JPS6356310B2 - - Google Patents
Info
- Publication number
- JPS6356310B2 JPS6356310B2 JP13320480A JP13320480A JPS6356310B2 JP S6356310 B2 JPS6356310 B2 JP S6356310B2 JP 13320480 A JP13320480 A JP 13320480A JP 13320480 A JP13320480 A JP 13320480A JP S6356310 B2 JPS6356310 B2 JP S6356310B2
- Authority
- JP
- Japan
- Prior art keywords
- substrate
- vapor deposition
- umbrella
- deposition apparatus
- holder
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
- 239000000758 substrate Substances 0.000 claims description 54
- 238000007740 vapor deposition Methods 0.000 claims description 28
- 238000001704 evaporation Methods 0.000 claims description 12
- 230000008020 evaporation Effects 0.000 claims description 12
- 235000012431 wafers Nutrition 0.000 description 11
- 239000010408 film Substances 0.000 description 5
- 239000011248 coating agent Substances 0.000 description 4
- 238000000576 coating method Methods 0.000 description 4
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 description 3
- 239000004065 semiconductor Substances 0.000 description 3
- 229910052710 silicon Inorganic materials 0.000 description 3
- 239000010703 silicon Substances 0.000 description 3
- 230000005484 gravity Effects 0.000 description 2
- 229910052751 metal Inorganic materials 0.000 description 2
- 239000002184 metal Substances 0.000 description 2
- 238000000034 method Methods 0.000 description 2
- 239000010409 thin film Substances 0.000 description 2
- 238000001771 vacuum deposition Methods 0.000 description 2
- 229910052782 aluminium Inorganic materials 0.000 description 1
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 description 1
- 238000007796 conventional method Methods 0.000 description 1
- 238000010586 diagram Methods 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 229910052736 halogen Inorganic materials 0.000 description 1
- 150000002367 halogens Chemical class 0.000 description 1
- 238000005461 lubrication Methods 0.000 description 1
- 238000007738 vacuum evaporation Methods 0.000 description 1
Classifications
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/50—Substrate holders
- C23C14/505—Substrate holders for rotation of the substrates
Landscapes
- Chemical & Material Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Engineering & Computer Science (AREA)
- Materials Engineering (AREA)
- Mechanical Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Physical Vapour Deposition (AREA)
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP13320480A JPS5757871A (en) | 1980-09-24 | 1980-09-24 | Vapor depositing device |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP13320480A JPS5757871A (en) | 1980-09-24 | 1980-09-24 | Vapor depositing device |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS5757871A JPS5757871A (en) | 1982-04-07 |
| JPS6356310B2 true JPS6356310B2 (en, 2012) | 1988-11-08 |
Family
ID=15099158
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP13320480A Granted JPS5757871A (en) | 1980-09-24 | 1980-09-24 | Vapor depositing device |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS5757871A (en, 2012) |
Families Citing this family (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS63259857A (ja) * | 1987-04-17 | 1988-10-26 | Seiko Epson Corp | 薄膜の製造方法 |
| JPS6411972A (en) * | 1987-07-02 | 1989-01-17 | Seiko Epson Corp | Substrate holding mechanism in thin film producing device |
| JP5005205B2 (ja) * | 2005-09-30 | 2012-08-22 | 京セラクリスタルデバイス株式会社 | 真空蒸着装置 |
| JP5058858B2 (ja) * | 2008-03-21 | 2012-10-24 | 住友重機械工業株式会社 | 被成膜物の搬送トレイ |
-
1980
- 1980-09-24 JP JP13320480A patent/JPS5757871A/ja active Granted
Also Published As
| Publication number | Publication date |
|---|---|
| JPS5757871A (en) | 1982-04-07 |
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