JPH0613256Y2 - 反応室ガス導入器 - Google Patents

反応室ガス導入器

Info

Publication number
JPH0613256Y2
JPH0613256Y2 JP1987123637U JP12363787U JPH0613256Y2 JP H0613256 Y2 JPH0613256 Y2 JP H0613256Y2 JP 1987123637 U JP1987123637 U JP 1987123637U JP 12363787 U JP12363787 U JP 12363787U JP H0613256 Y2 JPH0613256 Y2 JP H0613256Y2
Authority
JP
Japan
Prior art keywords
reaction chamber
gas
raw material
mixing
mixed
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
JP1987123637U
Other languages
English (en)
Japanese (ja)
Other versions
JPS6430357U (enrdf_load_stackoverflow
Inventor
和田　　晃
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Fuji Electric Co Ltd
Original Assignee
Fuji Electric Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Fuji Electric Co Ltd filed Critical Fuji Electric Co Ltd
Priority to JP1987123637U priority Critical patent/JPH0613256Y2/ja
Publication of JPS6430357U publication Critical patent/JPS6430357U/ja
Application granted granted Critical
Publication of JPH0613256Y2 publication Critical patent/JPH0613256Y2/ja
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

Links

Landscapes

  • Chemical Vapour Deposition (AREA)
JP1987123637U 1987-08-12 1987-08-12 反応室ガス導入器 Expired - Lifetime JPH0613256Y2 (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP1987123637U JPH0613256Y2 (ja) 1987-08-12 1987-08-12 反応室ガス導入器

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP1987123637U JPH0613256Y2 (ja) 1987-08-12 1987-08-12 反応室ガス導入器

Publications (2)

Publication Number Publication Date
JPS6430357U JPS6430357U (enrdf_load_stackoverflow) 1989-02-23
JPH0613256Y2 true JPH0613256Y2 (ja) 1994-04-06

Family

ID=31372666

Family Applications (1)

Application Number Title Priority Date Filing Date
JP1987123637U Expired - Lifetime JPH0613256Y2 (ja) 1987-08-12 1987-08-12 反応室ガス導入器

Country Status (1)

Country Link
JP (1) JPH0613256Y2 (enrdf_load_stackoverflow)

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US8187381B2 (en) * 2008-08-22 2012-05-29 Applied Materials, Inc. Process gas delivery for semiconductor process chamber

Family Cites Families (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS573706A (en) * 1980-06-04 1982-01-09 Hitachi Chem Co Ltd Vapor-phase deposition
JPS6134179A (ja) * 1984-07-25 1986-02-18 Hitachi Ltd Ｃｖｄ装置における条件設定方法

Also Published As

Publication number Publication date
JPS6430357U (enrdf_load_stackoverflow) 1989-02-23

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