JPS6337187B2 - - Google Patents

Info

Publication number
JPS6337187B2
JPS6337187B2 JP57226018A JP22601882A JPS6337187B2 JP S6337187 B2 JPS6337187 B2 JP S6337187B2 JP 57226018 A JP57226018 A JP 57226018A JP 22601882 A JP22601882 A JP 22601882A JP S6337187 B2 JPS6337187 B2 JP S6337187B2
Authority
JP
Japan
Prior art keywords
plating
plating solution
copper
chemical copper
copper plating
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
JP57226018A
Other languages
English (en)
Japanese (ja)
Other versions
JPS59116366A (ja
Inventor
Hiroshi Kikuchi
Akira Matsuo
Hitoshi Oka
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Hitachi Ltd
Original Assignee
Hitachi Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Hitachi Ltd filed Critical Hitachi Ltd
Priority to JP22601882A priority Critical patent/JPS59116366A/ja
Publication of JPS59116366A publication Critical patent/JPS59116366A/ja
Publication of JPS6337187B2 publication Critical patent/JPS6337187B2/ja
Granted legal-status Critical Current

Links

Classifications

    • HELECTRICITY
    • H05ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05KPRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K3/00Apparatus or processes for manufacturing printed circuits
    • H05K3/10Apparatus or processes for manufacturing printed circuits in which conductive material is applied to the insulating support in such a manner as to form the desired conductive pattern
    • H05K3/18Apparatus or processes for manufacturing printed circuits in which conductive material is applied to the insulating support in such a manner as to form the desired conductive pattern using precipitation techniques to apply the conductive material
    • H05K3/181Apparatus or processes for manufacturing printed circuits in which conductive material is applied to the insulating support in such a manner as to form the desired conductive pattern using precipitation techniques to apply the conductive material by electroless plating
    • H05K3/187Apparatus or processes for manufacturing printed circuits in which conductive material is applied to the insulating support in such a manner as to form the desired conductive pattern using precipitation techniques to apply the conductive material by electroless plating means therefor, e.g. baths, apparatus
    • CCHEMISTRY; METALLURGY
    • C23COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23CCOATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C18/00Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating
    • C23C18/16Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating by reduction or substitution, e.g. electroless plating
    • C23C18/31Coating with metals
    • C23C18/38Coating with copper
    • C23C18/40Coating with copper using reducing agents

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • General Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Manufacturing & Machinery (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Chemically Coating (AREA)
  • Manufacturing Of Printed Wiring (AREA)
JP22601882A 1982-12-24 1982-12-24 化学銅めつき液 Granted JPS59116366A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP22601882A JPS59116366A (ja) 1982-12-24 1982-12-24 化学銅めつき液

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP22601882A JPS59116366A (ja) 1982-12-24 1982-12-24 化学銅めつき液

Publications (2)

Publication Number Publication Date
JPS59116366A JPS59116366A (ja) 1984-07-05
JPS6337187B2 true JPS6337187B2 (enrdf_load_stackoverflow) 1988-07-25

Family

ID=16838492

Family Applications (1)

Application Number Title Priority Date Filing Date
JP22601882A Granted JPS59116366A (ja) 1982-12-24 1982-12-24 化学銅めつき液

Country Status (1)

Country Link
JP (1) JPS59116366A (enrdf_load_stackoverflow)

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP5255015B2 (ja) * 2010-04-28 2013-08-07 名古屋メッキ工業株式会社 高分子繊維の無電解銅めっき方法

Family Cites Families (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5220339A (en) * 1975-08-08 1977-02-16 Hitachi Ltd Chemical copper plating solution
JPS608307B2 (ja) * 1977-07-13 1985-03-01 株式会社日立製作所 化学銅めっき液並びに化学銅めっき方法
JPS56271A (en) * 1979-06-15 1981-01-06 Hitachi Ltd Non-electrolytic copper plating solution
JPS579865A (en) * 1980-06-20 1982-01-19 Hitachi Ltd Electroless copper plating solution

Also Published As

Publication number Publication date
JPS59116366A (ja) 1984-07-05

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