JPS642243A - Aligning method for electron beam - Google Patents

Aligning method for electron beam

Info

Publication number
JPS642243A
JPS642243A JP62157108A JP15710887A JPS642243A JP S642243 A JPS642243 A JP S642243A JP 62157108 A JP62157108 A JP 62157108A JP 15710887 A JP15710887 A JP 15710887A JP S642243 A JPS642243 A JP S642243A
Authority
JP
Japan
Prior art keywords
electron beam
deflector
aperture
absorption current
deflecting voltage
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP62157108A
Other languages
English (en)
Other versions
JPH012243A (ja
JPH0821351B2 (ja
Inventor
Toshihiro Ishizuka
Akio Ito
Kazuyuki Ozaki
Kazuo Okubo
Katsuhiko Tsuchido
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Fujitsu Ltd
Original Assignee
Fujitsu Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Fujitsu Ltd filed Critical Fujitsu Ltd
Priority to JP62157108A priority Critical patent/JPH0821351B2/ja
Publication of JPS642243A publication Critical patent/JPS642243A/ja
Publication of JPH012243A publication Critical patent/JPH012243A/ja
Publication of JPH0821351B2 publication Critical patent/JPH0821351B2/ja
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

Links

Landscapes

  • Electron Sources, Ion Sources (AREA)
JP62157108A 1987-06-24 1987-06-24 電子ビ−ムのアライメント方法 Expired - Lifetime JPH0821351B2 (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP62157108A JPH0821351B2 (ja) 1987-06-24 1987-06-24 電子ビ−ムのアライメント方法

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP62157108A JPH0821351B2 (ja) 1987-06-24 1987-06-24 電子ビ−ムのアライメント方法

Publications (3)

Publication Number Publication Date
JPS642243A true JPS642243A (en) 1989-01-06
JPH012243A JPH012243A (ja) 1989-01-06
JPH0821351B2 JPH0821351B2 (ja) 1996-03-04

Family

ID=15642403

Family Applications (1)

Application Number Title Priority Date Filing Date
JP62157108A Expired - Lifetime JPH0821351B2 (ja) 1987-06-24 1987-06-24 電子ビ−ムのアライメント方法

Country Status (1)

Country Link
JP (1) JPH0821351B2 (ja)

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0629786A (ja) * 1991-10-08 1994-02-04 Crystal Semiconductor Corp デジタル・インターポレーション用低精度firフィルタ
JPH0766687A (ja) * 1993-08-20 1995-03-10 Nippon Columbia Co Ltd ディジタル信号処理装置
JP2011077180A (ja) * 2009-09-29 2011-04-14 Nuflare Technology Inc 荷電粒子ビーム描画装置及び荷電粒子ビームのアライメント方法
WO2016199738A1 (ja) * 2015-06-08 2016-12-15 株式会社ニコン 荷電粒子ビーム露光装置及びデバイス製造方法

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0629786A (ja) * 1991-10-08 1994-02-04 Crystal Semiconductor Corp デジタル・インターポレーション用低精度firフィルタ
JPH0766687A (ja) * 1993-08-20 1995-03-10 Nippon Columbia Co Ltd ディジタル信号処理装置
JP2011077180A (ja) * 2009-09-29 2011-04-14 Nuflare Technology Inc 荷電粒子ビーム描画装置及び荷電粒子ビームのアライメント方法
WO2016199738A1 (ja) * 2015-06-08 2016-12-15 株式会社ニコン 荷電粒子ビーム露光装置及びデバイス製造方法

Also Published As

Publication number Publication date
JPH0821351B2 (ja) 1996-03-04

Similar Documents

Publication Publication Date Title
US6153880A (en) Method and apparatus for performance improvement of mass spectrometers using dynamic ion optics
JPS5750749A (en) Electromagnetic deflection type cathode ray tube
EP0690473A3 (en) Ion beam electron neutralizer
JPS642243A (en) Aligning method for electron beam
JPS5367099A (en) Electron beam shape accelerator
EP0475199A3 (en) A fast atom beam source
US4823005A (en) Electron beam apparatus
JPS63200434A (ja) イオンビ−ム発生装置
US4205254A (en) Electron gun for a cathode ray tube
JPS5648029A (en) Electron gun
JPS6217349B2 (ja)
JPS6465759A (en) Charged powder apparatus with beam discriminator
JPS5447472A (en) Picture display unit
JPS556829A (en) Electron beam exposure method
JPS55126849A (en) Analyzer
SU884218A1 (ru) Устройство дл электронно-лучевой сварки
JPS5856947B2 (ja) 電子ビ−ムの軸合せ装置
JPS5630231A (en) Thermoelectron radiating cathode
US4345182A (en) Electrode having spiral-shaped electrically conducting regions therein useful as an anode in electron beam discharge devices
JPS57157442A (en) Electrostatic deflecting electron gun
JPS57157448A (en) Mass spectrometer
JPS57128439A (en) Electron gun and cathode-ray tube
JPH0475622B2 (ja)
JPS5778138A (en) Electron beam driwing device
ES8700799A1 (es) Un tubo de rayos catodicos