JPS6435978A - Wavelength-tunable semiconductor laser - Google Patents
Wavelength-tunable semiconductor laserInfo
- Publication number
- JPS6435978A JPS6435978A JP62190040A JP19004087A JPS6435978A JP S6435978 A JPS6435978 A JP S6435978A JP 62190040 A JP62190040 A JP 62190040A JP 19004087 A JP19004087 A JP 19004087A JP S6435978 A JPS6435978 A JP S6435978A
- Authority
- JP
- Japan
- Prior art keywords
- wavelength
- semiconductor laser
- electric field
- layer
- quantum well
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
- H01S3/00—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
- H01S3/10—Controlling the intensity, frequency, phase, polarisation or direction of the emitted radiation, e.g. switching, gating, modulating or demodulating
- H01S3/105—Controlling the intensity, frequency, phase, polarisation or direction of the emitted radiation, e.g. switching, gating, modulating or demodulating by controlling the mutual position or the reflecting properties of the reflectors of the cavity, e.g. by controlling the cavity length
- H01S3/1055—Controlling the intensity, frequency, phase, polarisation or direction of the emitted radiation, e.g. switching, gating, modulating or demodulating by controlling the mutual position or the reflecting properties of the reflectors of the cavity, e.g. by controlling the cavity length one of the reflectors being constituted by a diffraction grating
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B82—NANOTECHNOLOGY
- B82Y—SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
- B82Y20/00—Nanooptics, e.g. quantum optics or photonic crystals
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
- H01S5/00—Semiconductor lasers
- H01S5/06—Arrangements for controlling the laser output parameters, e.g. by operating on the active medium
- H01S5/062—Arrangements for controlling the laser output parameters, e.g. by operating on the active medium by varying the potential of the electrodes
- H01S5/0625—Arrangements for controlling the laser output parameters, e.g. by operating on the active medium by varying the potential of the electrodes in multi-section lasers
- H01S5/06255—Controlling the frequency of the radiation
- H01S5/06256—Controlling the frequency of the radiation with DBR-structure
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
- H01S5/00—Semiconductor lasers
- H01S5/10—Construction or shape of the optical resonator, e.g. extended or external cavity, coupled cavities, bent-guide, varying width, thickness or composition of the active region
- H01S5/12—Construction or shape of the optical resonator, e.g. extended or external cavity, coupled cavities, bent-guide, varying width, thickness or composition of the active region the resonator having a periodic structure, e.g. in distributed feedback [DFB] lasers
- H01S5/125—Distributed Bragg reflector [DBR] lasers
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
- H01S5/00—Semiconductor lasers
- H01S5/30—Structure or shape of the active region; Materials used for the active region
- H01S5/34—Structure or shape of the active region; Materials used for the active region comprising quantum well or superlattice structures, e.g. single quantum well [SQW] lasers, multiple quantum well [MQW] lasers or graded index separate confinement heterostructure [GRINSCH] lasers
