JPS635327B2 - - Google Patents

Info

Publication number

JPS635327B2

JPS635327B2 JP5736981A JP5736981A JPS635327B2 JP S635327 B2 JPS635327 B2 JP S635327B2 JP 5736981 A JP5736981 A JP 5736981A JP 5736981 A JP5736981 A JP 5736981A JP S635327 B2 JPS635327 B2 JP S635327B2

Authority

JP

Japan

Prior art keywords

boron

substrate

coated

thickness

structural material

Prior art date

1981-04-15

Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)

Expired

Links

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• 229910052796 boron Inorganic materials 0.000 claims description 34
• ZOXJGFHDIHLPTG-UHFFFAOYSA-N Boron Chemical compound [B] ZOXJGFHDIHLPTG-UHFFFAOYSA-N 0.000 claims description 33
• 239000000758 substrate Substances 0.000 claims description 18
• 239000000463 material Substances 0.000 claims description 17
• 229910052715 tantalum Inorganic materials 0.000 claims description 12
• 238000005229 chemical vapour deposition Methods 0.000 claims description 11
• 229910052758 niobium Inorganic materials 0.000 claims description 11
• 229910052750 molybdenum Inorganic materials 0.000 claims description 10
• 238000000034 method Methods 0.000 claims description 9
• 238000000576 coating method Methods 0.000 claims description 8
• 239000011248 coating agent Substances 0.000 claims description 7
• 238000004519 manufacturing process Methods 0.000 claims description 5
• 229910052721 tungsten Inorganic materials 0.000 claims description 3
• 229910052804 chromium Inorganic materials 0.000 claims description 2
• 239000011651 chromium Substances 0.000 claims 3
• 239000010955 niobium Substances 0.000 claims 3
• VYZAMTAEIAYCRO-UHFFFAOYSA-N Chromium Chemical compound [Cr] VYZAMTAEIAYCRO-UHFFFAOYSA-N 0.000 claims 1
• XEEYBQQBJWHFJM-UHFFFAOYSA-N Iron Chemical compound [Fe] XEEYBQQBJWHFJM-UHFFFAOYSA-N 0.000 claims 1
• ZOKXTWBITQBERF-UHFFFAOYSA-N Molybdenum Chemical compound [Mo] ZOKXTWBITQBERF-UHFFFAOYSA-N 0.000 claims 1
• 238000000151 deposition Methods 0.000 claims 1
• 239000011733 molybdenum Substances 0.000 claims 1
• GUCVJGMIXFAOAE-UHFFFAOYSA-N niobium atom Chemical compound [Nb] GUCVJGMIXFAOAE-UHFFFAOYSA-N 0.000 claims 1
• GUVRBAGPIYLISA-UHFFFAOYSA-N tantalum atom Chemical compound [Ta] GUVRBAGPIYLISA-UHFFFAOYSA-N 0.000 claims 1
• WFKWXMTUELFFGS-UHFFFAOYSA-N tungsten Chemical compound [W] WFKWXMTUELFFGS-UHFFFAOYSA-N 0.000 claims 1
• 239000010937 tungsten Substances 0.000 claims 1
• 239000011162 core material Substances 0.000 description 7
• OKKJLVBELUTLKV-UHFFFAOYSA-N Methanol Chemical compound OC OKKJLVBELUTLKV-UHFFFAOYSA-N 0.000 description 6
• 238000006243 chemical reaction Methods 0.000 description 4
• 238000004544 sputter deposition Methods 0.000 description 4
• 229910052794 bromium Inorganic materials 0.000 description 3
• 239000007789 gas Substances 0.000 description 3
• 238000010438 heat treatment Methods 0.000 description 3
• 239000012814 acoustic material Substances 0.000 description 2
• 239000002131 composite material Substances 0.000 description 2
• 239000002994 raw material Substances 0.000 description 2
• 230000002829 reductive effect Effects 0.000 description 2
• WKBOTKDWSSQWDR-UHFFFAOYSA-N Bromine atom Chemical compound [Br] WKBOTKDWSSQWDR-UHFFFAOYSA-N 0.000 description 1
• 239000002253 acid Substances 0.000 description 1
• 238000005452 bending Methods 0.000 description 1
• UORVGPXVDQYIDP-UHFFFAOYSA-N borane Chemical compound B UORVGPXVDQYIDP-UHFFFAOYSA-N 0.000 description 1
• 150000001638 boron Chemical class 0.000 description 1
• 229910010277 boron hydride Inorganic materials 0.000 description 1
• GDTBXPJZTBHREO-UHFFFAOYSA-N bromine Substances BrBr GDTBXPJZTBHREO-UHFFFAOYSA-N 0.000 description 1
• 229910052799 carbon Inorganic materials 0.000 description 1
• 238000005266 casting Methods 0.000 description 1
• 238000004140 cleaning Methods 0.000 description 1
• 239000011247 coating layer Substances 0.000 description 1
• 230000000052 comparative effect Effects 0.000 description 1
• 238000007796 conventional method Methods 0.000 description 1
• 239000013078 crystal Substances 0.000 description 1
• 238000005520 cutting process Methods 0.000 description 1
• 238000000354 decomposition reaction Methods 0.000 description 1
• 238000005238 degreasing Methods 0.000 description 1
• 229910003460 diamond Inorganic materials 0.000 description 1
• 239000010432 diamond Substances 0.000 description 1
• 238000009792 diffusion process Methods 0.000 description 1
• 238000004090 dissolution Methods 0.000 description 1
• 230000000694 effects Effects 0.000 description 1
• 238000005530 etching Methods 0.000 description 1
• 230000005496 eutectics Effects 0.000 description 1
• 229910052736 halogen Inorganic materials 0.000 description 1
• 150000002367 halogens Chemical group 0.000 description 1
• 229910052739 hydrogen Inorganic materials 0.000 description 1
• 150000002431 hydrogen Chemical class 0.000 description 1
• 239000001257 hydrogen Substances 0.000 description 1
• 229910052740 iodine Inorganic materials 0.000 description 1
• 239000007788 liquid Substances 0.000 description 1
• 238000005259 measurement Methods 0.000 description 1
• 230000008018 melting Effects 0.000 description 1
• 238000002844 melting Methods 0.000 description 1
• 238000007747 plating Methods 0.000 description 1
• 238000001556 precipitation Methods 0.000 description 1
• 238000005096 rolling process Methods 0.000 description 1
• 239000000126 substance Substances 0.000 description 1
• FAQYAMRNWDIXMY-UHFFFAOYSA-N trichloroborane Chemical compound ClB(Cl)Cl FAQYAMRNWDIXMY-UHFFFAOYSA-N 0.000 description 1
• 238000001771 vacuum deposition Methods 0.000 description 1
• 238000007740 vapor deposition Methods 0.000 description 1