JPS6346605B2 - - Google Patents
Info
- Publication number
- JPS6346605B2 JPS6346605B2 JP54131323A JP13132379A JPS6346605B2 JP S6346605 B2 JPS6346605 B2 JP S6346605B2 JP 54131323 A JP54131323 A JP 54131323A JP 13132379 A JP13132379 A JP 13132379A JP S6346605 B2 JPS6346605 B2 JP S6346605B2
- Authority
- JP
- Japan
- Prior art keywords
- substrate
- surface acoustic
- acoustic wave
- reflector
- piezoelectric substrate
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
- 239000000758 substrate Substances 0.000 claims description 29
- 238000010897 surface acoustic wave method Methods 0.000 claims description 11
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 claims description 9
- GQYHUHYESMUTHG-UHFFFAOYSA-N lithium niobate Chemical group [Li+].[O-][Nb](=O)=O GQYHUHYESMUTHG-UHFFFAOYSA-N 0.000 claims description 8
- WSMQKESQZFQMFW-UHFFFAOYSA-N 5-methyl-pyrazole-3-carboxylic acid Chemical group CC1=CC(C(O)=O)=NN1 WSMQKESQZFQMFW-UHFFFAOYSA-N 0.000 claims description 7
- 229910052814 silicon oxide Inorganic materials 0.000 claims description 7
- 238000009751 slip forming Methods 0.000 claims 1
- 238000004519 manufacturing process Methods 0.000 description 17
- 230000008878 coupling Effects 0.000 description 12
- 238000010168 coupling process Methods 0.000 description 12
- 238000005859 coupling reaction Methods 0.000 description 12
- 239000010408 film Substances 0.000 description 11
- 238000005530 etching Methods 0.000 description 7
- 238000000034 method Methods 0.000 description 6
- 229910004298 SiO 2 Inorganic materials 0.000 description 5
- 238000005516 engineering process Methods 0.000 description 4
- 238000001020 plasma etching Methods 0.000 description 4
- 238000010586 diagram Methods 0.000 description 3
- VYZAMTAEIAYCRO-UHFFFAOYSA-N Chromium Chemical compound [Cr] VYZAMTAEIAYCRO-UHFFFAOYSA-N 0.000 description 2
- 230000000694 effects Effects 0.000 description 2
- 239000000463 material Substances 0.000 description 2
- 239000010453 quartz Substances 0.000 description 2
- DDFHBQSCUXNBSA-UHFFFAOYSA-N 5-(5-carboxythiophen-2-yl)thiophene-2-carboxylic acid Chemical compound S1C(C(=O)O)=CC=C1C1=CC=C(C(O)=O)S1 DDFHBQSCUXNBSA-UHFFFAOYSA-N 0.000 description 1
- OAICVXFJPJFONN-UHFFFAOYSA-N Phosphorus Chemical compound [P] OAICVXFJPJFONN-UHFFFAOYSA-N 0.000 description 1
- 229910052782 aluminium Inorganic materials 0.000 description 1
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 description 1
- 238000003486 chemical etching Methods 0.000 description 1
- 238000005229 chemical vapour deposition Methods 0.000 description 1
- 229910052804 chromium Inorganic materials 0.000 description 1
- 239000011651 chromium Substances 0.000 description 1
- 239000013078 crystal Substances 0.000 description 1
- 230000002349 favourable effect Effects 0.000 description 1
- 239000012528 membrane Substances 0.000 description 1
- 229910052751 metal Inorganic materials 0.000 description 1
- 239000002184 metal Substances 0.000 description 1
- 238000012544 monitoring process Methods 0.000 description 1
- 229910052698 phosphorus Inorganic materials 0.000 description 1
- 239000011574 phosphorus Substances 0.000 description 1
- 229920002120 photoresistant polymer Polymers 0.000 description 1
- 230000001681 protective effect Effects 0.000 description 1
- 238000000992 sputter etching Methods 0.000 description 1
- 239000000126 substance Substances 0.000 description 1
- 239000010409 thin film Substances 0.000 description 1
Classifications
-
- H—ELECTRICITY
- H03—ELECTRONIC CIRCUITRY
- H03H—IMPEDANCE NETWORKS, e.g. RESONANT CIRCUITS; RESONATORS
- H03H9/00—Networks comprising electromechanical or electro-acoustic devices; Electromechanical resonators
- H03H9/25—Constructional features of resonators using surface acoustic waves
-
- H—ELECTRICITY
- H03—ELECTRONIC CIRCUITRY
- H03H—IMPEDANCE NETWORKS, e.g. RESONANT CIRCUITS; RESONATORS
- H03H3/00—Apparatus or processes specially adapted for the manufacture of impedance networks, resonating circuits, resonators
- H03H3/007—Apparatus or processes specially adapted for the manufacture of impedance networks, resonating circuits, resonators for the manufacture of electromechanical resonators or networks
- H03H3/08—Apparatus or processes specially adapted for the manufacture of impedance networks, resonating circuits, resonators for the manufacture of electromechanical resonators or networks for the manufacture of resonators or networks using surface acoustic waves
Landscapes
- Physics & Mathematics (AREA)
- Acoustics & Sound (AREA)
- Engineering & Computer Science (AREA)
- Manufacturing & Machinery (AREA)
- Surface Acoustic Wave Elements And Circuit Networks Thereof (AREA)
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP13132379A JPS5656025A (en) | 1979-10-13 | 1979-10-13 | Elastic surface wave resonator |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP13132379A JPS5656025A (en) | 1979-10-13 | 1979-10-13 | Elastic surface wave resonator |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS5656025A JPS5656025A (en) | 1981-05-16 |
| JPS6346605B2 true JPS6346605B2 (US20080293856A1-20081127-C00127.png) | 1988-09-16 |
Family
ID=15055259
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP13132379A Granted JPS5656025A (en) | 1979-10-13 | 1979-10-13 | Elastic surface wave resonator |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS5656025A (US20080293856A1-20081127-C00127.png) |
Families Citing this family (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS63294008A (ja) * | 1987-05-26 | 1988-11-30 | Clarion Co Ltd | 弾性表面波装置 |
| JPS63294010A (ja) * | 1987-05-26 | 1988-11-30 | Clarion Co Ltd | 弾性表面波共振器 |
| SG186222A1 (en) | 2010-08-31 | 2013-01-30 | Taiyo Yuden Kk | Acoustic wave device |
| JP6418068B2 (ja) * | 2015-05-28 | 2018-11-07 | 株式会社デンソー | 弾性表面波素子およびそれを用いた物理量センサ |
Citations (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS5585121A (en) * | 1978-12-22 | 1980-06-26 | Matsushita Electric Ind Co Ltd | Surface acoustic wave element |
-
1979
- 1979-10-13 JP JP13132379A patent/JPS5656025A/ja active Granted
Patent Citations (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS5585121A (en) * | 1978-12-22 | 1980-06-26 | Matsushita Electric Ind Co Ltd | Surface acoustic wave element |
Also Published As
| Publication number | Publication date |
|---|---|
| JPS5656025A (en) | 1981-05-16 |
