JPS6444020A - Separate discharge chamber type dry etching apparatus - Google Patents

Separate discharge chamber type dry etching apparatus

Info

Publication number
JPS6444020A
JPS6444020A JP20111787A JP20111787A JPS6444020A JP S6444020 A JPS6444020 A JP S6444020A JP 20111787 A JP20111787 A JP 20111787A JP 20111787 A JP20111787 A JP 20111787A JP S6444020 A JPS6444020 A JP S6444020A
Authority
JP
Japan
Prior art keywords
chamber
electrodes
discharge chamber
pair
dry etching
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP20111787A
Other languages
Japanese (ja)
Other versions
JPH06101451B2 (en
Inventor
Naoki Inagaki
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
NEC Corp
Original Assignee
NEC Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by NEC Corp filed Critical NEC Corp
Priority to JP62201117A priority Critical patent/JPH06101451B2/en
Publication of JPS6444020A publication Critical patent/JPS6444020A/en
Publication of JPH06101451B2 publication Critical patent/JPH06101451B2/en
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

Links

Abstract

PURPOSE:To obtain a dry etching apparatus which can arbitrarily vary the type and density of an active species by disposing a pair of high frequency applying electrodes in a discharge chamber, and providing the electrodes so that one of a pair of electrodes can be relatively displaced with respect to the other. CONSTITUTION:A reactive gas inlet tube 5 is provided to a discharge chamber 1, a wafer table 9 is mounted in an etching chamber 7, and the chamber 1 is connected through an active species transport tube 6 to the chamber 7. A pair of electrodes 3, 3 are disposed oppositely in parallel in the chamber 1, one electrode 3 is so supported to an electrode interval varying mechanism 4 that one of the electrodes 2 can be relatively displaced with respect to the other, one electrode 3 is connected to an earth, and the other is connected to a high frequency oscillator 2. Accordingly, according to this construction, since the interval of the parallel electrodes 3 and 3 can be adjusted to generate the active species for causing an etching reaction in the chamber 1, the universality is increased by arbitrarily varying the type and density of the species.
JP62201117A 1987-08-12 1987-08-12 Discharge chamber separated dry etching system Expired - Lifetime JPH06101451B2 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP62201117A JPH06101451B2 (en) 1987-08-12 1987-08-12 Discharge chamber separated dry etching system

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP62201117A JPH06101451B2 (en) 1987-08-12 1987-08-12 Discharge chamber separated dry etching system

Publications (2)

Publication Number Publication Date
JPS6444020A true JPS6444020A (en) 1989-02-16
JPH06101451B2 JPH06101451B2 (en) 1994-12-12

Family

ID=16435684

Family Applications (1)

Application Number Title Priority Date Filing Date
JP62201117A Expired - Lifetime JPH06101451B2 (en) 1987-08-12 1987-08-12 Discharge chamber separated dry etching system

Country Status (1)

Country Link
JP (1) JPH06101451B2 (en)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5663817A (en) * 1992-12-22 1997-09-02 Thomson-Csf Projector of narrow field moving images

Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS61119684A (en) * 1984-11-14 1986-06-06 Ulvac Corp Sputter etching device
JPS61272933A (en) * 1985-05-29 1986-12-03 Hitachi Ltd Photo process device

Patent Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS61119684A (en) * 1984-11-14 1986-06-06 Ulvac Corp Sputter etching device
JPS61272933A (en) * 1985-05-29 1986-12-03 Hitachi Ltd Photo process device

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5663817A (en) * 1992-12-22 1997-09-02 Thomson-Csf Projector of narrow field moving images

Also Published As

Publication number Publication date
JPH06101451B2 (en) 1994-12-12

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