JPS6333305B2 - - Google Patents
Info
- Publication number
- JPS6333305B2 JPS6333305B2 JP27290784A JP27290784A JPS6333305B2 JP S6333305 B2 JPS6333305 B2 JP S6333305B2 JP 27290784 A JP27290784 A JP 27290784A JP 27290784 A JP27290784 A JP 27290784A JP S6333305 B2 JPS6333305 B2 JP S6333305B2
- Authority
- JP
- Japan
- Prior art keywords
- insulating film
- etching
- mask
- providing
- film
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
- 238000004519 manufacturing process Methods 0.000 claims description 26
- 239000004065 semiconductor Substances 0.000 claims description 23
- 238000000034 method Methods 0.000 claims description 18
- 239000000758 substrate Substances 0.000 claims description 14
- 230000015572 biosynthetic process Effects 0.000 claims description 4
- 238000000206 photolithography Methods 0.000 claims description 3
- 238000005530 etching Methods 0.000 claims 5
- 239000004020 conductor Substances 0.000 claims 2
- 238000002955 isolation Methods 0.000 claims 1
- 239000010408 film Substances 0.000 description 41
- 230000003647 oxidation Effects 0.000 description 11
- 238000007254 oxidation reaction Methods 0.000 description 11
- 230000008569 process Effects 0.000 description 10
- 239000010409 thin film Substances 0.000 description 10
- 239000000463 material Substances 0.000 description 7
- 238000001259 photo etching Methods 0.000 description 7
- 238000009792 diffusion process Methods 0.000 description 6
- 229910052581 Si3N4 Inorganic materials 0.000 description 4
- 238000005516 engineering process Methods 0.000 description 4
- 239000012535 impurity Substances 0.000 description 4
- 229910021420 polycrystalline silicon Inorganic materials 0.000 description 4
- HQVNEWCFYHHQES-UHFFFAOYSA-N silicon nitride Chemical compound N12[Si]34N5[Si]62N3[Si]51N64 HQVNEWCFYHHQES-UHFFFAOYSA-N 0.000 description 4
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 3
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 description 3
- 239000007789 gas Substances 0.000 description 3
- 229910052710 silicon Inorganic materials 0.000 description 3
- 239000010703 silicon Substances 0.000 description 3
- 229910052814 silicon oxide Inorganic materials 0.000 description 3
- MYMOFIZGZYHOMD-UHFFFAOYSA-N Dioxygen Chemical compound O=O MYMOFIZGZYHOMD-UHFFFAOYSA-N 0.000 description 2
- 238000006243 chemical reaction Methods 0.000 description 2
- 238000010586 diagram Methods 0.000 description 2
- 229910001882 dioxygen Inorganic materials 0.000 description 2
- 238000002347 injection Methods 0.000 description 2
- 239000007924 injection Substances 0.000 description 2
- 239000002184 metal Substances 0.000 description 2
- 238000009279 wet oxidation reaction Methods 0.000 description 2
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 description 1
- 238000004458 analytical method Methods 0.000 description 1
- 230000008901 benefit Effects 0.000 description 1
- 230000008859 change Effects 0.000 description 1
- 239000000470 constituent Substances 0.000 description 1
- 230000008021 deposition Effects 0.000 description 1
- 238000010790 dilution Methods 0.000 description 1
- 239000012895 dilution Substances 0.000 description 1
- 229910001873 dinitrogen Inorganic materials 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 239000012776 electronic material Substances 0.000 description 1
- 230000006872 improvement Effects 0.000 description 1
- 230000003446 memory effect Effects 0.000 description 1
- 238000012986 modification Methods 0.000 description 1
- 230000004048 modification Effects 0.000 description 1
- 230000001590 oxidative effect Effects 0.000 description 1
- 238000012805 post-processing Methods 0.000 description 1
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 1
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L29/00—Semiconductor devices specially adapted for rectifying, amplifying, oscillating or switching and having potential barriers; Capacitors or resistors having potential barriers, e.g. a PN-junction depletion layer or carrier concentration layer; Details of semiconductor bodies or of electrodes thereof ; Multistep manufacturing processes therefor
- H01L29/66—Types of semiconductor device ; Multistep manufacturing processes therefor
- H01L29/68—Types of semiconductor device ; Multistep manufacturing processes therefor controllable by only the electric current supplied, or only the electric potential applied, to an electrode which does not carry the current to be rectified, amplified or switched
- H01L29/76—Unipolar devices, e.g. field effect transistors
- H01L29/772—Field effect transistors
- H01L29/78—Field effect transistors with field effect produced by an insulated gate
Landscapes
- Engineering & Computer Science (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Power Engineering (AREA)
- Physics & Mathematics (AREA)
- Ceramic Engineering (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- General Physics & Mathematics (AREA)
- Computer Hardware Design (AREA)
- Non-Volatile Memory (AREA)
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP27290784A JPS60167379A (ja) | 1984-12-26 | 1984-12-26 | 半導体不揮発性記憶装置の製造方法 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP27290784A JPS60167379A (ja) | 1984-12-26 | 1984-12-26 | 半導体不揮発性記憶装置の製造方法 |
Related Parent Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP7573205A Division JPS5910074B2 (ja) | 1975-08-15 | 1975-08-15 | 半導体不揮発性記憶装置 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS60167379A JPS60167379A (ja) | 1985-08-30 |
| JPS6333305B2 true JPS6333305B2 (ko) | 1988-07-05 |
Family
ID=17520416
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP27290784A Granted JPS60167379A (ja) | 1984-12-26 | 1984-12-26 | 半導体不揮発性記憶装置の製造方法 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS60167379A (ko) |
Families Citing this family (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US5153144A (en) * | 1988-05-10 | 1992-10-06 | Hitachi, Ltd. | Method of making tunnel EEPROM |
| US5445980A (en) * | 1988-05-10 | 1995-08-29 | Hitachi, Ltd. | Method of making a semiconductor memory device |
-
1984
- 1984-12-26 JP JP27290784A patent/JPS60167379A/ja active Granted
Also Published As
| Publication number | Publication date |
|---|---|
| JPS60167379A (ja) | 1985-08-30 |
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