JPS6425976A - Sputtering device - Google Patents

Sputtering device

Info

Publication number
JPS6425976A
JPS6425976A JP18038787A JP18038787A JPS6425976A JP S6425976 A JPS6425976 A JP S6425976A JP 18038787 A JP18038787 A JP 18038787A JP 18038787 A JP18038787 A JP 18038787A JP S6425976 A JPS6425976 A JP S6425976A
Authority
JP
Japan
Prior art keywords
gas
reflector
gas introducing
chamber
plural
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP18038787A
Other languages
English (en)
Japanese (ja)
Other versions
JPH0240738B2 (enExample
Inventor
Norihiko Konno
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Tokuda Seisakusho Co Ltd
Original Assignee
Tokuda Seisakusho Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Tokuda Seisakusho Co Ltd filed Critical Tokuda Seisakusho Co Ltd
Priority to JP18038787A priority Critical patent/JPS6425976A/ja
Publication of JPS6425976A publication Critical patent/JPS6425976A/ja
Publication of JPH0240738B2 publication Critical patent/JPH0240738B2/ja
Granted legal-status Critical Current

Links

Landscapes

  • Physical Vapour Deposition (AREA)
  • Physical Deposition Of Substances That Are Components Of Semiconductor Devices (AREA)
JP18038787A 1987-07-20 1987-07-20 Sputtering device Granted JPS6425976A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP18038787A JPS6425976A (en) 1987-07-20 1987-07-20 Sputtering device

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP18038787A JPS6425976A (en) 1987-07-20 1987-07-20 Sputtering device

Publications (2)

Publication Number Publication Date
JPS6425976A true JPS6425976A (en) 1989-01-27
JPH0240738B2 JPH0240738B2 (enExample) 1990-09-13

Family

ID=16082341

Family Applications (1)

Application Number Title Priority Date Filing Date
JP18038787A Granted JPS6425976A (en) 1987-07-20 1987-07-20 Sputtering device

Country Status (1)

Country Link
JP (1) JPS6425976A (enExample)

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH02225663A (ja) * 1989-02-27 1990-09-07 Tokuda Seisakusho Ltd スパッタ装置
US5582017A (en) * 1994-04-28 1996-12-10 Ebara Corporation Cryopump
WO2011010164A2 (en) 2009-07-24 2011-01-27 Natural Adcampaign Limited Printable advertising and display supports

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH02225663A (ja) * 1989-02-27 1990-09-07 Tokuda Seisakusho Ltd スパッタ装置
US5582017A (en) * 1994-04-28 1996-12-10 Ebara Corporation Cryopump
WO2011010164A2 (en) 2009-07-24 2011-01-27 Natural Adcampaign Limited Printable advertising and display supports

Also Published As

Publication number Publication date
JPH0240738B2 (enExample) 1990-09-13

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