JPS6415953A - Dry etching method - Google Patents
Dry etching methodInfo
- Publication number
- JPS6415953A JPS6415953A JP17096587A JP17096587A JPS6415953A JP S6415953 A JPS6415953 A JP S6415953A JP 17096587 A JP17096587 A JP 17096587A JP 17096587 A JP17096587 A JP 17096587A JP S6415953 A JPS6415953 A JP S6415953A
- Authority
- JP
- Japan
- Prior art keywords
- film
- etching
- etched
- chamber
- dry etching
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
Abstract
PURPOSE:To enable the shape control of the etching of a two-layered wiring film by a method wherein, in a dry etching method for processing a two-layered metal film, the respective metal films are processed in different chambers and with different etching conditions. CONSTITUTION:A wafer is first etched in a chamber 6 on an Al-Si-Cu film 2 which is the upper film thereof. Then, it passes through a buffer 7 and, held in vacuum, transferred to a chamber 8 where a Ti film 3 is etched. In etching the Ti film 3, by mixing a chlorine gas by 50%, a vertical shape is obtained. By monitoring the strength of a specific wavelength to accurately determine the ending of the etching of the Ti film, excessive etching of the ground insulating film can be prevented.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP62170965A JP2690900B2 (en) | 1987-07-10 | 1987-07-10 | Dry etching method |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP62170965A JP2690900B2 (en) | 1987-07-10 | 1987-07-10 | Dry etching method |
Publications (2)
Publication Number | Publication Date |
---|---|
JPS6415953A true JPS6415953A (en) | 1989-01-19 |
JP2690900B2 JP2690900B2 (en) | 1997-12-17 |
Family
ID=15914651
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP62170965A Expired - Lifetime JP2690900B2 (en) | 1987-07-10 | 1987-07-10 | Dry etching method |
Country Status (1)
Country | Link |
---|---|
JP (1) | JP2690900B2 (en) |
Cited By (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2007010502A (en) * | 2005-06-30 | 2007-01-18 | Sunx Ltd | Foreign matter detector |
JP2007040972A (en) * | 2005-06-30 | 2007-02-15 | Sunx Ltd | Foreign material detector |
JP2008032654A (en) * | 2006-07-31 | 2008-02-14 | Sunx Ltd | Foreign material detector |
US20130300794A1 (en) * | 2012-05-09 | 2013-11-14 | Xerox Corporation | System and method for detecting defects in an inkjet printer |
Citations (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS587829A (en) * | 1981-07-08 | 1983-01-17 | Toshiba Corp | Dry etching method |
JPS61256726A (en) * | 1985-05-10 | 1986-11-14 | Hitachi Ltd | Etching method |
JPS6214429A (en) * | 1985-07-12 | 1987-01-23 | Hitachi Ltd | Bias impression etching and device thereof |
JPS6258636A (en) * | 1985-09-09 | 1987-03-14 | Nippon Telegr & Teleph Corp <Ntt> | Dry etching process and device thereof |
JPS62154628A (en) * | 1985-12-26 | 1987-07-09 | Matsushita Electric Ind Co Ltd | Dry etching method |
-
1987
- 1987-07-10 JP JP62170965A patent/JP2690900B2/en not_active Expired - Lifetime
Patent Citations (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS587829A (en) * | 1981-07-08 | 1983-01-17 | Toshiba Corp | Dry etching method |
JPS61256726A (en) * | 1985-05-10 | 1986-11-14 | Hitachi Ltd | Etching method |
JPS6214429A (en) * | 1985-07-12 | 1987-01-23 | Hitachi Ltd | Bias impression etching and device thereof |
JPS6258636A (en) * | 1985-09-09 | 1987-03-14 | Nippon Telegr & Teleph Corp <Ntt> | Dry etching process and device thereof |
JPS62154628A (en) * | 1985-12-26 | 1987-07-09 | Matsushita Electric Ind Co Ltd | Dry etching method |
Cited By (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2007010502A (en) * | 2005-06-30 | 2007-01-18 | Sunx Ltd | Foreign matter detector |
JP2007040972A (en) * | 2005-06-30 | 2007-02-15 | Sunx Ltd | Foreign material detector |
JP2008032654A (en) * | 2006-07-31 | 2008-02-14 | Sunx Ltd | Foreign material detector |
US20130300794A1 (en) * | 2012-05-09 | 2013-11-14 | Xerox Corporation | System and method for detecting defects in an inkjet printer |
Also Published As
Publication number | Publication date |
---|---|
JP2690900B2 (en) | 1997-12-17 |
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