JPS6445129A - Plasma processor - Google Patents
Plasma processorInfo
- Publication number
- JPS6445129A JPS6445129A JP20239987A JP20239987A JPS6445129A JP S6445129 A JPS6445129 A JP S6445129A JP 20239987 A JP20239987 A JP 20239987A JP 20239987 A JP20239987 A JP 20239987A JP S6445129 A JPS6445129 A JP S6445129A
- Authority
- JP
- Japan
- Prior art keywords
- window
- peeping
- electrons
- ions
- gas plasma
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Landscapes
- Physical Vapour Deposition (AREA)
Abstract
PURPOSE:To make it possible to remove a material, which is attached on the inner surface of a window, by yielding gas plasma in a chamber, providing a potential at the inner surface of the window, and projecting ions or electrons on the inner surface of the window. CONSTITUTION:A peeping window 9 made of glass, in which a metal net as an electrode 8 is provided, is formed in the inside of a peeping window hole 6 of a chamber 1. When high frequency electric power is applied to the metal net 8 from a high frequency power source 12, a potential difference is imparted between the metal net 8 in the inside of the peeping window 9 and gas plasma. Ions or electrons in the gas plasma can be projected on the inner surface of the peeping window 9. Thus, a grown film, which is deposited on the inner surface of the peeping window 9, can be positively removed by the projection of the ions or the electrons.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP20239987A JPS6445129A (en) | 1987-08-13 | 1987-08-13 | Plasma processor |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP20239987A JPS6445129A (en) | 1987-08-13 | 1987-08-13 | Plasma processor |
Publications (1)
Publication Number | Publication Date |
---|---|
JPS6445129A true JPS6445129A (en) | 1989-02-17 |
Family
ID=16456855
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP20239987A Pending JPS6445129A (en) | 1987-08-13 | 1987-08-13 | Plasma processor |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS6445129A (en) |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
KR100375988B1 (en) * | 2001-02-05 | 2003-03-15 | 삼성전자주식회사 | semiconductor device manufacturing equipment and method for detecting position of semiconductor wafer |
-
1987
- 1987-08-13 JP JP20239987A patent/JPS6445129A/en active Pending
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
KR100375988B1 (en) * | 2001-02-05 | 2003-03-15 | 삼성전자주식회사 | semiconductor device manufacturing equipment and method for detecting position of semiconductor wafer |
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