JPS6445116A - Heat treatment apparatus - Google Patents
Heat treatment apparatusInfo
- Publication number
- JPS6445116A JPS6445116A JP20189687A JP20189687A JPS6445116A JP S6445116 A JPS6445116 A JP S6445116A JP 20189687 A JP20189687 A JP 20189687A JP 20189687 A JP20189687 A JP 20189687A JP S6445116 A JPS6445116 A JP S6445116A
- Authority
- JP
- Japan
- Prior art keywords
- furnace
- inlet
- inactive gas
- wafer
- boat
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Landscapes
- Furnace Details (AREA)
Abstract
PURPOSE:To make it possible to implement uniform heat treatment, by inserting and taking out a wafer boat with a wafer-boat inserting and removing member. CONSTITUTION:Inactive gas is made to flow to a wafer-boat inserting and removing member 1, in which an opening part 2 is provided. Air and the like, which are involved between wafers, can be removed through the opening part 2. An inactive gas feeding means 5 is provided at the lower side of the inlet of a furnace in the vicinity of the outside of the inlet 6 of the furnace. An inactive gas sucking means 4 is provided at the upper part of the inlet of the furnace in correspondence with the means 5. The opening part 2, which is provided in the wafer boat inserting and removing member 1, is provided in the up and down directions. Therefore the inactive gas flows from the lower side to the upper side. Meanwhile, the heat treating furnace is usually heated when the wafer boat is inserted into the heat treating furnace. In the vicinity of the inlet 6 of the furnace, the gas, which is heated and rises, is present in the furnace. The inactive gas is made to flow from the lower side to the upper side in this way. The stream of the gas, which is heated and rises in the furnace, approximately agrees with the direction of the stream. Thus, efficient exhaustion is realized.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP20189687A JPS6445116A (en) | 1987-08-14 | 1987-08-14 | Heat treatment apparatus |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP20189687A JPS6445116A (en) | 1987-08-14 | 1987-08-14 | Heat treatment apparatus |
Publications (1)
Publication Number | Publication Date |
---|---|
JPS6445116A true JPS6445116A (en) | 1989-02-17 |
Family
ID=16448618
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP20189687A Pending JPS6445116A (en) | 1987-08-14 | 1987-08-14 | Heat treatment apparatus |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS6445116A (en) |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH02272726A (en) * | 1989-04-14 | 1990-11-07 | Tokyo Electron Sagami Ltd | Processing method |
-
1987
- 1987-08-14 JP JP20189687A patent/JPS6445116A/en active Pending
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH02272726A (en) * | 1989-04-14 | 1990-11-07 | Tokyo Electron Sagami Ltd | Processing method |
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