JPS635328B2 - - Google Patents
Info
- Publication number
- JPS635328B2 JPS635328B2 JP5892881A JP5892881A JPS635328B2 JP S635328 B2 JPS635328 B2 JP S635328B2 JP 5892881 A JP5892881 A JP 5892881A JP 5892881 A JP5892881 A JP 5892881A JP S635328 B2 JPS635328 B2 JP S635328B2
- Authority
- JP
- Japan
- Prior art keywords
- boron
- mob
- structural material
- substrate
- layer
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
- 229910052796 boron Inorganic materials 0.000 claims description 50
- ZOXJGFHDIHLPTG-UHFFFAOYSA-N Boron Chemical compound [B] ZOXJGFHDIHLPTG-UHFFFAOYSA-N 0.000 claims description 49
- 239000000758 substrate Substances 0.000 claims description 17
- 239000000463 material Substances 0.000 claims description 15
- 238000005229 chemical vapour deposition Methods 0.000 claims description 10
- 238000010438 heat treatment Methods 0.000 claims description 10
- 239000011651 chromium Substances 0.000 claims description 7
- 238000000034 method Methods 0.000 claims description 7
- 239000013078 crystal Substances 0.000 claims description 6
- 238000004519 manufacturing process Methods 0.000 claims description 6
- 238000001556 precipitation Methods 0.000 claims description 4
- 229910052750 molybdenum Inorganic materials 0.000 claims description 3
- VYZAMTAEIAYCRO-UHFFFAOYSA-N Chromium Chemical compound [Cr] VYZAMTAEIAYCRO-UHFFFAOYSA-N 0.000 claims description 2
- ZOKXTWBITQBERF-UHFFFAOYSA-N Molybdenum Chemical compound [Mo] ZOKXTWBITQBERF-UHFFFAOYSA-N 0.000 claims description 2
- 229910052804 chromium Inorganic materials 0.000 claims description 2
- 238000004518 low pressure chemical vapour deposition Methods 0.000 claims description 2
- 239000011733 molybdenum Substances 0.000 claims description 2
- 239000000203 mixture Substances 0.000 claims 2
- 239000007789 gas Substances 0.000 description 5
- 239000011162 core material Substances 0.000 description 4
- 239000012814 acoustic material Substances 0.000 description 2
- 238000006243 chemical reaction Methods 0.000 description 2
- 239000011248 coating agent Substances 0.000 description 2
- 238000000576 coating method Methods 0.000 description 2
- 230000000052 comparative effect Effects 0.000 description 2
- 238000007796 conventional method Methods 0.000 description 2
- 238000005530 etching Methods 0.000 description 2
- 239000010955 niobium Substances 0.000 description 2
- 238000004544 sputter deposition Methods 0.000 description 2
- 229910052721 tungsten Inorganic materials 0.000 description 2
- 238000002441 X-ray diffraction Methods 0.000 description 1
- 150000001638 boron Chemical class 0.000 description 1
- 238000005266 casting Methods 0.000 description 1
- 238000004140 cleaning Methods 0.000 description 1
- 239000002131 composite material Substances 0.000 description 1
- 238000005520 cutting process Methods 0.000 description 1
- 238000000354 decomposition reaction Methods 0.000 description 1
- 238000005238 degreasing Methods 0.000 description 1
- 238000000151 deposition Methods 0.000 description 1
- 229910003460 diamond Inorganic materials 0.000 description 1
- 239000010432 diamond Substances 0.000 description 1
- 238000009792 diffusion process Methods 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 230000005611 electricity Effects 0.000 description 1
- 239000001257 hydrogen Substances 0.000 description 1
- 229910052739 hydrogen Inorganic materials 0.000 description 1
- 125000004435 hydrogen atom Chemical class [H]* 0.000 description 1
- 239000011259 mixed solution Substances 0.000 description 1
- 229910052758 niobium Inorganic materials 0.000 description 1
- GUCVJGMIXFAOAE-UHFFFAOYSA-N niobium atom Chemical compound [Nb] GUCVJGMIXFAOAE-UHFFFAOYSA-N 0.000 description 1
- 239000000843 powder Substances 0.000 description 1
- 230000001376 precipitating effect Effects 0.000 description 1
- 239000002994 raw material Substances 0.000 description 1
- 238000005096 rolling process Methods 0.000 description 1
- 229910052715 tantalum Inorganic materials 0.000 description 1
- GUVRBAGPIYLISA-UHFFFAOYSA-N tantalum atom Chemical compound [Ta] GUVRBAGPIYLISA-UHFFFAOYSA-N 0.000 description 1
- FAQYAMRNWDIXMY-UHFFFAOYSA-N trichloroborane Chemical compound ClB(Cl)Cl FAQYAMRNWDIXMY-UHFFFAOYSA-N 0.000 description 1
- WFKWXMTUELFFGS-UHFFFAOYSA-N tungsten Chemical compound [W] WFKWXMTUELFFGS-UHFFFAOYSA-N 0.000 description 1
- 239000010937 tungsten Substances 0.000 description 1
- 238000007740 vapor deposition Methods 0.000 description 1
- 230000003313 weakening effect Effects 0.000 description 1
Landscapes
- Chemical Vapour Deposition (AREA)
- Diaphragms For Electromechanical Transducers (AREA)
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP5892881A JPS57175726A (en) | 1981-04-17 | 1981-04-17 | Preparation of boron structural component |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP5892881A JPS57175726A (en) | 1981-04-17 | 1981-04-17 | Preparation of boron structural component |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS57175726A JPS57175726A (en) | 1982-10-28 |
| JPS635328B2 true JPS635328B2 (enrdf_load_stackoverflow) | 1988-02-03 |
Family
ID=13098486
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP5892881A Granted JPS57175726A (en) | 1981-04-17 | 1981-04-17 | Preparation of boron structural component |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS57175726A (enrdf_load_stackoverflow) |
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| EP3992901A1 (en) | 2020-10-12 | 2022-05-04 | Nec Corporation | Image correction device |
| EP3998575A1 (en) | 2020-10-12 | 2022-05-18 | Nec Corporation | Image correction device |
-
1981
- 1981-04-17 JP JP5892881A patent/JPS57175726A/ja active Granted
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| EP3992901A1 (en) | 2020-10-12 | 2022-05-04 | Nec Corporation | Image correction device |
| EP3998575A1 (en) | 2020-10-12 | 2022-05-18 | Nec Corporation | Image correction device |
Also Published As
| Publication number | Publication date |
|---|---|
| JPS57175726A (en) | 1982-10-28 |
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