JPS6410596B2 - - Google Patents
Info
- Publication number
- JPS6410596B2 JPS6410596B2 JP10006180A JP10006180A JPS6410596B2 JP S6410596 B2 JPS6410596 B2 JP S6410596B2 JP 10006180 A JP10006180 A JP 10006180A JP 10006180 A JP10006180 A JP 10006180A JP S6410596 B2 JPS6410596 B2 JP S6410596B2
- Authority
- JP
- Japan
- Prior art keywords
- tank
- etching
- pipe
- liquid
- constant temperature
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
- 238000005530 etching Methods 0.000 claims description 45
- 239000000126 substance Substances 0.000 claims description 31
- 239000007788 liquid Substances 0.000 claims description 22
- 239000004065 semiconductor Substances 0.000 claims description 13
- 239000000758 substrate Substances 0.000 claims description 13
- 238000005260 corrosion Methods 0.000 claims description 3
- 230000007797 corrosion Effects 0.000 claims description 3
- QTBSBXVTEAMEQO-UHFFFAOYSA-N Acetic acid Chemical compound CC(O)=O QTBSBXVTEAMEQO-UHFFFAOYSA-N 0.000 description 8
- KRHYYFGTRYWZRS-UHFFFAOYSA-N Fluorane Chemical compound F KRHYYFGTRYWZRS-UHFFFAOYSA-N 0.000 description 8
- 239000004809 Teflon Substances 0.000 description 6
- 229920006362 Teflon® Polymers 0.000 description 6
- 238000000034 method Methods 0.000 description 5
- GRYLNZFGIOXLOG-UHFFFAOYSA-N Nitric acid Chemical compound O[N+]([O-])=O GRYLNZFGIOXLOG-UHFFFAOYSA-N 0.000 description 4
- 229960000583 acetic acid Drugs 0.000 description 4
- 239000012362 glacial acetic acid Substances 0.000 description 4
- 229910017604 nitric acid Inorganic materials 0.000 description 4
- 238000010586 diagram Methods 0.000 description 3
- 239000000463 material Substances 0.000 description 2
- 230000002093 peripheral effect Effects 0.000 description 2
- 238000007796 conventional method Methods 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 238000004519 manufacturing process Methods 0.000 description 1
- 239000000203 mixture Substances 0.000 description 1
Landscapes
- ing And Chemical Polishing (AREA)
- Weting (AREA)
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP10006180A JPS5726173A (en) | 1980-07-22 | 1980-07-22 | Etching apparatus |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP10006180A JPS5726173A (en) | 1980-07-22 | 1980-07-22 | Etching apparatus |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS5726173A JPS5726173A (en) | 1982-02-12 |
| JPS6410596B2 true JPS6410596B2 (OSRAM) | 1989-02-22 |
Family
ID=14263947
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP10006180A Granted JPS5726173A (en) | 1980-07-22 | 1980-07-22 | Etching apparatus |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS5726173A (OSRAM) |
Families Citing this family (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP4572623B2 (ja) * | 2004-08-23 | 2010-11-04 | パナソニック株式会社 | コンデンサ用電極箔の製造装置 |
-
1980
- 1980-07-22 JP JP10006180A patent/JPS5726173A/ja active Granted
Also Published As
| Publication number | Publication date |
|---|---|
| JPS5726173A (en) | 1982-02-12 |
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