JPS633303B2 - - Google Patents

Info

Publication number
JPS633303B2
JPS633303B2 JP9736278A JP9736278A JPS633303B2 JP S633303 B2 JPS633303 B2 JP S633303B2 JP 9736278 A JP9736278 A JP 9736278A JP 9736278 A JP9736278 A JP 9736278A JP S633303 B2 JPS633303 B2 JP S633303B2
Authority
JP
Japan
Prior art keywords
adhesive layer
acid
photosensitive resin
printing
copolymer
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
JP9736278A
Other languages
English (en)
Japanese (ja)
Other versions
JPS5525046A (en
Inventor
Yukihiro Hosaka
Yoshuki Harita
Mitsuo Kurokawa
Toko Harada
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
JSR Corp
Original Assignee
Japan Synthetic Rubber Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Japan Synthetic Rubber Co Ltd filed Critical Japan Synthetic Rubber Co Ltd
Priority to JP9736278A priority Critical patent/JPS5525046A/ja
Publication of JPS5525046A publication Critical patent/JPS5525046A/ja
Publication of JPS633303B2 publication Critical patent/JPS633303B2/ja
Granted legal-status Critical Current

Links

Classifications

    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004Photosensitive materials
    • G03F7/09Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers
    • G03F7/11Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers having cover layers or intermediate layers, e.g. subbing layers

Landscapes

  • Engineering & Computer Science (AREA)
  • Architecture (AREA)
  • Structural Engineering (AREA)
  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
JP9736278A 1978-08-11 1978-08-11 Substrate for photosensitive resin plate Granted JPS5525046A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP9736278A JPS5525046A (en) 1978-08-11 1978-08-11 Substrate for photosensitive resin plate

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP9736278A JPS5525046A (en) 1978-08-11 1978-08-11 Substrate for photosensitive resin plate

Publications (2)

Publication Number Publication Date
JPS5525046A JPS5525046A (en) 1980-02-22
JPS633303B2 true JPS633303B2 (enExample) 1988-01-22

Family

ID=14190382

Family Applications (1)

Application Number Title Priority Date Filing Date
JP9736278A Granted JPS5525046A (en) 1978-08-11 1978-08-11 Substrate for photosensitive resin plate

Country Status (1)

Country Link
JP (1) JPS5525046A (enExample)

Families Citing this family (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS61213844A (ja) * 1985-03-20 1986-09-22 Toray Ind Inc 固形感光性樹脂版材
TWI740023B (zh) * 2017-04-04 2021-09-21 日商旭化成股份有限公司 柔版印刷版用感光性樹脂組合物、柔版印刷原版、柔版印刷版及共聚物

Also Published As

Publication number Publication date
JPS5525046A (en) 1980-02-22

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