JPS6332862B2 - - Google Patents
Info
- Publication number
- JPS6332862B2 JPS6332862B2 JP56031923A JP3192381A JPS6332862B2 JP S6332862 B2 JPS6332862 B2 JP S6332862B2 JP 56031923 A JP56031923 A JP 56031923A JP 3192381 A JP3192381 A JP 3192381A JP S6332862 B2 JPS6332862 B2 JP S6332862B2
- Authority
- JP
- Japan
- Prior art keywords
- groove
- target
- ferromagnetic
- annular
- substrate
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
Classifications
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/34—Sputtering
- C23C14/3407—Cathode assembly for sputtering apparatus, e.g. Target
Landscapes
- Chemical & Material Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Engineering & Computer Science (AREA)
- Materials Engineering (AREA)
- Mechanical Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Physical Vapour Deposition (AREA)
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP3192381A JPS57149471A (en) | 1981-03-07 | 1981-03-07 | High-speed spattering device for ferromagnetic body |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP3192381A JPS57149471A (en) | 1981-03-07 | 1981-03-07 | High-speed spattering device for ferromagnetic body |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS57149471A JPS57149471A (en) | 1982-09-16 |
| JPS6332862B2 true JPS6332862B2 (index.php) | 1988-07-01 |
Family
ID=12344486
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP3192381A Granted JPS57149471A (en) | 1981-03-07 | 1981-03-07 | High-speed spattering device for ferromagnetic body |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS57149471A (index.php) |
Families Citing this family (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS59122779A (ja) * | 1982-08-31 | 1984-07-16 | Ngk Spark Plug Co Ltd | グロ−プラグの通電制御装置 |
| DE19819933A1 (de) * | 1998-05-05 | 1999-11-11 | Leybold Systems Gmbh | Target für eine Kathodenzerstäubungsvorrichtung zur Herstellung dünner Schichten |
Family Cites Families (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS57118619A (en) * | 1981-01-16 | 1982-07-23 | Ulvac Corp | High speed sputtering device for ferromagnetic material |
-
1981
- 1981-03-07 JP JP3192381A patent/JPS57149471A/ja active Granted
Also Published As
| Publication number | Publication date |
|---|---|
| JPS57149471A (en) | 1982-09-16 |
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