Priority Applications (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP62190040A JP2749038B2 (ja) | 1987-07-31 | 1987-07-31 | 波長可変半導体レーザ |
US07/224,726 US4873691A (en) | 1987-07-31 | 1988-07-27 | Wavelength-tunable semiconductor laser |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP62190040A JP2749038B2 (ja) | 1987-07-31 | 1987-07-31 | 波長可変半導体レーザ |
Publications (2)
Publication Number | Publication Date |
---|---|
JPS6435978A true JPS6435978A (en) | 1989-02-07 |
JP2749038B2 JP2749038B2 (ja) | 1998-05-13 |
Family
ID=16251359
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP62190040A Expired - Lifetime JP2749038B2 (ja) | 1987-07-31 | 1987-07-31 | 波長可変半導体レーザ |
Country Status (2)
Country | Link |
---|---|
US (1) | US4873691A (ja) |
JP (1) | JP2749038B2 (ja) |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
KR100828492B1 (ko) * | 2007-01-30 | 2008-05-13 | (주)선재하이테크 | 방전전극소켓 |
Families Citing this family (35)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2746326B2 (ja) * | 1989-01-10 | 1998-05-06 | 株式会社日立製作所 | 半導体光素子 |
US5020153A (en) * | 1989-02-08 | 1991-05-28 | At&T Bell Laboratories | Tunable narrowband receiver utilizing distributed Bragg reflector laser structure |
US5220573A (en) * | 1989-03-10 | 1993-06-15 | Canon Kabushiki Kaisha | Optical apparatus using wavelength selective photocoupler |
EP0391334B1 (en) * | 1989-04-04 | 1994-08-31 | Canon Kabushiki Kaisha | Semiconductor laser element capable of changing emission wavelength, and wavelength selective fitter, and methods of driving the same |
DE3934998A1 (de) * | 1989-10-20 | 1991-04-25 | Standard Elektrik Lorenz Ag | Elektrisch wellenlaengenabstimmbarer halbleiterlaser |
US5088097A (en) * | 1990-04-04 | 1992-02-11 | Canon Kabushiki Kaisha | Semiconductor laser element capable of changing emission wavelength, and method of driving the same |
JP3152424B2 (ja) * | 1990-07-13 | 2001-04-03 | 株式会社日立製作所 | 波長可変半導体レーザ |
US5091916A (en) * | 1990-09-28 | 1992-02-25 | At&T Bell Laboratories | Distributed reflector laser having improved side mode suppression |
US5157537A (en) * | 1991-02-01 | 1992-10-20 | Yeda Research And Development Co., Ltd. | Distributed resonant cavity light beam modulator |
SE470454B (sv) * | 1992-08-26 | 1994-04-11 | Ericsson Telefon Ab L M | Optisk filteranordning |
JP2536714B2 (ja) * | 1993-03-03 | 1996-09-18 | 日本電気株式会社 | 光変調器集積型多重量子井戸構造半導体レ―ザ素子 |
JP2500617B2 (ja) * | 1993-06-25 | 1996-05-29 | 日本電気株式会社 | 屈折率制御光半導体構造 |
JPH0738204A (ja) * | 1993-07-20 | 1995-02-07 | Mitsubishi Electric Corp | 半導体光デバイス及びその製造方法 |
GB2292011B (en) * | 1993-07-20 | 1997-11-05 | Mitsubishi Electric Corp | Semiconductor optical devices and methods for fabricating semiconductor optical devices |
US6194240B1 (en) * | 1993-12-21 | 2001-02-27 | Lucent Technologies Inc. | Method for fabrication of wavelength selective electro-optic grating for DFB/DBR lasers |
JPH08255891A (ja) * | 1995-03-17 | 1996-10-01 | Mitsubishi Electric Corp | 光集積回路装置及びその駆動方法 |
FR2748353B1 (fr) * | 1996-05-06 | 1998-07-31 | France Telecom | Composants d'emission laser a reseau de bragg distribue |
JP3404242B2 (ja) * | 1997-02-14 | 2003-05-06 | 日本電気株式会社 | 波長可変半導体レーザの駆動方法及び波長可変光源装置 |
GB2354110A (en) * | 1999-09-08 | 2001-03-14 | Univ Bristol | Ridge waveguide lasers |
JP2001320124A (ja) * | 2000-05-09 | 2001-11-16 | Nec Corp | 変調器集積化光源及び光通信用モジュール |
US6678301B1 (en) * | 2000-07-14 | 2004-01-13 | Triquint Technology Holding Co. | Apparatus and method for minimizing wavelength chirp of laser devices |
