JPS6428822A - Plasma etching device - Google Patents

Plasma etching device

Info

Publication number
JPS6428822A
JPS6428822A JP18329487A JP18329487A JPS6428822A JP S6428822 A JPS6428822 A JP S6428822A JP 18329487 A JP18329487 A JP 18329487A JP 18329487 A JP18329487 A JP 18329487A JP S6428822 A JPS6428822 A JP S6428822A
Authority
JP
Japan
Prior art keywords
chamber
main chamber
selection ratio
sub
dissociated
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP18329487A
Other languages
Japanese (ja)
Other versions
JP2624966B2 (en
Inventor
Masato Sadaoka
Kazuo Nojiri
Yoshimichi Hirobe
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Hitachi Ltd
Original Assignee
Hitachi Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Hitachi Ltd filed Critical Hitachi Ltd
Priority to JP62183294A priority Critical patent/JP2624966B2/en
Publication of JPS6428822A publication Critical patent/JPS6428822A/en
Application granted granted Critical
Publication of JP2624966B2 publication Critical patent/JP2624966B2/en
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

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Abstract

PURPOSE:To improve the selection ratio of etching by a method wherein such of dissociated products produced by the discharge of reactive gas in a main chamber as deteriorate the selection ratio of etching process are coupled with other dissociated products of additive gas in an auxiliary chamber to be removed. CONSTITUTION:A chamber 2 is divided into a main chamber 2a provided with a specimen base 3 and a sub chamber 2b formed outside the main chamber 2a. The partition wall 6 partitioning the main chamber 2a with the sub chamber 2b is made of a porous material with breathability. Reactive gas and additive gas are respectively led into the main chamber 2a and the sub chamber 2b. A feeder pipe 7 is connected to the chamber 2. Through these procedures, an F radical out of the dissociated products produced by the discharge of reactive gas in the main chamber 2a, the other dissociated product (H<+>, H2<+> ion) of the additive gas in the sub chamber 2b are coupled with one another to be removed at the position distant from a wafer 1. Thus, the selection ratio of etching can be improved.
JP62183294A 1987-07-24 1987-07-24 Plasma etching equipment Expired - Fee Related JP2624966B2 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP62183294A JP2624966B2 (en) 1987-07-24 1987-07-24 Plasma etching equipment

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP62183294A JP2624966B2 (en) 1987-07-24 1987-07-24 Plasma etching equipment

Publications (2)

Publication Number Publication Date
JPS6428822A true JPS6428822A (en) 1989-01-31
JP2624966B2 JP2624966B2 (en) 1997-06-25

Family

ID=16133144

Family Applications (1)

Application Number Title Priority Date Filing Date
JP62183294A Expired - Fee Related JP2624966B2 (en) 1987-07-24 1987-07-24 Plasma etching equipment

Country Status (1)

Country Link
JP (1) JP2624966B2 (en)

Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5675573A (en) * 1979-11-22 1981-06-22 Toshiba Corp Ion etching method
JPS62115700A (en) * 1985-11-15 1987-05-27 キヤノン株式会社 Vapor phase exciter

Patent Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5675573A (en) * 1979-11-22 1981-06-22 Toshiba Corp Ion etching method
JPS62115700A (en) * 1985-11-15 1987-05-27 キヤノン株式会社 Vapor phase exciter

Also Published As

Publication number Publication date
JP2624966B2 (en) 1997-06-25

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Legal Events

Date Code Title Description
LAPS Cancellation because of no payment of annual fees