JPS6336683Y2 - - Google Patents
Info
- Publication number
- JPS6336683Y2 JPS6336683Y2 JP1983099210U JP9921083U JPS6336683Y2 JP S6336683 Y2 JPS6336683 Y2 JP S6336683Y2 JP 1983099210 U JP1983099210 U JP 1983099210U JP 9921083 U JP9921083 U JP 9921083U JP S6336683 Y2 JPS6336683 Y2 JP S6336683Y2
- Authority
- JP
- Japan
- Prior art keywords
- photomask
- gap
- contact surface
- mask pattern
- reference end
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
- 238000007689 inspection Methods 0.000 claims description 20
- 238000005259 measurement Methods 0.000 description 9
- 238000010586 diagram Methods 0.000 description 6
- 230000002950 deficient Effects 0.000 description 4
- 238000000034 method Methods 0.000 description 4
- 239000004065 semiconductor Substances 0.000 description 3
- 230000000694 effects Effects 0.000 description 2
- 229920002160 Celluloid Polymers 0.000 description 1
- 238000005516 engineering process Methods 0.000 description 1
- 239000011521 glass Substances 0.000 description 1
- 238000004519 manufacturing process Methods 0.000 description 1
- 238000003825 pressing Methods 0.000 description 1
Landscapes
- Testing Or Measuring Of Semiconductors Or The Like (AREA)
- A Measuring Device Byusing Mechanical Method (AREA)
- Investigating Materials By The Use Of Optical Means Adapted For Particular Applications (AREA)
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP1983099210U JPS606223U (ja) | 1983-06-27 | 1983-06-27 | フオトマスク検査機 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP1983099210U JPS606223U (ja) | 1983-06-27 | 1983-06-27 | フオトマスク検査機 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS606223U JPS606223U (ja) | 1985-01-17 |
| JPS6336683Y2 true JPS6336683Y2 (no) | 1988-09-28 |
Family
ID=30235213
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP1983099210U Granted JPS606223U (ja) | 1983-06-27 | 1983-06-27 | フオトマスク検査機 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS606223U (no) |
-
1983
- 1983-06-27 JP JP1983099210U patent/JPS606223U/ja active Granted
Also Published As
| Publication number | Publication date |
|---|---|
| JPS606223U (ja) | 1985-01-17 |
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| CN100360895C (zh) | 假想接面测定用的干涉仪装置 | |
| TW201802623A (zh) | 投影曝光裝置及方法 | |
| US7012680B2 (en) | Method and apparatus for quantitative quality inspection of substrate such as wafer | |
| US4134066A (en) | Wafer indexing system using a grid pattern and coding and orientation marks in each grid cell | |
| EP0006473B1 (en) | Gap measurement method | |
| JPS6336683Y2 (no) | ||
| JP2678942B2 (ja) | パターンの描画または検査方法 | |
| JPS587055B2 (ja) | プロキシミテイ・アライナ−におけるギヤツプ設定装置 | |
| JPH07110966A (ja) | 基板の反り測定方法及び測定装置 | |
| JPH0649958U (ja) | 半導体ウェハ厚さ測定機 | |
| JPH06291012A (ja) | 基板露光装置 | |
| JPH04121605A (ja) | レーザ干渉計ミラーの取付け方法及び該方法を用いたステージ装置 | |
| JPS6275209A (ja) | 板状物の寸法測定方法およびその装置 | |
| TW524965B (en) | Flatness detecting method and device | |
| JP3761877B2 (ja) | ウェハの検査方法 | |
| JP2587614B2 (ja) | 半導体装置 | |
| JPH0557163B2 (no) | ||
| JP3849016B2 (ja) | ガラス製平面調整テーブル | |
| JPH05332761A (ja) | パターン位置測定装置 | |
| JP2531042Y2 (ja) | プローブヘッド | |
| KR100252860B1 (ko) | 테이프 캐리어 패키지용 테이프의 패턴 치수 측정용 지그 | |
| JPH07218203A (ja) | 段差ゲージ | |
| JPH05100416A (ja) | マスクホルダーおよびホルダー | |
| JPH04289864A (ja) | レチクルステージ | |
| JPH11340122A (ja) | 識別用マーク |