JPS6366447A - 異物検査装置 - Google Patents

異物検査装置

Info

Publication number
JPS6366447A
JPS6366447A JP61211925A JP21192586A JPS6366447A JP S6366447 A JPS6366447 A JP S6366447A JP 61211925 A JP61211925 A JP 61211925A JP 21192586 A JP21192586 A JP 21192586A JP S6366447 A JPS6366447 A JP S6366447A
Authority
JP
Japan
Prior art keywords
foreign
chip area
pattern
effective
area
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP61211925A
Other languages
English (en)
Japanese (ja)
Other versions
JPH0516740B2 (enrdf_load_stackoverflow
Inventor
Toshiaki Taniuchi
谷内　俊明
Ryoji Nemoto
亮二 根本
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Hitachi High Tech Corp
Original Assignee
Hitachi Electronics Engineering Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Hitachi Electronics Engineering Co Ltd filed Critical Hitachi Electronics Engineering Co Ltd
Priority to JP61211925A priority Critical patent/JPS6366447A/ja
Publication of JPS6366447A publication Critical patent/JPS6366447A/ja
Publication of JPH0516740B2 publication Critical patent/JPH0516740B2/ja
Granted legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
    • G01N21/84—Systems specially adapted for particular applications
    • G01N21/88—Investigating the presence of flaws or contamination
    • G01N21/94—Investigating contamination, e.g. dust

Landscapes

  • Physics & Mathematics (AREA)
  • Health & Medical Sciences (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Chemical & Material Sciences (AREA)
  • Analytical Chemistry (AREA)
  • Biochemistry (AREA)
  • General Health & Medical Sciences (AREA)
  • General Physics & Mathematics (AREA)
  • Immunology (AREA)
  • Pathology (AREA)
  • Investigating Materials By The Use Of Optical Means Adapted For Particular Applications (AREA)
  • Testing Or Measuring Of Semiconductors Or The Like (AREA)
  • Facsimile Scanning Arrangements (AREA)
JP61211925A 1986-09-09 1986-09-09 異物検査装置 Granted JPS6366447A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP61211925A JPS6366447A (ja) 1986-09-09 1986-09-09 異物検査装置

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP61211925A JPS6366447A (ja) 1986-09-09 1986-09-09 異物検査装置

Publications (2)

Publication Number Publication Date
JPS6366447A true JPS6366447A (ja) 1988-03-25
JPH0516740B2 JPH0516740B2 (enrdf_load_stackoverflow) 1993-03-05

Family

ID=16613941

Family Applications (1)

Application Number Title Priority Date Filing Date
JP61211925A Granted JPS6366447A (ja) 1986-09-09 1986-09-09 異物検査装置

Country Status (1)

Country Link
JP (1) JPS6366447A (enrdf_load_stackoverflow)

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0344054A (ja) * 1989-07-12 1991-02-25 Hitachi Ltd 検査システムおよび電子デバイスの製造方法
US6404911B2 (en) 1989-07-12 2002-06-11 Hitachi, Ltd. Semiconductor failure analysis system
JP2017044671A (ja) * 2015-08-28 2017-03-02 三重富士通セミコンダクター株式会社 検査装置及び検査方法
CN111863649A (zh) * 2020-06-23 2020-10-30 深圳米飞泰克科技有限公司 芯片的成品测试方法、装置、终端设备和存储介质

Cited By (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0344054A (ja) * 1989-07-12 1991-02-25 Hitachi Ltd 検査システムおよび電子デバイスの製造方法
US6185322B1 (en) 1989-07-12 2001-02-06 Hitachi, Ltd. Inspection system and method using separate processors for processing different information regarding a workpiece such as an electronic device
US6330352B1 (en) 1989-07-12 2001-12-11 Hitachi, Ltd. Inspection data analyzing system
US6339653B1 (en) 1989-07-12 2002-01-15 Hitachi, Ltd. Inspection data analyzing system
US6404911B2 (en) 1989-07-12 2002-06-11 Hitachi, Ltd. Semiconductor failure analysis system
US6529619B2 (en) 1989-07-12 2003-03-04 Hitachi, Ltd. Inspection data analyzing system
US6628817B2 (en) 1989-07-12 2003-09-30 Hitachi, Ltd. Inspection data analyzing system
JP2017044671A (ja) * 2015-08-28 2017-03-02 三重富士通セミコンダクター株式会社 検査装置及び検査方法
CN111863649A (zh) * 2020-06-23 2020-10-30 深圳米飞泰克科技有限公司 芯片的成品测试方法、装置、终端设备和存储介质

Also Published As

Publication number Publication date
JPH0516740B2 (enrdf_load_stackoverflow) 1993-03-05

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