JPS6338425B2 - - Google Patents

Info

Publication number
JPS6338425B2
JPS6338425B2 JP20738283A JP20738283A JPS6338425B2 JP S6338425 B2 JPS6338425 B2 JP S6338425B2 JP 20738283 A JP20738283 A JP 20738283A JP 20738283 A JP20738283 A JP 20738283A JP S6338425 B2 JPS6338425 B2 JP S6338425B2
Authority
JP
Japan
Prior art keywords
substrate
particles
thin film
evaporation
base material
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
JP20738283A
Other languages
English (en)
Japanese (ja)
Other versions
JPS60100665A (ja
Inventor
Koji Takei
Tsunekazu Iwata
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
NTT Inc
Original Assignee
Nippon Telegraph and Telephone Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Nippon Telegraph and Telephone Corp filed Critical Nippon Telegraph and Telephone Corp
Priority to JP20738283A priority Critical patent/JPS60100665A/ja
Publication of JPS60100665A publication Critical patent/JPS60100665A/ja
Publication of JPS6338425B2 publication Critical patent/JPS6338425B2/ja
Granted legal-status Critical Current

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/24—Vacuum evaporation

Landscapes

  • Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Physical Vapour Deposition (AREA)
  • Physical Deposition Of Substances That Are Components Of Semiconductor Devices (AREA)
JP20738283A 1983-11-07 1983-11-07 薄膜製造装置 Granted JPS60100665A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP20738283A JPS60100665A (ja) 1983-11-07 1983-11-07 薄膜製造装置

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP20738283A JPS60100665A (ja) 1983-11-07 1983-11-07 薄膜製造装置

Publications (2)

Publication Number Publication Date
JPS60100665A JPS60100665A (ja) 1985-06-04
JPS6338425B2 true JPS6338425B2 (https=) 1988-07-29

Family

ID=16538800

Family Applications (1)

Application Number Title Priority Date Filing Date
JP20738283A Granted JPS60100665A (ja) 1983-11-07 1983-11-07 薄膜製造装置

Country Status (1)

Country Link
JP (1) JPS60100665A (https=)

Families Citing this family (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4942063A (en) * 1989-04-20 1990-07-17 North American Philips Corporation Method for controlling the thickness distribution of an interference filter
US4982695A (en) * 1989-04-20 1991-01-08 North American Philips Corporation Method and apparatus for controlling the thickness distribution of an interference filter

Also Published As

Publication number Publication date
JPS60100665A (ja) 1985-06-04

Similar Documents

Publication Publication Date Title
Rode et al. Ultrafast ablation with high-pulse-rate lasers. Part II: Experiments on laser deposition of amorphous carbon films
US4310614A (en) Method and apparatus for pretreating and depositing thin films on substrates
JP2004511655A (ja) マグネトロンネガティブイオンスパッタ源を用いるインジウムスズ酸化物薄膜の作製方法
JP2001108832A5 (https=)
JPS6338425B2 (https=)
Takáts et al. Diffusion induced atomic islands on the surface of Ni/Cu nanolayers
JPH11222670A (ja) 膜厚モニター及びこれを用いた成膜装置
WO2004042110A1 (ja) 基板上への成膜方法
Chapman et al. Condensation of high-energy atomic beams
Putrik et al. Plasma-facing material erosion products formed under iter-like transient loads at QSPA-T plasma gun facility
Lafane et al. Room temperature and high-pressure-pulsed laser deposition of nanocrystalline VO2 thin films on glass substrate: plasma and film analyses
JPH1030168A (ja) 成膜方法
JP2003138374A (ja) スパッタ装置及びスパッタ方法
JP2890686B2 (ja) レーザ・スパッタリング装置
JP2960356B2 (ja) 真空蒸着用蒸発監視方法と蒸発監視装置
JPH1171672A (ja) ロッド供給源プール高さ監視装置
JP3031079B2 (ja) 配線膜形成装置
RU2271409C2 (ru) Установка для нанесения покрытий в вакууме
CN1389590A (zh) 可制备平整的薄膜材料的脉冲激光沉积方法及其装置
JPH0397859A (ja) 蒸発装置
JP2650609B2 (ja) 蒸着装置および蒸着方法
Bahadur et al. Crystallization of amorphous antimony films prepared by vacuum evaporation
JP2756309B2 (ja) レーザーｐｖｄ装置
KR100489300B1 (ko) 진공증착에 의한 중성자 검출용 후막 제조방법 및 그후막을 포함하는 중성자 검출용 금속판
JP4396885B2 (ja) マグネトロンスパッタ装置