JPS6352374B2 - - Google Patents

Info

Publication number
JPS6352374B2
JPS6352374B2 JP60035344A JP3534485A JPS6352374B2 JP S6352374 B2 JPS6352374 B2 JP S6352374B2 JP 60035344 A JP60035344 A JP 60035344A JP 3534485 A JP3534485 A JP 3534485A JP S6352374 B2 JPS6352374 B2 JP S6352374B2
Authority
JP
Japan
Prior art keywords
chromium
photomask
film
alumino
glass
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
JP60035344A
Other languages
English (en)
Japanese (ja)
Other versions
JPS61196245A (ja
Inventor
Norihiko Shinkai
Sumyoshi Kanazawa
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
AGC Inc
Original Assignee
Asahi Glass Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Asahi Glass Co Ltd filed Critical Asahi Glass Co Ltd
Priority to JP60035344A priority Critical patent/JPS61196245A/ja
Publication of JPS61196245A publication Critical patent/JPS61196245A/ja
Publication of JPS6352374B2 publication Critical patent/JPS6352374B2/ja
Granted legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
    • G03F1/50—Mask blanks not covered by G03F1/20 - G03F1/34; Preparation thereof

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Preparing Plates And Mask In Photomechanical Process (AREA)
JP60035344A 1985-02-26 1985-02-26 フオトマスクブランク及びフオトマスク Granted JPS61196245A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP60035344A JPS61196245A (ja) 1985-02-26 1985-02-26 フオトマスクブランク及びフオトマスク

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP60035344A JPS61196245A (ja) 1985-02-26 1985-02-26 フオトマスクブランク及びフオトマスク

Publications (2)

Publication Number Publication Date
JPS61196245A JPS61196245A (ja) 1986-08-30
JPS6352374B2 true JPS6352374B2 (OSRAM) 1988-10-18

Family

ID=12439241

Family Applications (1)

Application Number Title Priority Date Filing Date
JP60035344A Granted JPS61196245A (ja) 1985-02-26 1985-02-26 フオトマスクブランク及びフオトマスク

Country Status (1)

Country Link
JP (1) JPS61196245A (OSRAM)

Families Citing this family (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US11029596B2 (en) 2016-01-27 2021-06-08 Lg Chem, Ltd. Film mask, method for manufacturing same, and method for forming pattern using film mask and pattern formed thereby
KR102089835B1 (ko) * 2016-01-27 2020-03-16 주식회사 엘지화학 필름 마스크, 이의 제조방법 및 이를 이용한 패턴 형성 방법
CN108351604B (zh) 2016-01-27 2020-10-30 株式会社Lg化学 膜掩模、其制备方法、使用膜掩模的图案形成方法和由膜掩模形成的图案

Family Cites Families (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS61107350A (ja) * 1984-10-31 1986-05-26 Hoya Corp フオトマスクブランクとフオトマスク

Also Published As

Publication number Publication date
JPS61196245A (ja) 1986-08-30

Similar Documents

Publication Publication Date Title
JPS6363896B2 (OSRAM)
EP2139026B1 (en) Reflective mask blank for euv lithography
TWI409580B (zh) 空白光罩、光罩及其製造方法
KR101485754B1 (ko) 극자외선용 블랭크 마스크 및 이를 이용하여 제조되는 포토마스크
JP2911610B2 (ja) パターン転写方法
JPS6345092B2 (OSRAM)
JP5215421B2 (ja) 位相シフトフォトマスクブランクス及び位相シフトフォトマスク並びに半導体装置の製造方法
US20250044677A1 (en) Mask blank
JP7413092B2 (ja) フォトマスクブランク、フォトマスクブランクの製造方法、フォトマスクの製造方法及び表示装置の製造方法
TW201035674A (en) Blank mask and photomask fabricated using it
JPWO1997004360A1 (ja) 位相シフトマスクブランクおよびその製造方法
JP3956103B2 (ja) フォトマスクブランク、フォトマスク及びフォトマスクブランクの評価方法
JP2009122566A (ja) 低反射型フォトマスクブランクスおよびフォトマスク
JPH0695363A (ja) フォトマスクブランク及びその製造方法並びにフォトマスク
US6749973B2 (en) Reflection type mask blank for EUV exposure and reflection type mask for EUV exposure as well as method of producing the mask
JPS6352374B2 (OSRAM)
EP0054736A2 (en) Photomask and photomask blank
JPH07181664A (ja) 位相シフトマスクブランク及び位相シフトマスク
JPH11125896A (ja) フォトマスクブランクス及びフォトマスク
JP2004128490A (ja) 反射型マスクブランク及び反射型マスクの製造方法、並びに半導体装置の製造方法
CN117265494B (zh) 一种功能型掩膜版及其制备工艺、应用
JP2001147516A (ja) ハーフトーン型位相シフトマスクブランク及びハーフトーン型位相シフトマスク
JPS6322575B2 (OSRAM)
JP3250973B2 (ja) ハーフトーン型位相シフトマスクブランク及びハーフトーン型位相シフトマスク
JPS61240243A (ja) フオトマスクブランクおよびフオトマスク