JPS6340302B2 - - Google Patents

Info

Publication number
JPS6340302B2
JPS6340302B2 JP56119455A JP11945581A JPS6340302B2 JP S6340302 B2 JPS6340302 B2 JP S6340302B2 JP 56119455 A JP56119455 A JP 56119455A JP 11945581 A JP11945581 A JP 11945581A JP S6340302 B2 JPS6340302 B2 JP S6340302B2
Authority
JP
Japan
Prior art keywords
developer
resist
weight
irradiated
polymer
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
JP56119455A
Other languages
English (en)
Japanese (ja)
Other versions
JPS5769743A (en
Inventor
Ansonii Moia Uiriamu
Rabin Utsudo Robaato
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
International Business Machines Corp
Original Assignee
International Business Machines Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by International Business Machines Corp filed Critical International Business Machines Corp
Publication of JPS5769743A publication Critical patent/JPS5769743A/ja
Publication of JPS6340302B2 publication Critical patent/JPS6340302B2/ja
Granted legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/26—Processing photosensitive materials; Apparatus therefor
    • G03F7/30—Imagewise removal using liquid means
    • G03F7/32—Liquid compositions therefor, e.g. developers
    • G03F7/325—Non-aqueous compositions

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Non-Silver Salt Photosensitive Materials And Non-Silver Salt Photography (AREA)
JP56119455A 1980-10-14 1981-07-31 Method of forming resist mask Granted JPS5769743A (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US06/196,944 US4330614A (en) 1980-10-14 1980-10-14 Process for forming a patterned resist mask

Publications (2)

Publication Number Publication Date
JPS5769743A JPS5769743A (en) 1982-04-28
JPS6340302B2 true JPS6340302B2 (esLanguage) 1988-08-10

Family

ID=22727396

Family Applications (1)

Application Number Title Priority Date Filing Date
JP56119455A Granted JPS5769743A (en) 1980-10-14 1981-07-31 Method of forming resist mask

Country Status (5)

Country Link
US (1) US4330614A (esLanguage)
EP (1) EP0049769B1 (esLanguage)
JP (1) JPS5769743A (esLanguage)
CA (1) CA1155326A (esLanguage)
DE (1) DE3171230D1 (esLanguage)

Families Citing this family (10)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5854341A (ja) * 1981-09-28 1983-03-31 Fuji Photo Film Co Ltd 現像方法および現像液
EP0187870B1 (en) * 1984-07-23 1990-05-23 Nippon Telegraph and Telephone Corporation Pattern formation
US5354645A (en) * 1988-08-23 1994-10-11 E. I. Du Pont De Nemours And Company Process for the production of flexographic printing reliefs
ATE136661T1 (de) * 1988-08-23 1996-04-15 Du Pont Verfahren zur herstellung von flexographischen druckreliefs
US7060287B1 (en) * 1992-02-11 2006-06-13 Bioform Inc. Tissue augmentation material and method
US6537574B1 (en) * 1992-02-11 2003-03-25 Bioform, Inc. Soft tissue augmentation material
US7968110B2 (en) * 1992-02-11 2011-06-28 Merz Aesthetics, Inc. Tissue augmentation material and method
JP4298414B2 (ja) * 2002-07-10 2009-07-22 キヤノン株式会社 液体吐出ヘッドの製造方法
US20070184087A1 (en) * 2006-02-06 2007-08-09 Bioform Medical, Inc. Polysaccharide compositions for use in tissue augmentation
KR20240146420A (ko) * 2023-03-29 2024-10-08 삼성에스디아이 주식회사 금속 함유 포토레지스트 현상액 조성물, 및 이를 이용한 현상 단계를 포함하는 패턴 형성 방법

Family Cites Families (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
BE606642A (esLanguage) * 1960-07-29
DE1572153B2 (de) * 1966-06-27 1971-07-22 E I Du Pont de Nemours and Co , Wilmington, Del (V St A ) Fotopolymerisierbares aufzeichnungsmaterial
US3987215A (en) * 1974-04-22 1976-10-19 International Business Machines Corporation Resist mask formation process
JPS5320377A (en) * 1976-08-10 1978-02-24 Kobe Steel Ltd Method and device for heightening sensitivity of stress paint in load test
US4130425A (en) * 1976-12-29 1978-12-19 Marcole, Inc. Subtractive developer for lithographic plates
DE2834958A1 (de) * 1978-08-10 1980-02-21 Hoechst Ag Verfahren zum entwickeln von belichteten lichtempfindlichen druckplatten
US4314022A (en) * 1980-05-05 1982-02-02 Minnesota Mining And Manufacturing Company Photoresist developers and process

Also Published As

Publication number Publication date
EP0049769A3 (en) 1982-09-22
EP0049769A2 (en) 1982-04-21
JPS5769743A (en) 1982-04-28
CA1155326A (en) 1983-10-18
EP0049769B1 (en) 1985-07-03
US4330614A (en) 1982-05-18
DE3171230D1 (en) 1985-08-08

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