AU2001293015A1 (en) * | 2000-09-25 | 2002-04-08 | Massachusetts Institute Of Technology | Optical micro-cavity sensors |
WO2002039166A1 (en) * | 2000-11-13 | 2002-05-16 | Zhongshan Liu | Laser array for generating stable multi-wavelength laser outputs |
US7003010B2 (en) * | 2000-11-27 | 2006-02-21 | Zhongshan Liu | Multi-group multi-wavelength laser matrix |
GB2369491A (en) * | 2000-11-28 | 2002-05-29 | Kamelian Ltd | Tunable semiconductor laser |
US6717964B2 (en) * | 2001-07-02 | 2004-04-06 | E20 Communications, Inc. | Method and apparatus for wavelength tuning of optically pumped vertical cavity surface emitting lasers |
US6643308B2 (en) * | 2001-07-06 | 2003-11-04 | The Furukawa Electric Co., Ltd. | Semiconductor laser device and method for suppressing injection current |
GB0124217D0 (en) * | 2001-10-09 | 2001-11-28 | Denselight Semiconductors Pte | Two-section distributed bragg reflector laser |
FR2830991B1 (fr) * | 2001-10-15 | 2004-01-30 | Cit Alcatel | Cavite optique resonante sur une plage continue de frequences |
US7106920B2 (en) * | 2001-11-13 | 2006-09-12 | Zhongshan Liu | Laser array for generating stable multi-wavelength laser outputs |
EP1396913A1 (en) * | 2002-09-03 | 2004-03-10 | Agilent Technologies, Inc. - a Delaware corporation - | Single mode distributed feedback lasers |
US20060126157A1 (en) * | 2004-12-14 | 2006-06-15 | Electronics And Telecommunications Research Institute | Monolithic integrated semiconductor modulator-SOA-LED broad band light source and method of fabricating the same |
US7723139B2 (en) * | 2007-10-01 | 2010-05-25 | Corning Incorporated | Quantum well intermixing |
CN112740492B (zh) * | 2019-01-04 | 2023-04-04 | 华为技术有限公司 | 半导体激光器、光发射组件、光线路终端及光网络单元 |
CN112670823B (zh) * | 2020-12-23 | 2022-03-11 | 中国科学院半导体研究所 | 电吸收调制激光器的制作方法 |
Citations (6)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS60145692A (ja) * | 1984-01-10 | 1985-08-01 | Nec Corp | 単一軸モ−ド半導体レ−ザ |
JPS6154690A (ja) * | 1984-08-24 | 1986-03-18 | Nec Corp | 半導体レ−ザ装置 |
JPS61168980A (ja) * | 1985-01-22 | 1986-07-30 | Nippon Telegr & Teleph Corp <Ntt> | 半導体発光素子 |
JPS61198212A (ja) * | 1985-02-28 | 1986-09-02 | Tokyo Inst Of Technol | 光回路機能素子 |
JPS61220389A (ja) * | 1985-03-26 | 1986-09-30 | Nec Corp | 集積型半導体レ−ザ |
JPS63313885A (ja) * | 1987-06-17 | 1988-12-21 | Fujitsu Ltd | 半導体発光装置 |
-
1987
- 1987-07-31 JP JP62190040A patent/JP2749038B2/ja not_active Expired - Lifetime
-
1988
- 1988-07-27 US US07/224,726 patent/US4873691A/en not_active Expired - Lifetime
Patent Citations (6)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS60145692A (ja) * | 1984-01-10 | 1985-08-01 | Nec Corp | 単一軸モ−ド半導体レ−ザ |
JPS6154690A (ja) * | 1984-08-24 | 1986-03-18 | Nec Corp | 半導体レ−ザ装置 |
JPS61168980A (ja) * | 1985-01-22 | 1986-07-30 | Nippon Telegr & Teleph Corp <Ntt> | 半導体発光素子 |
JPS61198212A (ja) * | 1985-02-28 | 1986-09-02 | Tokyo Inst Of Technol | 光回路機能素子 |
JPS61220389A (ja) * | 1985-03-26 | 1986-09-30 | Nec Corp | 集積型半導体レ−ザ |
JPS63313885A (ja) * | 1987-06-17 | 1988-12-21 | Fujitsu Ltd | 半導体発光装置 |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
KR100828492B1 (ko) * | 2007-01-30 | 2008-05-13 | (주)선재하이테크 | 방전전극소켓 |
Also Published As
Publication number | Publication date |
---|---|
US4873691A (en) | 1989-10-10 |
JP2749038B2 (ja) | 1998-05-13 |
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