JPS6432634A - Plasma treater - Google Patents

Plasma treater

Info

Publication number
JPS6432634A
JPS6432634A JP18755487A JP18755487A JPS6432634A JP S6432634 A JPS6432634 A JP S6432634A JP 18755487 A JP18755487 A JP 18755487A JP 18755487 A JP18755487 A JP 18755487A JP S6432634 A JPS6432634 A JP S6432634A
Authority
JP
Japan
Prior art keywords
magnetic field
sample
coil
plasma
constant
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP18755487A
Other languages
English (en)
Inventor
Kazuo Suzuki
Tadashi Sonobe
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Hitachi Service Engineering Co Ltd
Hitachi Ltd
Original Assignee
Hitachi Service Engineering Co Ltd
Hitachi Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Hitachi Service Engineering Co Ltd, Hitachi Ltd filed Critical Hitachi Service Engineering Co Ltd
Priority to JP18755487A priority Critical patent/JPS6432634A/ja
Publication of JPS6432634A publication Critical patent/JPS6432634A/ja
Pending legal-status Critical Current

Links

Landscapes

  • Drying Of Semiconductors (AREA)
JP18755487A 1987-07-29 1987-07-29 Plasma treater Pending JPS6432634A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP18755487A JPS6432634A (en) 1987-07-29 1987-07-29 Plasma treater

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP18755487A JPS6432634A (en) 1987-07-29 1987-07-29 Plasma treater

Publications (1)

Publication Number Publication Date
JPS6432634A true JPS6432634A (en) 1989-02-02

Family

ID=16208111

Family Applications (1)

Application Number Title Priority Date Filing Date
JP18755487A Pending JPS6432634A (en) 1987-07-29 1987-07-29 Plasma treater

Country Status (1)

Country Link
JP (1) JPS6432634A (ja)

Cited By (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0314223A (ja) * 1989-06-13 1991-01-22 Fuji Electric Co Ltd Ｅｃｒプラズマｃｖｄ装置
WO1999062307A1 (fr) * 1998-05-26 1999-12-02 Pantechnik Dispositif destine a creer un champ magnetique a l'interieur d'une enceinte
KR100683416B1 (ko) * 2004-11-25 2007-02-20 피에스케이 주식회사 플라즈마 챔버 시스템 및 이를 이용하여 저유전막을 갖는기판 상에 형성된 포토레지스트 패턴을 애싱하는 방법
JP2009149999A (ja) * 2009-04-01 2009-07-09 Canon Anelva Corp 金属膜作製装置及び金属膜作製方法
JP2009149998A (ja) * 2009-04-01 2009-07-09 Canon Anelva Corp 銅薄膜の気相成長装置

Cited By (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0314223A (ja) * 1989-06-13 1991-01-22 Fuji Electric Co Ltd Ｅｃｒプラズマｃｖｄ装置
WO1999062307A1 (fr) * 1998-05-26 1999-12-02 Pantechnik Dispositif destine a creer un champ magnetique a l'interieur d'une enceinte
FR2779315A1 (fr) * 1998-05-26 1999-12-03 Pantechnik Dispositif destine a creer un champ magnetique a l'interieur d'une enceinte
KR100683416B1 (ko) * 2004-11-25 2007-02-20 피에스케이 주식회사 플라즈마 챔버 시스템 및 이를 이용하여 저유전막을 갖는기판 상에 형성된 포토레지스트 패턴을 애싱하는 방법
JP2009149999A (ja) * 2009-04-01 2009-07-09 Canon Anelva Corp 金属膜作製装置及び金属膜作製方法
JP2009149998A (ja) * 2009-04-01 2009-07-09 Canon Anelva Corp 銅薄膜の気相成長装置

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