JPS6344220B2 - - Google Patents

Info

Publication number
JPS6344220B2
JPS6344220B2 JP57217177A JP21717782A JPS6344220B2 JP S6344220 B2 JPS6344220 B2 JP S6344220B2 JP 57217177 A JP57217177 A JP 57217177A JP 21717782 A JP21717782 A JP 21717782A JP S6344220 B2 JPS6344220 B2 JP S6344220B2
Authority
JP
Japan
Prior art keywords
pattern
monitor
electron beam
photomask
exposed
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
JP57217177A
Other languages
English (en)
Japanese (ja)
Other versions
JPS59105647A (ja
Inventor
Kazuhiro Tanaka
Hiroaki Morimoto
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Mitsubishi Electric Corp
Original Assignee
Mitsubishi Electric Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Mitsubishi Electric Corp filed Critical Mitsubishi Electric Corp
Priority to JP57217177A priority Critical patent/JPS59105647A/ja
Publication of JPS59105647A publication Critical patent/JPS59105647A/ja
Publication of JPS6344220B2 publication Critical patent/JPS6344220B2/ja
Granted legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
    • G03F1/38—Masks having auxiliary features, e.g. special coatings or marks for alignment or testing; Preparation thereof
    • G03F1/44—Testing or measuring features, e.g. grid patterns, focus monitors, sawtooth scales or notched scales

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Preparing Plates And Mask In Photomechanical Process (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Electron Beam Exposure (AREA)
JP57217177A 1982-12-09 1982-12-09 電子ビーム露光方法 Granted JPS59105647A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP57217177A JPS59105647A (ja) 1982-12-09 1982-12-09 電子ビーム露光方法

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP57217177A JPS59105647A (ja) 1982-12-09 1982-12-09 電子ビーム露光方法

Related Child Applications (1)

Application Number Title Priority Date Filing Date
JP63082326A Division JPS63288018A (ja) 1988-04-05 1988-04-05 電子ビーム露光方法

Publications (2)

Publication Number Publication Date
JPS59105647A JPS59105647A (ja) 1984-06-19
JPS6344220B2 true JPS6344220B2 (enrdf_load_stackoverflow) 1988-09-02

Family

ID=16700065

Family Applications (1)

Application Number Title Priority Date Filing Date
JP57217177A Granted JPS59105647A (ja) 1982-12-09 1982-12-09 電子ビーム露光方法

Country Status (1)

Country Link
JP (1) JPS59105647A (enrdf_load_stackoverflow)

Families Citing this family (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS59124129A (ja) * 1982-12-29 1984-07-18 Fujitsu Ltd 電子ビ−ム露光方法
JPS63288018A (ja) * 1988-04-05 1988-11-25 Mitsubishi Electric Corp 電子ビーム露光方法
US5296917A (en) * 1992-01-21 1994-03-22 Mitsubishi Denki Kabushiki Kaisha Method of monitoring accuracy with which patterns are written
JP2011034120A (ja) * 2010-11-17 2011-02-17 Renesas Electronics Corp フォトマスクペア

Family Cites Families (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5846054B2 (ja) * 1977-02-03 1983-10-14 三菱電機株式会社 フオトマスク
JPS5819551Y2 (ja) * 1978-10-04 1983-04-22 富士通株式会社 フオトマスク

Also Published As

Publication number Publication date
JPS59105647A (ja) 1984-06-19

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