JPS6430357U - - Google Patents

Info

Publication number
JPS6430357U
JPS6430357U JP12363787U JP12363787U JPS6430357U JP S6430357 U JPS6430357 U JP S6430357U JP 12363787 U JP12363787 U JP 12363787U JP 12363787 U JP12363787 U JP 12363787U JP S6430357 U JPS6430357 U JP S6430357U
Authority
JP
Japan
Prior art keywords
reaction chamber
raw material
gas inlet
gas
utility
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP12363787U
Other languages
English (en)
Japanese (ja)
Other versions
JPH0613256Y2 (ja
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed filed Critical
Priority to JP1987123637U priority Critical patent/JPH0613256Y2/ja
Publication of JPS6430357U publication Critical patent/JPS6430357U/ja
Application granted granted Critical
Publication of JPH0613256Y2 publication Critical patent/JPH0613256Y2/ja
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

Links

Landscapes

  • Chemical Vapour Deposition (AREA)
JP1987123637U 1987-08-12 1987-08-12 反応室ガス導入器 Expired - Lifetime JPH0613256Y2 (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP1987123637U JPH0613256Y2 (ja) 1987-08-12 1987-08-12 反応室ガス導入器

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP1987123637U JPH0613256Y2 (ja) 1987-08-12 1987-08-12 反応室ガス導入器

Publications (2)

Publication Number Publication Date
JPS6430357U true JPS6430357U (enrdf_load_stackoverflow) 1989-02-23
JPH0613256Y2 JPH0613256Y2 (ja) 1994-04-06

Family

ID=31372666

Family Applications (1)

Application Number Title Priority Date Filing Date
JP1987123637U Expired - Lifetime JPH0613256Y2 (ja) 1987-08-12 1987-08-12 反応室ガス導入器

Country Status (1)

Country Link
JP (1) JPH0613256Y2 (enrdf_load_stackoverflow)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2012501067A (ja) * 2008-08-22 2012-01-12 アプライド マテリアルズ インコーポレイテッド 半導体プロセスチャンバのプロセスガス配送

Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS573706A (en) * 1980-06-04 1982-01-09 Hitachi Chem Co Ltd Vapor-phase deposition
JPS6134179A (ja) * 1984-07-25 1986-02-18 Hitachi Ltd Ｃｖｄ装置における条件設定方法

Patent Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS573706A (en) * 1980-06-04 1982-01-09 Hitachi Chem Co Ltd Vapor-phase deposition
JPS6134179A (ja) * 1984-07-25 1986-02-18 Hitachi Ltd Ｃｖｄ装置における条件設定方法

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2012501067A (ja) * 2008-08-22 2012-01-12 アプライド マテリアルズ インコーポレイテッド 半導体プロセスチャンバのプロセスガス配送

Also Published As

Publication number Publication date
JPH0613256Y2 (ja) 1994-04-06

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