JPS5882244A - ゴム系ホトレジスト用現像液 - Google Patents

ゴム系ホトレジスト用現像液

Info

Publication number
JPS5882244A
JPS5882244A JP18000881A JP18000881A JPS5882244A JP S5882244 A JPS5882244 A JP S5882244A JP 18000881 A JP18000881 A JP 18000881A JP 18000881 A JP18000881 A JP 18000881A JP S5882244 A JPS5882244 A JP S5882244A
Authority
JP
Japan
Prior art keywords
developing
developer
aliphatic hydrocarbon
photoresist
rubber
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP18000881A
Other languages
English (en)
Japanese (ja)
Other versions
JPS6365142B2 (fr
Inventor
Takashi Komine
小峰　孝
Hatsuyuki Tanaka
初幸 田中
Cho Yamamoto
山本　兆
Hisashi Nakane
中根　久
Akira Yokota
晃 横田
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Tokyo Ohka Kogyo Co Ltd
Original Assignee
Tokyo Ohka Kogyo Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Tokyo Ohka Kogyo Co Ltd filed Critical Tokyo Ohka Kogyo Co Ltd
Priority to JP18000881A priority Critical patent/JPS5882244A/ja
Publication of JPS5882244A publication Critical patent/JPS5882244A/ja
Publication of JPS6365142B2 publication Critical patent/JPS6365142B2/ja
Granted legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/26—Processing photosensitive materials; Apparatus therefor
    • G03F7/30—Imagewise removal using liquid means
    • G03F7/32—Liquid compositions therefor, e.g. developers
    • G03F7/325—Non-aqueous compositions

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
JP18000881A 1981-11-10 1981-11-10 ゴム系ホトレジスト用現像液 Granted JPS5882244A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP18000881A JPS5882244A (ja) 1981-11-10 1981-11-10 ゴム系ホトレジスト用現像液

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP18000881A JPS5882244A (ja) 1981-11-10 1981-11-10 ゴム系ホトレジスト用現像液

Publications (2)

Publication Number Publication Date
JPS5882244A true JPS5882244A (ja) 1983-05-17
JPS6365142B2 JPS6365142B2 (fr) 1988-12-14

Family

ID=16075835

Family Applications (1)

Application Number Title Priority Date Filing Date
JP18000881A Granted JPS5882244A (ja) 1981-11-10 1981-11-10 ゴム系ホトレジスト用現像液

Country Status (1)

Country Link
JP (1) JPS5882244A (fr)

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH04343360A (ja) * 1991-05-21 1992-11-30 Toray Ind Inc 水なし平版印刷版用現像液
WO2017057253A1 (fr) * 2015-09-30 2017-04-06 富士フイルム株式会社 Liquide de traitement et procédé de formation de motifs
WO2017057225A1 (fr) * 2015-09-30 2017-04-06 富士フイルム株式会社 Solution de traitement et procédé de formation de motif

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH07118115B2 (ja) * 1989-10-24 1995-12-18 株式会社富士通ゼネラル Ｖｔｒトラッキング補正装置

Cited By (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH04343360A (ja) * 1991-05-21 1992-11-30 Toray Ind Inc 水なし平版印刷版用現像液
WO2017057253A1 (fr) * 2015-09-30 2017-04-06 富士フイルム株式会社 Liquide de traitement et procédé de formation de motifs
WO2017057225A1 (fr) * 2015-09-30 2017-04-06 富士フイルム株式会社 Solution de traitement et procédé de formation de motif
CN108139691A (zh) * 2015-09-30 2018-06-08 富士胶片株式会社 处理液及图案形成方法
JPWO2017057253A1 (ja) * 2015-09-30 2018-06-28 富士フイルム株式会社 処理液及びパターン形成方法
JPWO2017057225A1 (ja) * 2015-09-30 2018-06-28 富士フイルム株式会社 処理液及びパターン形成方法
US10962884B2 (en) 2015-09-30 2021-03-30 Fujifilm Corporation Treatment liquid and pattern forming method
US11042094B2 (en) 2015-09-30 2021-06-22 Fujifilm Corporation Treatment liquid and pattern forming method

Also Published As

Publication number Publication date
JPS6365142B2 (fr) 1988-12-14

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