JPH0515219B2 - - Google Patents

Info

Publication number
JPH0515219B2
JPH0515219B2 JP61211924A JP21192486A JPH0515219B2 JP H0515219 B2 JPH0515219 B2 JP H0515219B2 JP 61211924 A JP61211924 A JP 61211924A JP 21192486 A JP21192486 A JP 21192486A JP H0515219 B2 JPH0515219 B2 JP H0515219B2
Authority
JP
Japan
Prior art keywords
foreign matter
foreign
semiconductor wafer
pattern
foreign object
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
JP61211924A
Other languages
English (en)
Japanese (ja)
Other versions
JPS6366446A (ja
Inventor
Toshiaki Yanai
Ryoji Nemoto
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Hitachi High Tech Corp
Original Assignee
Hitachi Electronics Engineering Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Hitachi Electronics Engineering Co Ltd filed Critical Hitachi Electronics Engineering Co Ltd
Priority to JP61211924A priority Critical patent/JPS6366446A/ja
Publication of JPS6366446A publication Critical patent/JPS6366446A/ja
Publication of JPH0515219B2 publication Critical patent/JPH0515219B2/ja
Granted legal-status Critical Current

Links

Classifications

    • GPHYSICS
    • G01MEASURING; TESTING
    • G01NINVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N21/00Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
    • G01N21/84Systems specially adapted for particular applications
    • G01N21/88Investigating the presence of flaws or contamination
    • G01N21/94Investigating contamination, e.g. dust

Landscapes

  • Physics & Mathematics (AREA)
  • Health & Medical Sciences (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Chemical & Material Sciences (AREA)
  • Analytical Chemistry (AREA)
  • Biochemistry (AREA)
  • General Health & Medical Sciences (AREA)
  • General Physics & Mathematics (AREA)
  • Immunology (AREA)
  • Pathology (AREA)
  • Investigating Materials By The Use Of Optical Means Adapted For Particular Applications (AREA)
  • Testing Or Measuring Of Semiconductors Or The Like (AREA)
  • Facsimile Scanning Arrangements (AREA)
JP61211924A 1986-09-09 1986-09-09 異物検査装置 Granted JPS6366446A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP61211924A JPS6366446A (ja) 1986-09-09 1986-09-09 異物検査装置

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP61211924A JPS6366446A (ja) 1986-09-09 1986-09-09 異物検査装置

Publications (2)

Publication Number Publication Date
JPS6366446A JPS6366446A (ja) 1988-03-25
JPH0515219B2 true JPH0515219B2 (enrdf_load_stackoverflow) 1993-03-01

Family

ID=16613923

Family Applications (1)

Application Number Title Priority Date Filing Date
JP61211924A Granted JPS6366446A (ja) 1986-09-09 1986-09-09 異物検査装置

Country Status (1)

Country Link
JP (1) JPS6366446A (enrdf_load_stackoverflow)

Families Citing this family (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6185324B1 (en) 1989-07-12 2001-02-06 Hitachi, Ltd. Semiconductor failure analysis system
JP2941308B2 (ja) 1989-07-12 1999-08-25 株式会社日立製作所 検査システムおよび電子デバイスの製造方法
JPH04128421U (ja) * 1991-01-31 1992-11-24 日本電波工業株式会社 Scカツトの水晶振動子
JP2531304Y2 (ja) * 1991-01-31 1997-04-02 日本電波工業株式会社 Scカットの水晶振動子
KR100584840B1 (ko) * 2002-12-24 2006-05-30 주식회사 이오테크닉스 칩 스케일 마커 및 마킹위치 보정방법

Also Published As

Publication number Publication date
JPS6366446A (ja) 1988-03-25

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Legal Events

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