JPS6337187B2 - - Google Patents
Info
- Publication number
- JPS6337187B2 JPS6337187B2 JP57226018A JP22601882A JPS6337187B2 JP S6337187 B2 JPS6337187 B2 JP S6337187B2 JP 57226018 A JP57226018 A JP 57226018A JP 22601882 A JP22601882 A JP 22601882A JP S6337187 B2 JPS6337187 B2 JP S6337187B2
- Authority
- JP
- Japan
- Prior art keywords
- plating
- plating solution
- copper
- chemical copper
- copper plating
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
Classifications
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K3/00—Apparatus or processes for manufacturing printed circuits
- H05K3/10—Apparatus or processes for manufacturing printed circuits in which conductive material is applied to the insulating support in such a manner as to form the desired conductive pattern
- H05K3/18—Apparatus or processes for manufacturing printed circuits in which conductive material is applied to the insulating support in such a manner as to form the desired conductive pattern using precipitation techniques to apply the conductive material
- H05K3/181—Apparatus or processes for manufacturing printed circuits in which conductive material is applied to the insulating support in such a manner as to form the desired conductive pattern using precipitation techniques to apply the conductive material by electroless plating
- H05K3/187—Apparatus or processes for manufacturing printed circuits in which conductive material is applied to the insulating support in such a manner as to form the desired conductive pattern using precipitation techniques to apply the conductive material by electroless plating means therefor, e.g. baths, apparatus
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C18/00—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating
- C23C18/16—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating by reduction or substitution, e.g. electroless plating
- C23C18/31—Coating with metals
- C23C18/38—Coating with copper
- C23C18/40—Coating with copper using reducing agents
Landscapes
- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- General Chemical & Material Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Materials Engineering (AREA)
- Mechanical Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Manufacturing & Machinery (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Chemically Coating (AREA)
- Manufacturing Of Printed Wiring (AREA)
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP22601882A JPS59116366A (ja) | 1982-12-24 | 1982-12-24 | 化学銅めつき液 |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP22601882A JPS59116366A (ja) | 1982-12-24 | 1982-12-24 | 化学銅めつき液 |
Publications (2)
Publication Number | Publication Date |
---|---|
JPS59116366A JPS59116366A (ja) | 1984-07-05 |
JPS6337187B2 true JPS6337187B2 (enrdf_load_stackoverflow) | 1988-07-25 |
Family
ID=16838492
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP22601882A Granted JPS59116366A (ja) | 1982-12-24 | 1982-12-24 | 化学銅めつき液 |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS59116366A (enrdf_load_stackoverflow) |
Families Citing this family (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP5255015B2 (ja) * | 2010-04-28 | 2013-08-07 | 名古屋メッキ工業株式会社 | 高分子繊維の無電解銅めっき方法 |
Family Cites Families (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS5220339A (en) * | 1975-08-08 | 1977-02-16 | Hitachi Ltd | Chemical copper plating solution |
JPS608307B2 (ja) * | 1977-07-13 | 1985-03-01 | 株式会社日立製作所 | 化学銅めっき液並びに化学銅めっき方法 |
JPS56271A (en) * | 1979-06-15 | 1981-01-06 | Hitachi Ltd | Non-electrolytic copper plating solution |
JPS579865A (en) * | 1980-06-20 | 1982-01-19 | Hitachi Ltd | Electroless copper plating solution |
-
1982
- 1982-12-24 JP JP22601882A patent/JPS59116366A/ja active Granted
Also Published As
Publication number | Publication date |
---|---|
JPS59116366A (ja) | 1984-07-05 |
Similar Documents
Publication | Publication Date | Title |
---|---|---|
KR102286510B1 (ko) | 무전해 도금용 전처리제, 및 상기 무전해 도금용 전처리제를 사용한 프린트 배선기판의 전처리방법 및 그 제조방법 | |
US20020084002A1 (en) | Process and solution for providing a conversion coating on a metallic surface I | |
US20060237097A1 (en) | Immersion method | |
US20100044341A1 (en) | Method of surface treatment for aluminum or aluminum alloy | |
EP0132594A1 (en) | Electroless copper plating solution | |
US4849124A (en) | Copper etching solution | |
US5320737A (en) | Treatment to reduce solder plating whisker formation | |
WO2011147448A1 (en) | Composition and method for micro etching of copper and copper alloys | |
US4873122A (en) | Treating laminates with a wetting/reducing solution after desmearing with permanganate | |
US3216835A (en) | Synergistic chelate combinations in dilute immersion zincate solutions for treatment of aluminum and aluminum alloys | |
KR920002710B1 (ko) | 화학동도금방법 | |
KR20170095120A (ko) | 구리 및 구리 합금의 마이크로 에칭을 위한 조성물 및 방법 | |
KR100647148B1 (ko) | 실리콘 웨이퍼용 고순도 알칼리 에칭액 및 실리콘웨이퍼의 알칼리 에칭 방법 | |
JPS6337187B2 (enrdf_load_stackoverflow) | ||
NO131083B (enrdf_load_stackoverflow) | ||
US20160108254A1 (en) | Zinc immersion coating solutions, double-zincate method, method of forming a metal plating film, and semiconductor device | |
JP2007308796A (ja) | 無電解金めっき液及び無電解金めっき方法 | |
US20240191361A1 (en) | Chemical solution for removing precious metal, method for manufacturing chemical solution, method for treating substrate, method for manufacturing semiconductor device | |
CN109338343A (zh) | 一种化学镀银液及镀银方法 | |
CN101501250B (zh) | 镀锡或者镀锡合金用晶须防止剂和利用其的晶须防止方法 | |
JPS619578A (ja) | 化学銅めつき方法 | |
JPS612386A (ja) | プリント回路基板の製造方法 | |
JP3033455B2 (ja) | アルミニウムの無電解ニッケルめっき方法 | |
EP1555335B1 (en) | Additive for plating bath | |
US7067068B2 (en) | Method for preventing lead from dissolving from a lead-containing copper-based alloy |