JPS637463B2 - - Google Patents
Info
- Publication number
- JPS637463B2 JPS637463B2 JP56103529A JP10352981A JPS637463B2 JP S637463 B2 JPS637463 B2 JP S637463B2 JP 56103529 A JP56103529 A JP 56103529A JP 10352981 A JP10352981 A JP 10352981A JP S637463 B2 JPS637463 B2 JP S637463B2
- Authority
- JP
- Japan
- Prior art keywords
- film
- insulating film
- films
- opening
- metal wiring
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
Landscapes
- Drying Of Semiconductors (AREA)
- Internal Circuitry In Semiconductor Integrated Circuit Devices (AREA)
- Electrodes Of Semiconductors (AREA)
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP10352981A JPS586149A (ja) | 1981-07-02 | 1981-07-02 | 半導体装置の製造方法 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP10352981A JPS586149A (ja) | 1981-07-02 | 1981-07-02 | 半導体装置の製造方法 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS586149A JPS586149A (ja) | 1983-01-13 |
| JPS637463B2 true JPS637463B2 (enrdf_load_stackoverflow) | 1988-02-17 |
Family
ID=14356416
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP10352981A Granted JPS586149A (ja) | 1981-07-02 | 1981-07-02 | 半導体装置の製造方法 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS586149A (enrdf_load_stackoverflow) |
Families Citing this family (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2586434B2 (ja) * | 1987-08-21 | 1997-02-26 | 株式会社デンソー | 磁気検出装置 |
Family Cites Families (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS52156375A (en) * | 1976-06-22 | 1977-12-26 | Nippon Electric Co | Method of producing multilayer circuit substrate |
-
1981
- 1981-07-02 JP JP10352981A patent/JPS586149A/ja active Granted
Also Published As
| Publication number | Publication date |
|---|---|
| JPS586149A (ja) | 1983-01-13 |
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| US6639303B2 (en) | Integrated circuits and methods for their fabrication | |
| US3456335A (en) | Contacting arrangement for solidstate components | |
| KR20000023210A (ko) | 반도체 디바이스 및 그 제조 방법 | |
| JPS61112356A (ja) | 集積回路に貫通導体を形成する方法 | |
| JP2001185551A (ja) | 半導体装置の構造及び製造方法 | |
| JPS637463B2 (enrdf_load_stackoverflow) | ||
| JPS6161698B2 (enrdf_load_stackoverflow) | ||
| JPS6381948A (ja) | 多層配線半導体装置 | |
| JPS5886746A (ja) | 半導体装置 | |
| JPS6160580B2 (enrdf_load_stackoverflow) | ||
| JPS61196555A (ja) | 多層配線の形成方法 | |
| JPS62179723A (ja) | 半導体装置の製造方法 | |
| JPH0611044B2 (ja) | 半導体装置の製造方法 | |
| JPS60180143A (ja) | 半導体装置 | |
| JPS58131752A (ja) | 多層配線形成方法 | |
| JPS63107141A (ja) | 半導体装置の製造方法 | |
| JP3447896B2 (ja) | Sog塗布膜の形成方法およびこれを用いた配線構造の形成方法 | |
| JPH01230269A (ja) | 半導体集積回路装置 | |
| JPS6149439A (ja) | 半導体装置の製造方法 | |
| JPS6151917A (ja) | 半導体装置の製造方法 | |
| JPS63169042A (ja) | 半導体装置の製造方法 | |
| JPS6143855B2 (enrdf_load_stackoverflow) | ||
| JPS62137852A (ja) | 半導体装置の製造方法 | |
| JPS62166547A (ja) | 多層配線構造体の形成方法 | |
| JPS5831557A (ja) | 半導体装置 |