JPS6365142B2 - - Google Patents

Info

Publication number
JPS6365142B2
JPS6365142B2 JP18000881A JP18000881A JPS6365142B2 JP S6365142 B2 JPS6365142 B2 JP S6365142B2 JP 18000881 A JP18000881 A JP 18000881A JP 18000881 A JP18000881 A JP 18000881A JP S6365142 B2 JPS6365142 B2 JP S6365142B2
Authority
JP
Japan
Prior art keywords
developer
resist pattern
ether
photoresists
rubber
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
JP18000881A
Other languages
English (en)
Japanese (ja)
Other versions
JPS5882244A (ja
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed filed Critical
Priority to JP18000881A priority Critical patent/JPS5882244A/ja
Publication of JPS5882244A publication Critical patent/JPS5882244A/ja
Publication of JPS6365142B2 publication Critical patent/JPS6365142B2/ja
Granted legal-status Critical Current

Links

Classifications

    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/26Processing photosensitive materials; Apparatus therefor
    • G03F7/30Imagewise removal using liquid means
    • G03F7/32Liquid compositions therefor, e.g. developers
    • G03F7/325Non-aqueous compositions

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
JP18000881A 1981-11-10 1981-11-10 ゴム系ホトレジスト用現像液 Granted JPS5882244A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP18000881A JPS5882244A (ja) 1981-11-10 1981-11-10 ゴム系ホトレジスト用現像液

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP18000881A JPS5882244A (ja) 1981-11-10 1981-11-10 ゴム系ホトレジスト用現像液

Publications (2)

Publication Number Publication Date
JPS5882244A JPS5882244A (ja) 1983-05-17
JPS6365142B2 true JPS6365142B2 (fr) 1988-12-14

Family

ID=16075835

Family Applications (1)

Application Number Title Priority Date Filing Date
JP18000881A Granted JPS5882244A (ja) 1981-11-10 1981-11-10 ゴム系ホトレジスト用現像液

Country Status (1)

Country Link
JP (1) JPS5882244A (fr)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH07118115B2 (ja) * 1989-10-24 1995-12-18 株式会社富士通ゼネラル Vtrトラッキング補正装置

Families Citing this family (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2546451B2 (ja) * 1991-05-21 1996-10-23 東レ株式会社 水なし平版印刷版用現像液
CN108139691A (zh) * 2015-09-30 2018-06-08 富士胶片株式会社 处理液及图案形成方法
JP6571199B2 (ja) * 2015-09-30 2019-09-04 富士フイルム株式会社 処理液及びパターン形成方法

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH07118115B2 (ja) * 1989-10-24 1995-12-18 株式会社富士通ゼネラル Vtrトラッキング補正装置

Also Published As

Publication number Publication date
JPS5882244A (ja) 1983-05-17

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