JPS6445709A - Production of crystal - Google Patents

Production of crystal

Info

Publication number
JPS6445709A
JPS6445709A JP20066387A JP20066387A JPS6445709A JP S6445709 A JPS6445709 A JP S6445709A JP 20066387 A JP20066387 A JP 20066387A JP 20066387 A JP20066387 A JP 20066387A JP S6445709 A JPS6445709 A JP S6445709A
Authority
JP
Japan
Prior art keywords
crucible
pressure
sealing agent
crystal
melted
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP20066387A
Other languages
Japanese (ja)
Other versions
JP2539841B2 (en
Inventor
Osamu Oda
Kazuo Shinohara
Kenji Kohiro
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Eneos Corp
Original Assignee
Nippon Mining Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Nippon Mining Co Ltd filed Critical Nippon Mining Co Ltd
Priority to JP62200663A priority Critical patent/JP2539841B2/en
Publication of JPS6445709A publication Critical patent/JPS6445709A/en
Application granted granted Critical
Publication of JP2539841B2 publication Critical patent/JP2539841B2/en
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

Links

Landscapes

  • Crystals, And After-Treatments Of Crystals (AREA)
  • Liquid Deposition Of Substances Of Which Semiconductor Devices Are Composed (AREA)

Abstract

PURPOSE:To obtain crystal useful for semiconductor laser inexpensively and in high yield, by successively feeding an element having high dissociation pressure, a sealing agent and another element having high specific gravity to a crucible and heating under specific pressure while preventing raising of the sealing agent. CONSTITUTION:A crucible 4 is charged with a disklike red phosphorus lump 11 having the same diameter as that of the crucible, on which a similarly disklike sealing agent 12 such as B2O3 is placed. Further In lump 13 is placed on the sealing agent. Then the crucible 4 is set in a susceptor 3 of a single crystal pulling up device of high pressure and suppressing jigs 8 are fixed to an inner wall of a high-pressure container 1. Then a N2 gas under about 60atm., having >=equilibrium vapor pressure of In is introduced to the container 1, the In 13 is heated at about 160 deg.C by a heater 2, melted, the B2O3 12 and the phosphorus 11 to raise to the surface of the melted In 13 are prevented from raising by the suppressing jigs 8. Then the B2O3 12 is heated to about 600 deg.C, melted, raised to the surface of the In 13, the sunk In 13 is abruptly reacted with the phosphorus 11 to synthesize InP, which is crystallized. Then the prepared crystal is pulled up by a pulling up device to give crystal.
JP62200663A 1987-08-11 1987-08-11 Crystal manufacturing method Expired - Lifetime JP2539841B2 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP62200663A JP2539841B2 (en) 1987-08-11 1987-08-11 Crystal manufacturing method

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP62200663A JP2539841B2 (en) 1987-08-11 1987-08-11 Crystal manufacturing method

Publications (2)

Publication Number Publication Date
JPS6445709A true JPS6445709A (en) 1989-02-20
JP2539841B2 JP2539841B2 (en) 1996-10-02

Family

ID=16428154

Family Applications (1)

Application Number Title Priority Date Filing Date
JP62200663A Expired - Lifetime JP2539841B2 (en) 1987-08-11 1987-08-11 Crystal manufacturing method

Country Status (1)

Country Link
JP (1) JP2539841B2 (en)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2020536827A (en) * 2017-12-08 2020-12-17 中国電子科技集団公司第十三研究所The 13Th Research Institute Of China Electronics Technology Group Corporation Method of phosphide in situ injection synthesis using carrier gas

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2020536827A (en) * 2017-12-08 2020-12-17 中国電子科技集団公司第十三研究所The 13Th Research Institute Of China Electronics Technology Group Corporation Method of phosphide in situ injection synthesis using carrier gas

Also Published As

Publication number Publication date
JP2539841B2 (en) 1996-10-02

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