JPS6420651A - Semiconductor output buffer device - Google Patents

Semiconductor output buffer device

Info

Publication number
JPS6420651A
JPS6420651A JP63082853A JP8285388A JPS6420651A JP S6420651 A JPS6420651 A JP S6420651A JP 63082853 A JP63082853 A JP 63082853A JP 8285388 A JP8285388 A JP 8285388A JP S6420651 A JPS6420651 A JP S6420651A
Authority
JP
Japan
Prior art keywords
well
output buffer
transistor
region
drain region
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP63082853A
Other languages
Japanese (ja)
Other versions
JP2792628B2 (en
Inventor
Enu Rountorii Robaato
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Texas Instruments Inc
Original Assignee
Texas Instruments Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Texas Instruments Inc filed Critical Texas Instruments Inc
Publication of JPS6420651A publication Critical patent/JPS6420651A/en
Application granted granted Critical
Publication of JP2792628B2 publication Critical patent/JP2792628B2/en
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

Links

Abstract

PURPOSE: To protect a semiconductor output buffer device from static discharge by providing a transistor in which diffusion regions are formed at appropriate intervals as well as an n-channel transistor in an output buffer. CONSTITUTION: In an output buffer formed on the semiconductor surface of a substrate, an n-channel transistor 110 is formed and, at the same time, a transistor 120 is formed in an n-well 122. The gate electrode 124 of the transistor 120 has four fingers each of which overlaps a drain region 126 and a source region 128 in the well 122. An additional n-type diffusion region 140 is formed in the well 122 at a short distance D from the source region 128 on the side face of the source region 128 on the opposite side of the drain region 126. The resistance in the diffusion region 140 becomes smaller as compared with the well 122 and, when extraordinarily large charges are applied upon the output buffer from power sources Vdd and Vss, the breakdown of the p-n junction between the drain region 126 and well 122 can be prevented and the buffer can be protected from static discharge.
JP63082853A 1987-04-03 1988-04-04 Semiconductor device Expired - Lifetime JP2792628B2 (en)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US3446587A 1987-04-03 1987-04-03
US034465 1987-04-03

Publications (2)

Publication Number Publication Date
JPS6420651A true JPS6420651A (en) 1989-01-24
JP2792628B2 JP2792628B2 (en) 1998-09-03

Family

ID=21876598

Family Applications (1)

Application Number Title Priority Date Filing Date
JP63082853A Expired - Lifetime JP2792628B2 (en) 1987-04-03 1988-04-04 Semiconductor device

Country Status (1)

Country Link
JP (1) JP2792628B2 (en)

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH031532A (en) * 1989-05-29 1991-01-08 Matsushita Electric Ind Co Ltd Manufacture of semiconductor device
JP2000349165A (en) * 1999-03-25 2000-12-15 Seiko Instruments Inc Semiconductor integrated circuit device and manufacture thereof
US6191461B1 (en) 1998-01-12 2001-02-20 Mitsubishi Denki Kabushiki Kaisha Semiconductor device including output circuit improved in electrostatic damage resistance
CN110190840A (en) * 2018-02-22 2019-08-30 株式会社自动网络技术研究所 Control device

Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS59169225A (en) * 1983-03-16 1984-09-25 Nec Corp Integrated circuit
JPS60123053A (en) * 1983-12-07 1985-07-01 Hitachi Micro Comput Eng Ltd Semiconductor device
JPS6129169A (en) * 1984-07-20 1986-02-10 Hitachi Ltd Semiconductor device
JPS61260669A (en) * 1985-05-09 1986-11-18 アドバンスト・マイクロ・デイバイシズ・インコ−ポレ−テツド Bias generator circuit

Patent Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS59169225A (en) * 1983-03-16 1984-09-25 Nec Corp Integrated circuit
JPS60123053A (en) * 1983-12-07 1985-07-01 Hitachi Micro Comput Eng Ltd Semiconductor device
JPS6129169A (en) * 1984-07-20 1986-02-10 Hitachi Ltd Semiconductor device
JPS61260669A (en) * 1985-05-09 1986-11-18 アドバンスト・マイクロ・デイバイシズ・インコ−ポレ−テツド Bias generator circuit

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH031532A (en) * 1989-05-29 1991-01-08 Matsushita Electric Ind Co Ltd Manufacture of semiconductor device
US6191461B1 (en) 1998-01-12 2001-02-20 Mitsubishi Denki Kabushiki Kaisha Semiconductor device including output circuit improved in electrostatic damage resistance
JP2000349165A (en) * 1999-03-25 2000-12-15 Seiko Instruments Inc Semiconductor integrated circuit device and manufacture thereof
CN110190840A (en) * 2018-02-22 2019-08-30 株式会社自动网络技术研究所 Control device

Also Published As

Publication number Publication date
JP2792628B2 (en) 1998-09-03

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