JPS60100665A - 薄膜製造装置 - Google Patents

薄膜製造装置

Info

Publication number
JPS60100665A
JPS60100665A JP20738283A JP20738283A JPS60100665A JP S60100665 A JPS60100665 A JP S60100665A JP 20738283 A JP20738283 A JP 20738283A JP 20738283 A JP20738283 A JP 20738283A JP S60100665 A JPS60100665 A JP S60100665A
Authority
JP
Japan
Prior art keywords
thin film
substrate
particles
shutter mechanism
shutters
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP20738283A
Other languages
English (en)
Japanese (ja)
Other versions
JPS6338425B2 (https=
Inventor
Koji Takei
武井　弘次
Tsunekazu Iwata
岩田　恒和
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
NTT Inc
Original Assignee
Nippon Telegraph and Telephone Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Nippon Telegraph and Telephone Corp filed Critical Nippon Telegraph and Telephone Corp
Priority to JP20738283A priority Critical patent/JPS60100665A/ja
Publication of JPS60100665A publication Critical patent/JPS60100665A/ja
Publication of JPS6338425B2 publication Critical patent/JPS6338425B2/ja
Granted legal-status Critical Current

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/24—Vacuum evaporation

Landscapes

  • Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Physical Vapour Deposition (AREA)
  • Physical Deposition Of Substances That Are Components Of Semiconductor Devices (AREA)
JP20738283A 1983-11-07 1983-11-07 薄膜製造装置 Granted JPS60100665A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP20738283A JPS60100665A (ja) 1983-11-07 1983-11-07 薄膜製造装置

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP20738283A JPS60100665A (ja) 1983-11-07 1983-11-07 薄膜製造装置

Publications (2)

Publication Number Publication Date
JPS60100665A true JPS60100665A (ja) 1985-06-04
JPS6338425B2 JPS6338425B2 (https=) 1988-07-29

Family

ID=16538800

Family Applications (1)

Application Number Title Priority Date Filing Date
JP20738283A Granted JPS60100665A (ja) 1983-11-07 1983-11-07 薄膜製造装置

Country Status (1)

Country Link
JP (1) JPS60100665A (https=)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4942063A (en) * 1989-04-20 1990-07-17 North American Philips Corporation Method for controlling the thickness distribution of an interference filter
US4982695A (en) * 1989-04-20 1991-01-08 North American Philips Corporation Method and apparatus for controlling the thickness distribution of an interference filter

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4942063A (en) * 1989-04-20 1990-07-17 North American Philips Corporation Method for controlling the thickness distribution of an interference filter
US4982695A (en) * 1989-04-20 1991-01-08 North American Philips Corporation Method and apparatus for controlling the thickness distribution of an interference filter

Also Published As

Publication number Publication date
JPS6338425B2 (https=) 1988-07-29

Similar Documents

Publication Publication Date Title
CN103871845B (zh) 组合薄膜制备装置和方法
WO2024045748A1 (zh) 薄膜沉积装置及薄膜沉积方法
WO2008004594A1 (en) Substrate tray and film forming apparatus
JP2009003348A (ja) 減光フィルタの成膜方法、減光フィルタの製造装置及びこれを用いた減光フィルタ並びに撮像光量絞り装置
US6206975B1 (en) Vacuum treatment system for application of thin, hard layers
JPS60100665A (ja) 薄膜製造装置
JP2836518B2 (ja) 蒸着装置
JP2004256843A (ja) 真空蒸着装置
JP2009001889A (ja) 減光フィルタの成膜方法及びこれを用いた減光フィルタ並びに撮像光量絞り装置
JP4177021B2 (ja) 蒸着装置の制御方法及び蒸着装置
JP2009007651A (ja) 減光フィルタの成膜方法、減光フィルタの製造装置及びこれを用いた減光フィルタ並びに撮像光量絞り装置
US4942063A (en) Method for controlling the thickness distribution of an interference filter
JPH04323362A (ja) 多層膜の形成方法およびその形成装置
JPH01205071A (ja) 多層膜形成装置
US4982695A (en) Method and apparatus for controlling the thickness distribution of an interference filter
JP2890686B2 (ja) レーザ・スパッタリング装置
CN2592655Y (zh) 蒸镀装置
JPS61186472A (ja) 蒸着非結晶膜製造装置
CN1389590A (zh) 可制备平整的薄膜材料的脉冲激光沉积方法及其装置
JPS5852476A (ja) 真空蒸着法
TW202516283A (zh) 金屬滾輪製造方法
JPH03254423A (ja) 真空蒸着方法および装置
JPS595666B2 (ja) スパツタリング装置
JPH04341564A (ja) 真空蒸着装置
JPS6152359A (ja) サ−マルシ−ルドの金属蒸着膜形成方法