JPS6356533B2 - - Google Patents

Info

Publication number
JPS6356533B2
JPS6356533B2 JP57157267A JP15726782A JPS6356533B2 JP S6356533 B2 JPS6356533 B2 JP S6356533B2 JP 57157267 A JP57157267 A JP 57157267A JP 15726782 A JP15726782 A JP 15726782A JP S6356533 B2 JPS6356533 B2 JP S6356533B2
Authority
JP
Japan
Prior art keywords
image
film
optical detector
manuscript
photographing
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
JP57157267A
Other languages
English (en)
Japanese (ja)
Other versions
JPS5946647A (ja
Inventor
Hitoshi Oono
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Toppan Inc
Original Assignee
Toppan Printing Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Toppan Printing Co Ltd filed Critical Toppan Printing Co Ltd
Priority to JP57157267A priority Critical patent/JPS5946647A/ja
Publication of JPS5946647A publication Critical patent/JPS5946647A/ja
Publication of JPS6356533B2 publication Critical patent/JPS6356533B2/ja
Granted legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
    • G03F1/68—Preparation processes not covered by groups G03F1/20 - G03F1/50
    • G03F1/72—Repair or correction of mask defects

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Preparing Plates And Mask In Photomechanical Process (AREA)
JP57157267A 1982-09-09 1982-09-09 画像修正装置 Granted JPS5946647A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP57157267A JPS5946647A (ja) 1982-09-09 1982-09-09 画像修正装置

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP57157267A JPS5946647A (ja) 1982-09-09 1982-09-09 画像修正装置

Publications (2)

Publication Number Publication Date
JPS5946647A JPS5946647A (ja) 1984-03-16
JPS6356533B2 true JPS6356533B2 (enrdf_load_stackoverflow) 1988-11-08

Family

ID=15645917

Family Applications (1)

Application Number Title Priority Date Filing Date
JP57157267A Granted JPS5946647A (ja) 1982-09-09 1982-09-09 画像修正装置

Country Status (1)

Country Link
JP (1) JPS5946647A (enrdf_load_stackoverflow)

Families Citing this family (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0695209B2 (ja) * 1986-10-17 1994-11-24 東洋インキ製造株式会社 製版方法
JPS643662A (en) * 1987-06-26 1989-01-09 Toyo Ink Mfg Co Light shielding method
JPS6452157A (en) * 1987-08-24 1989-02-28 Toyo Ink Mfg Co Light shielding method

Family Cites Families (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS6037462B2 (ja) * 1976-08-31 1985-08-26 富士通株式会社 欠陥パタ−ン修正装置

Also Published As

Publication number Publication date
JPS5946647A (ja) 1984-03-16

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