JPS6336683Y2 - - Google Patents

Info

Publication number
JPS6336683Y2
JPS6336683Y2 JP1983099210U JP9921083U JPS6336683Y2 JP S6336683 Y2 JPS6336683 Y2 JP S6336683Y2 JP 1983099210 U JP1983099210 U JP 1983099210U JP 9921083 U JP9921083 U JP 9921083U JP S6336683 Y2 JPS6336683 Y2 JP S6336683Y2
Authority
JP
Japan
Prior art keywords
photomask
gap
contact surface
mask pattern
reference end
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
JP1983099210U
Other languages
English (en)
Japanese (ja)
Other versions
JPS606223U (ja
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed filed Critical
Priority to JP1983099210U priority Critical patent/JPS606223U/ja
Publication of JPS606223U publication Critical patent/JPS606223U/ja
Application granted granted Critical
Publication of JPS6336683Y2 publication Critical patent/JPS6336683Y2/ja
Granted legal-status Critical Current

Links

Landscapes

  • A Measuring Device Byusing Mechanical Method (AREA)
  • Investigating Materials By The Use Of Optical Means Adapted For Particular Applications (AREA)
  • Testing Or Measuring Of Semiconductors Or The Like (AREA)
JP1983099210U 1983-06-27 1983-06-27 フオトマスク検査機 Granted JPS606223U (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP1983099210U JPS606223U (ja) 1983-06-27 1983-06-27 フオトマスク検査機

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP1983099210U JPS606223U (ja) 1983-06-27 1983-06-27 フオトマスク検査機

Publications (2)

Publication Number Publication Date
JPS606223U JPS606223U (ja) 1985-01-17
JPS6336683Y2 true JPS6336683Y2 (enrdf_load_stackoverflow) 1988-09-28

Family

ID=30235213

Family Applications (1)

Application Number Title Priority Date Filing Date
JP1983099210U Granted JPS606223U (ja) 1983-06-27 1983-06-27 フオトマスク検査機

Country Status (1)

Country Link
JP (1) JPS606223U (enrdf_load_stackoverflow)

Also Published As

Publication number Publication date
JPS606223U (ja) 1985-01-17

Similar Documents

Publication Publication Date Title
TW201802623A (zh) 投影曝光裝置及方法
JP4268447B2 (ja) 基板保持具、基板処理装置、基板検査装置及びこれらの使用方法
CN111735401A (zh) 一种针对大尺寸物体的高精度厚度测量方法及装置
US7012680B2 (en) Method and apparatus for quantitative quality inspection of substrate such as wafer
US4134066A (en) Wafer indexing system using a grid pattern and coding and orientation marks in each grid cell
EP0006473A1 (en) Gap measurement method
JPS6336683Y2 (enrdf_load_stackoverflow)
JP2678942B2 (ja) パターンの描画または検査方法
JPH07110966A (ja) 基板の反り測定方法及び測定装置
JPS587055B2 (ja) プロキシミテイ・アライナ−におけるギヤツプ設定装置
JPH0649958U (ja) 半導体ウェハ厚さ測定機
CN216815372U (zh) 一种平面度测试设备
JPH04121605A (ja) レーザ干渉計ミラーの取付け方法及び該方法を用いたステージ装置
JPS6275209A (ja) 板状物の寸法測定方法およびその装置
JP2007057502A (ja) 基板の両面形状測定システム
TW524965B (en) Flatness detecting method and device
JP3761877B2 (ja) ウェハの検査方法
JP2587614B2 (ja) 半導体装置
JP2776339B2 (ja) 厚み計
JPH0557163B2 (enrdf_load_stackoverflow)
JPH11194188A (ja) 板状部材の保持装置
JP2531042Y2 (ja) プローブヘッド
JPH07218203A (ja) 段差ゲージ
KR100252860B1 (ko) 테이프 캐리어 패키지용 테이프의 패턴 치수 측정용 지그
JPH05100416A (ja) マスクホルダーおよびホルダー