660389B2 (en
Inventor
Kunihiro Nagao
Kazuji Sugiura
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
TDK Corp
Original Assignee
TDK Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by TDK Corp filed Critical TDK Corp
Priority to JP62203714A priority Critical patent/JPH0660389B2/en
Publication of JPS6447865A publication Critical patent/JPS6447865A/en
Publication of JPH0660389B2 publication Critical patent/JPH0660389B2/en
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

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  • Physical Vapour Deposition (AREA)

Abstract

PURPOSE:To uniformly impress a bias voltage on a substrate and to form a highly adhesive film by forming an electrically conductive film on the surface of the insulating substrate on the bias electrode side,and using the substrate to carry out bias sputtering. CONSTITUTION:The insulating substrate 1 of glazed alumna, etc., is supported on the bias electrode 3 in a reaction chamber 20, a target 5 opposed to the substrate 1 is connected to a high-frequency power source 6, high-frequency sputtering is carried out in gaseous Ar, and a film is formed on the substrate 1. In this bias sputtering, an electrically conductive film 2' is previously formed on one surface of the substrate 1 on the bias electrode 3 side and a conductive film 2 of the same constitution is simultaneously formed on the other surface. The heating resistor element of boron-added silicon formed by the chemical transport method is appropriately used as the conductive films 2 and 2'. A bias voltage is efficiently and uniformly impressed on the substrate 1 through the conductive film 2' in contact 8 with the bias electrode 3. As a result, the temp. of the substrate 1 can be elevated, and a highly adhesive film can be formed.
JP62203714A 1987-08-17 1987-08-17 Deposition method by bias sputtering method Expired - Fee Related JPH0660389B2 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP62203714A JPH0660389B2 (en) 1987-08-17 1987-08-17 Deposition method by bias sputtering method

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP62203714A JPH0660389B2 (en) 1987-08-17 1987-08-17 Deposition method by bias sputtering method

Publications (2)

Publication Number Publication Date
JPS6447865A true JPS6447865A (en) 1989-02-22
JPH0660389B2 JPH0660389B2 (en) 1994-08-10

Family

ID=16478629

Family Applications (1)

Application Number Title Priority Date Filing Date
JP62203714A Expired - Fee Related JPH0660389B2 (en) 1987-08-17 1987-08-17 Deposition method by bias sputtering method

Country Status (1)

Country Link
JP (1) JPH0660389B2 (en)

Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS61278029A (en) * 1985-05-31 1986-12-08 Mitsubishi Electric Corp Production of magnetic recording element

Patent Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS61278029A (en) * 1985-05-31 1986-12-08 Mitsubishi Electric Corp Production of magnetic recording element

Also Published As

Publication number Publication date
JPH0660389B2 (en) 1994-08-10

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Legal Events

Date Code Title Description
LAPS Cancellation because of no payment of annual fees