JPS6356971B2 - - Google Patents

Info

Publication number
JPS6356971B2
JPS6356971B2 JP55100655A JP10065580A JPS6356971B2 JP S6356971 B2 JPS6356971 B2 JP S6356971B2 JP 55100655 A JP55100655 A JP 55100655A JP 10065580 A JP10065580 A JP 10065580A JP S6356971 B2 JPS6356971 B2 JP S6356971B2
Authority
JP
Japan
Prior art keywords
image
layout
document
information
projection
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
JP55100655A
Other languages
English (en)
Japanese (ja)
Other versions
JPS5724943A (en
Inventor
Kazuya Kitagawa
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Toppan Inc
Original Assignee
Toppan Printing Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Toppan Printing Co Ltd filed Critical Toppan Printing Co Ltd
Priority to JP10065580A priority Critical patent/JPS5724943A/ja
Publication of JPS5724943A publication Critical patent/JPS5724943A/ja
Publication of JPS6356971B2 publication Critical patent/JPS6356971B2/ja
Granted legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
    • G03F1/90—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof prepared by montage processes

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Editing Of Facsimile Originals (AREA)
  • Preparing Plates And Mask In Photomechanical Process (AREA)
  • Position Input By Displaying (AREA)
  • Facsimile Scanning Arrangements (AREA)
JP10065580A 1980-07-22 1980-07-22 Image processing method and apparatus used for this Granted JPS5724943A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP10065580A JPS5724943A (en) 1980-07-22 1980-07-22 Image processing method and apparatus used for this

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP10065580A JPS5724943A (en) 1980-07-22 1980-07-22 Image processing method and apparatus used for this

Publications (2)

Publication Number Publication Date
JPS5724943A JPS5724943A (en) 1982-02-09
JPS6356971B2 true JPS6356971B2 (enEXAMPLES) 1988-11-09

Family

ID=14279821

Family Applications (1)

Application Number Title Priority Date Filing Date
JP10065580A Granted JPS5724943A (en) 1980-07-22 1980-07-22 Image processing method and apparatus used for this

Country Status (1)

Country Link
JP (1) JPS5724943A (enEXAMPLES)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0444389A (ja) * 1990-06-12 1992-02-14 Hitachi Chem Co Ltd パッケージ型ｉｃの接続方法

Families Citing this family (16)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS58219687A (ja) * 1982-06-15 1983-12-21 Toppan Printing Co Ltd 拡大投影機構を有するデジタイザ−
DE3314116A1 (de) * 1983-04-19 1984-10-25 Dr.-Ing. Rudolf Hell Gmbh, 2300 Kiel Verfahren und vorrichtung zum bestimmen des bildausschnittes von vorlagen fuer die reproduktion in der drucktechnik
JPS59195656A (ja) * 1983-04-21 1984-11-06 Dainippon Printing Co Ltd 印刷製版用自動トリミングレイアウトシステム
JPS59195655A (ja) * 1983-04-21 1984-11-06 Dainippon Printing Co Ltd 印刷製版用自動トリミングレイアウトシステム
JPS59197040A (ja) * 1983-04-25 1984-11-08 Dainippon Screen Mfg Co Ltd 原画貼込み装置
JPS60143340A (ja) * 1983-08-13 1985-07-29 Dainippon Printing Co Ltd 印刷製版用自動トリミングレイアウトスキヤナ
JPS6120042A (ja) * 1984-07-06 1986-01-28 Dainippon Screen Mfg Co Ltd 画像走査記録方法及び装置
JPS6120041A (ja) * 1984-07-07 1986-01-28 Dainippon Printing Co Ltd 印刷製版における自動トリミング方法
JPS6120948A (ja) * 1984-07-10 1986-01-29 Dainippon Printing Co Ltd 印刷製版における自動トリミング法
JPS61235841A (ja) * 1985-04-11 1986-10-21 Dainippon Screen Mfg Co Ltd スキヤナにおける原画貼込み及び原画トリミングデ−タ抽出方法ならびにその装置
JPS62135072A (ja) * 1985-12-06 1987-06-18 Dainippon Printing Co Ltd 印刷製版用トリミング装置
JPS62189471A (ja) * 1986-02-17 1987-08-19 Toppan Printing Co Ltd カラ−スキヤナ−用原稿の角度および倍率設定装置
JPS62231566A (ja) * 1986-03-31 1987-10-12 Dainippon Screen Mfg Co Ltd 画像処理条件設定方法
JPS62250452A (ja) * 1986-04-24 1987-10-31 Dainippon Printing Co Ltd 印刷製版用トリミング装置
JPH0721625B2 (ja) * 1986-05-02 1995-03-08 有限会社オプテルマジャパンリミテッド 印刷製版における自動トリミング方法
JPH05163093A (ja) * 1991-12-10 1993-06-29 Nippon Mektron Ltd 単結晶育成方法

Family Cites Families (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5231762A (en) * 1975-09-05 1977-03-10 Hitachi Ltd Method of measuring thickness and composition of thin film formed on s ubstrate
JPS5276836A (en) * 1975-12-23 1977-06-28 Fujitsu Ltd Information input unit
JPS5550235A (en) * 1978-10-05 1980-04-11 Toppan Printing Co Ltd Determining method and apparatus of reference line for halftone photography

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0444389A (ja) * 1990-06-12 1992-02-14 Hitachi Chem Co Ltd パッケージ型ｉｃの接続方法

Also Published As

Publication number Publication date
JPS5724943A (en) 1982-02-09

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