JPS633288B2 - - Google Patents

Info

Publication number
JPS633288B2
JPS633288B2 JP54158740A JP15874079A JPS633288B2 JP S633288 B2 JPS633288 B2 JP S633288B2 JP 54158740 A JP54158740 A JP 54158740A JP 15874079 A JP15874079 A JP 15874079A JP S633288 B2 JPS633288 B2 JP S633288B2
Authority
JP
Japan
Prior art keywords
lens
light
collimation lens
optical integrator
elliptical mirror
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
JP54158740A
Other languages
English (en)
Japanese (ja)
Other versions
JPS5681813A (en
Inventor
Yoshiaki Mimura
Kazue Yoshida
Kunio Konno
Nobuya Shinoyama
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Nikon Corp
Nippon Telegraph and Telephone Corp
Original Assignee
Nippon Telegraph and Telephone Corp
Nippon Kogaku KK
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Nippon Telegraph and Telephone Corp, Nippon Kogaku KK filed Critical Nippon Telegraph and Telephone Corp
Priority to JP15874079A priority Critical patent/JPS5681813A/ja
Publication of JPS5681813A publication Critical patent/JPS5681813A/ja
Publication of JPS633288B2 publication Critical patent/JPS633288B2/ja
Granted legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70058—Mask illumination systems

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Light Sources And Details Of Projection-Printing Devices (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Microscoopes, Condenser (AREA)
JP15874079A 1979-12-08 1979-12-08 Mask lighting optical system Granted JPS5681813A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP15874079A JPS5681813A (en) 1979-12-08 1979-12-08 Mask lighting optical system

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP15874079A JPS5681813A (en) 1979-12-08 1979-12-08 Mask lighting optical system

Related Child Applications (1)

Application Number Title Priority Date Filing Date
JP62131848A Division JPS63113412A (ja) 1987-05-29 1987-05-29 マスク照明光学系

Publications (2)

Publication Number Publication Date
JPS5681813A JPS5681813A (en) 1981-07-04
JPS633288B2 true JPS633288B2 (fr) 1988-01-22

Family

ID=15678290

Family Applications (1)

Application Number Title Priority Date Filing Date
JP15874079A Granted JPS5681813A (en) 1979-12-08 1979-12-08 Mask lighting optical system

Country Status (1)

Country Link
JP (1) JPS5681813A (fr)

Families Citing this family (19)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5850511A (ja) * 1981-09-21 1983-03-25 Mikasa Kk Ｉｃパタ−ン転写装置における照明光学系
JPS5850510A (ja) * 1981-09-21 1983-03-25 Mikasa Kk Ｉｃパタ−ン転写装置における照明光学系
JPS59226317A (ja) * 1983-06-06 1984-12-19 Nippon Kogaku Kk <Nikon> 照明装置
US4680579A (en) * 1983-09-08 1987-07-14 Texas Instruments Incorporated Optical system for projection display using spatial light modulator device
JPS6150917U (fr) * 1984-09-10 1986-04-05
JPS6325640A (ja) * 1986-07-18 1988-02-03 Oak Seisakusho:Kk 平行光投射光学系
US4939630A (en) * 1986-09-09 1990-07-03 Nikon Corporation Illumination optical apparatus
JP2696360B2 (ja) * 1988-10-28 1998-01-14 旭光学工業株式会社 照明光学装置
JPH02308106A (ja) * 1989-05-23 1990-12-21 Citizen Watch Co Ltd 直線遍光光源
JP2748343B2 (ja) * 1989-12-28 1998-05-06 ウシオ電機株式会社 光照射装置
JP2748341B2 (ja) * 1989-12-28 1998-05-06 ウシオ電機株式会社 光学ユニット及びこの光学ユニットが接合される光照射装置
JP2748342B2 (ja) * 1989-12-28 1998-05-06 ウシオ電機株式会社 光照射装置
JP2795947B2 (ja) * 1990-01-17 1998-09-10 ウシオ電機株式会社 光学ユニット
JP3278896B2 (ja) * 1992-03-31 2002-04-30 キヤノン株式会社 照明装置及びそれを用いた投影露光装置
US5488230A (en) * 1992-07-15 1996-01-30 Nikon Corporation Double-beam light source apparatus, position detecting apparatus and aligning apparatus
FR2696235B1 (fr) * 1992-09-30 1994-10-28 Patrice Rat Dispositif d'éclairement pour système d'analyse à fluorescence, par exemple fluorimètre pour microtitration notamment en biologie cellulaire.
JP3608580B2 (ja) * 1995-03-22 2005-01-12 株式会社ニコン 照明光学装置、露光装置、露光方法、及びフライアイレンズ
JP4238390B2 (ja) 1998-02-27 2009-03-18 株式会社ニコン 照明装置、該照明装置を備えた露光装置および該露光装置を用いて半導体デバイスを製造する方法
JP2014003086A (ja) * 2012-06-15 2014-01-09 Ushio Inc 光照射装置、露光装置

Also Published As

Publication number Publication date
JPS5681813A (en) 1981-07-04

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