JPS6445116A - Heat treatment apparatus - Google Patents

Heat treatment apparatus

Info

Publication number
JPS6445116A
JPS6445116A JP20189687A JP20189687A JPS6445116A JP S6445116 A JPS6445116 A JP S6445116A JP 20189687 A JP20189687 A JP 20189687A JP 20189687 A JP20189687 A JP 20189687A JP S6445116 A JPS6445116 A JP S6445116A
Authority
JP
Japan
Prior art keywords
furnace
inlet
inactive gas
wafer
boat
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP20189687A
Other languages
Japanese (ja)
Inventor
Akira Kojima
Ryosuke Sato
Satoshi Sakauchi
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Sony Corp
Original Assignee
Sony Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Sony Corp filed Critical Sony Corp
Priority to JP20189687A priority Critical patent/JPS6445116A/en
Publication of JPS6445116A publication Critical patent/JPS6445116A/en
Pending legal-status Critical Current

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  • Furnace Details (AREA)

Abstract

PURPOSE:To make it possible to implement uniform heat treatment, by inserting and taking out a wafer boat with a wafer-boat inserting and removing member. CONSTITUTION:Inactive gas is made to flow to a wafer-boat inserting and removing member 1, in which an opening part 2 is provided. Air and the like, which are involved between wafers, can be removed through the opening part 2. An inactive gas feeding means 5 is provided at the lower side of the inlet of a furnace in the vicinity of the outside of the inlet 6 of the furnace. An inactive gas sucking means 4 is provided at the upper part of the inlet of the furnace in correspondence with the means 5. The opening part 2, which is provided in the wafer boat inserting and removing member 1, is provided in the up and down directions. Therefore the inactive gas flows from the lower side to the upper side. Meanwhile, the heat treating furnace is usually heated when the wafer boat is inserted into the heat treating furnace. In the vicinity of the inlet 6 of the furnace, the gas, which is heated and rises, is present in the furnace. The inactive gas is made to flow from the lower side to the upper side in this way. The stream of the gas, which is heated and rises in the furnace, approximately agrees with the direction of the stream. Thus, efficient exhaustion is realized.
JP20189687A 1987-08-14 1987-08-14 Heat treatment apparatus Pending JPS6445116A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP20189687A JPS6445116A (en) 1987-08-14 1987-08-14 Heat treatment apparatus

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP20189687A JPS6445116A (en) 1987-08-14 1987-08-14 Heat treatment apparatus

Publications (1)

Publication Number Publication Date
JPS6445116A true JPS6445116A (en) 1989-02-17

Family

ID=16448618

Family Applications (1)

Application Number Title Priority Date Filing Date
JP20189687A Pending JPS6445116A (en) 1987-08-14 1987-08-14 Heat treatment apparatus

Country Status (1)

Country Link
JP (1) JPS6445116A (en)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH02272726A (en) * 1989-04-14 1990-11-07 Tokyo Electron Sagami Ltd Processing method

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH02272726A (en) * 1989-04-14 1990-11-07 Tokyo Electron Sagami Ltd Processing method

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