JPS6355777B2 - - Google Patents

Info

Publication number
JPS6355777B2
JPS6355777B2 JP879881A JP879881A JPS6355777B2 JP S6355777 B2 JPS6355777 B2 JP S6355777B2 JP 879881 A JP879881 A JP 879881A JP 879881 A JP879881 A JP 879881A JP S6355777 B2 JPS6355777 B2 JP S6355777B2
Authority
JP
Japan
Prior art keywords
dry plate
mark
stage
electron beam
plate
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
JP879881A
Other languages
English (en)
Japanese (ja)
Other versions
JPS57122527A (en
Inventor
Teruaki Okino
Hiroaki Okuki
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Jeol Ltd
Original Assignee
Nihon Denshi KK
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Nihon Denshi KK filed Critical Nihon Denshi KK
Priority to JP879881A priority Critical patent/JPS57122527A/ja
Publication of JPS57122527A publication Critical patent/JPS57122527A/ja
Publication of JPS6355777B2 publication Critical patent/JPS6355777B2/ja
Granted legal-status Critical Current

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/30—Electron-beam or ion-beam tubes for localised treatment of objects
    • H01J37/302—Controlling tubes by external information, e.g. programme control
    • H01J37/3023—Programme control

Landscapes

  • Chemical & Material Sciences (AREA)
  • Analytical Chemistry (AREA)
  • Electron Beam Exposure (AREA)
JP879881A 1981-01-23 1981-01-23 Electron beam exposing method Granted JPS57122527A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP879881A JPS57122527A (en) 1981-01-23 1981-01-23 Electron beam exposing method

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP879881A JPS57122527A (en) 1981-01-23 1981-01-23 Electron beam exposing method

Publications (2)

Publication Number Publication Date
JPS57122527A JPS57122527A (en) 1982-07-30
JPS6355777B2 true JPS6355777B2 (enrdf_load_stackoverflow) 1988-11-04

Family

ID=11702875

Family Applications (1)

Application Number Title Priority Date Filing Date
JP879881A Granted JPS57122527A (en) 1981-01-23 1981-01-23 Electron beam exposing method

Country Status (1)

Country Link
JP (1) JPS57122527A (enrdf_load_stackoverflow)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0421167U (enrdf_load_stackoverflow) * 1990-06-15 1992-02-21

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0421167U (enrdf_load_stackoverflow) * 1990-06-15 1992-02-21

Also Published As

Publication number Publication date
JPS57122527A (en) 1982-07-30

Similar Documents

Publication Publication Date Title
JP2829642B2 (ja) 露光装置
US4442361A (en) System and method for calibrating electron beam systems
US4420233A (en) Projecting apparatus
US6392243B1 (en) Electron beam exposure apparatus and device manufacturing method
US6583430B1 (en) Electron beam exposure method and apparatus
JPS5814757B2 (ja) ゾウノセイゴウホウホウ オヨビ ソノソウチ
US4798470A (en) Pattern printing method and apparatus
US4792693A (en) Step-and-repeat exposure method
JPH11295031A (ja) 位置決めステージ装置とその位置計測方法および位置決めステージ装置を備えた露光装置ならびにデバイス製造方法
JPS60201626A (ja) 位置合わせ装置
KR100308608B1 (ko) 위치맞춤장치및투영노광장치
JPS62175760A (ja) フオトマスクのアラインメント助長方法
JPS63140989A (ja) 位置決め装置
US4521114A (en) Single lens repeater
JPS6355777B2 (enrdf_load_stackoverflow)
JPH09211872A (ja) 原版、原版保持装置およびこれを用いた露光装置ならびにディバイス製造方法
JPS62139330A (ja) 被処理材の固定方法および装置
JP2860567B2 (ja) 露光装置
JPH0337229Y2 (enrdf_load_stackoverflow)
JPH04109251A (ja) 露光装置
JP2860569B2 (ja) 露光装置
JPH04158364A (ja) 投影露光装置
JPH10308434A (ja) 位置決め装置、ミラー曲り検出方法、位置決め方法およびデバイス製造方法
JPH06302500A (ja) 投影露光装置及びそれを用いた半導体素子の製造方法
JPS6312349Y2 (enrdf_load_stackoverflow)